Browsing by author "Martin Hoyas, Ana"
Now showing items 1-18 of 18
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A novel approach to characterise a low-k dielectric polymer surface
Martin Hoyas, Ana; Schuhmacher, Jorg; Le, Quoc Toan; Whelan, Caroline; Schaekers, Marc; Celis, Jean-Pierre; Maex, Karen (2002) -
A novel approach to characterization of a low-k dielectric polymer surface
Martin Hoyas, Ana; Schuhmacher, Jorg; Whelan, Caroline; Baklanov, Mikhaïl; Carbonell, Laure; Schaekers, Marc; Celis, Jean-Pierre; Maex, Karen (2002) -
Alkaline cleaning of silicon wafers: additives for the prevention of metal contamination
Martin Hoyas, Ana; Baeyens, Martien; Hub, W.; Mertens, Paul; Kolbesen, B. O. (1999) -
Atomic layer deposited barriers for copper interconnects
Schuhmacher, Jorg; Martin Hoyas, Ana; Ernur, Didem; Tokei, Zsolt; Travaly, Youssef; Bruynseraede, Christophe; Satta, Alessandra; Whelan, Caroline; Shamiryan, Denis; Beyer, Gerald; Abell, Thomas; Sutcliffe, Victor; Schaekers, Marc; Maex, Karen (2004) -
Atomic layer deposition of barriers for interconnect
Besling, Wim; Satta, Alessandra; Schuhmacher, Jörg; Abell, Thomas; Sutcliffe, Victor; Martin Hoyas, Ana; Beyer, Gerald; Gravesteijn, Dirk; Maex, Karen (2002) -
Atomic-layer deposited barrier and seed layers for interconnects
Schuhmacher, Jorg; Martin Hoyas, Ana; Satta, Alessandra; Maex, Karen (2005) -
Characterization of ALD diffusion barrier on low-k dielectric polymer by contact angle measurements
Martin Hoyas, Ana; Schuhmacher, Jorg; Celis, Jean-Pierre; Maex, Karen (2002) -
Characterization of atomic layer deposited nanoscale structure on dense dielectric substrates by X-ray reflectivity
Travaly, Youssef; Schuhmacher, J.; Martin Hoyas, Ana; Abell, T.; Sutcliffe, Vic; Jonas, M.; Van Hove, Marleen; Maex, Karen (2005) -
Characterization of the growth of atomic layer deposited WNxCy films on various substrates
Martin Hoyas, Ana; Travaly, Youssef; Schuhmacher, Jorg; Sajavaara, Timo; Whelan, Caroline; Eyckens, Brenda; Richard, Olivier; Giangrandi,; Brijs, Bert; Jonas, A.M.; Vantomme, Andre; Vandervorst, Wilfried; Celis, Jean-Pierre; Maex, Karen (2005) -
Effect of plasma treatments on a low-k dielectric polymer surface
Martin Hoyas, Ana; Schuhmacher, Jorg; Whelan, Caroline; Baklanov, Mikhaïl; Carbonell, Laure; Celis, Jean-Pierre; Maex, Karen (2005) -
Growth and characterization of atomic layer deposited WC0.7N0.3 on polymer films
Martin Hoyas, Ana; Schuhmacher, Jorg; Shamiryan, Denis; Waeterloos, Joost; Besling, W.; Celis, Jean-Pierre; Maex, Karen (2004) -
Growth and characterization of atomic layer deposited WCxNy
Martin Hoyas, Ana; Travaly, Youssef; Schuhmacher, Jorg; Sajavaara, T.; Whelan, Caroline; Eyckens, Brenda; Richard, Olivier; Giangrandi, Simone; Brijs, Bert; Jonas, A.M.; Vantomme, A.; Vandervorst, Wilfried; Celis, Jean-Pierre; Maex, Karen (2005) -
Implementation of atomic layer deposition in advanced semiconductor processes
Schaekers, Marc; Van Ammel, Annemie; Schuhmacher, Jorg; Delabie, Annelies; Martin Hoyas, Ana; Zhao, Chao (2005) -
Interface characterization of nanoscale laminate structures on dense dielectric substrates by x-ray reflectivity
Travaly, Youssef; Schuhmacher, Jorg; Martin Hoyas, Ana; Van Hove, Marleen; Maex, Karen; Abell, Thomas; Sutcliffe, Victor; Jonas, A.M. (2005-04) -
Interface characterization of nanoscale laminate structures on dense dielectric substrates by X-ray reflectivity
Travaly, Youssef; Schuhmacher, Jorg; Martin Hoyas, Ana; Van Hove, Marleen; Maex, Karen; Abell, Thomas; Sutcliffe, Victor; Jonas, Alain M. (2005-04) -
Plasma sealing of a low-k dielectric polymer
Martin Hoyas, Ana; Schuhmacher, Jorg; Whelan, Caroline; Celis, Jean-Pierre; Maex, Karen (2004) -
Plasma treatments of a low-k dielectric polymer surface
Martin Hoyas, Ana; Schuhmacher, Jörg; Whelan, Caroline; Schaekers, Marc; Celis, Jean-Pierre; Maex, Karen (2003) -
Thermal desorption spectrometry as a method of analysis for advanced interconnect materials
Carbonell, Laure; Martin Hoyas, Ana; Whelan, Caroline; Vereecke, Guy (2005)