Browsing by author "Maenhoudt, Mireille"
Now showing items 1-20 of 92
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248nm and 193nm lithography for damascene patterning
Maenhoudt, Mireille; Pollentier, Ivan; Wiaux, Vincent; Vangoidsenhoven, Diziana; Ronse, Kurt (2001) -
30-nm half-pitch metal patterning using MotifTM critical dimension shrink technique and double patterning
Versluijs, Janko; de Marneffe, Jean-Francois; Goossens, Danny; Vandeweyer, Tom; Wiaux, Vincent; Struyf, Herbert; Maenhoudt, Mireille; Brouri, Mohand; Vertommen, Johan; Kim, Ji Soo; Zhu, Helen; Sadjadi, Reza (2009) -
30nm half-pitch metal patterning using MotifTM CD shrink technique and double patterning
Versluijs, Janko; de Marneffe, Jean-Francois; Goossens, Danny; Op de Beeck, Maaike; Vandeweyer, Tom; Wiaux, Vincent; Struyf, Herbert; Maenhoudt, Mireille; Brouri, Mohand; Vertommen, Johan; Kim, Ji Soo; Zhu, Helen; Sadjadi, Reza (2008) -
A 0.314mm2 6T-SRAM cell built with tall triple-gate devices for 45nm node applications using 0.75NA 193nm lithography
Nackaerts, Axel; Ercken, Monique; Demuynck, Steven; Lauwers, Anne; Baerts, Christina; Bender, Hugo; Boullart, Werner; Collaert, Nadine; Degroote, Bart; Delvaux, Christie; de Marneffe, Jean-Francois; Dixit, Abhisek; De Meyer, Kristin; Hendrickx, Eric; Heylen, Nancy; Jaenen, Patrick; Laidler, David; Locorotondo, Sabrina; Maenhoudt, Mireille; Moelants, Myriam; Pollentier, Ivan; Ronse, Kurt; Rooyackers, Rita; Van Aelst, Joke; Vandenberghe, Geert; Vandervorst, Wilfried; Vandeweyer, Tom; Vanhaelemeersch, Serge; Van Hove, Marleen; Van Olmen, Jan; Verhaegen, Staf; Versluijs, Janko; Vrancken, Christa; Wiaux, Vincent; Jurczak, Gosia; Biesemans, Serge (2004-12) -
A methodology for double patterning compliant split and design
Wiaux, Vincent; Verhaegen, Staf; Iwamoto, Fumio; Maenhoudt, Mireille; Matsuda, Takashi; Postnikov, Sergey; Vandenberghe, Geert (2008) -
A methodology for the characterization of topography induced immersion bubble defects
Kocsis, Michael; De Bisschop, Peter; Maenhoudt, Mireille; Kim, Young-Chang; Wells, Greg; List, Scott; DiBiase, Tony (2005) -
Advanced optical lithography: double patterning options for 32 and 22nm node
Vandeweyer, Tom; Maenhoudt, Mireille; Vangoidsenhoven, Diziana; Gronheid, Roel; Versluijs, Janko; Miller, Andy; Bekaert, Joost; Truffert, Vincent; Wiaux, Vincent (2009) -
Advanced solutions for copper and low k technology
Beyer, Gerald; Baklanov, Mikhaïl; Brongersma, Sywert; De Roest, David; Donaton, R.; Grillaert, Joost; Lanckmans, Filip; Maenhoudt, Mireille; Maex, Karen; Richard, Emmanuel; Struyf, Herbert; Stucchi, Michele; Tokei, Zsolt; Van Hove, Marleen; Vervoort, Iwan (2000) -
Alternative double patterning processes: ready for (sub) 32nm hp
Wong, Patrick; Maenhoudt, Mireille; Vangoidsenhoven, Diziana; Wiaux, Vincent (2009) -
Alternative process schemes for double patterning that eliminate the intermediate etch step
Maenhoudt, Mireille; Gronheid, Roel; Stepanenko, Nickolay; Matsuda, Takashi; Vangoidsenhoven, Diziana (2008) -
An automated method for overlay sample plan optimization based on spatial variation modeling
Chen, X.; Preil, M. E.; Dussable, Mathilde; Maenhoudt, Mireille (2001) -
Applying a thin imaging resist system to substrates with topography
Neisser, M.; Grosev, G.; Maenhoudt, Mireille; Lepage, Muriel; Struyf, Herbert (2000) -
Back-end, low-k dielectric compatible resist rework procedure
Reybrouck, Mario; Vangoidsenhoven, Diziana; Maenhoudt, Mireille; Van Aelst, Joke; Boullart, Werner (2002) -
CD control comparison of step & repeat versus step & scan DUV lithography for sub-0.25 μm gate printing
Ronse, Kurt; Maenhoudt, Mireille; Marschner, Thomas; Van den hove, Luc; Streefkerk, B.; Finders, Jo; van Schoot, J.; Luehrmann, P.; Minvielle, A. (1998) -
Characterisation and integration feasibility of JSR's low-k dielectric LKD-5109
Das, Arabinda; Kokubo, Terukazu; Furukawa, Yukiko; Struyf, Herbert; Vos, Ingrid; Sijmus, Bram; Iacopi, Francesca; Van Aelst, Joke; Le, Quoc Toan; Carbonell, Laure; Brongersma, Sywert; Maenhoudt, Mireille; Tokei, Zsolt; Vervoort, Iwan; Sleeckx, Erik; Stucchi, Michele; Schaekers, Marc; Boullart, Werner; Rosseel, Erik; Van Hove, Marleen; Vanhaelemeersch, Serge; Shiota, A.; Maex, Karen (2002) -
Characterisation of JSR's spin-on hardmask FF-02
Das, Arabinda; Le, Quoc Toan; Furukawa, Yukiko; Nguyen Hoang, Viet; Terzieva, Valentina; de Theije, Femke; Whelan, Caroline; Maenhoudt, Mireille; Struyf, Herbert; Tokei, Zsolt; Iacopi, Francesca; Stucchi, Michele; Carbonell, Laure; Vos, Ingrid; Bender, Hugo; Patz, M.; Beyer, Gerald; Van Hove, Marleen; Maex, Karen (2003) -
Characterization of PVD TaN and ALD WNxCy copper diffusion barriers on a porous CVD low-k material
Travaly, Youssef; Kemeling, N.; Maenhoudt, Mireille; Peeters, S.; Tokei, Zsolt; Abell, Thomas; Schuhmacher, Jörg; Turturro, S.; Vos, Ingrid; Eugene, Lino; Matsuki, N.; Fukazawa, A.; Goundar, K.; Satoh, K.; Kato, M.; Kaneko, S.; Vertommen, Johan; Sprey, Hessel; Van Hove, Marleen; Jonas, A.; Maex, Karen (2004) -
Checking design conformance and optimizing manufacturability using automated double-patterning decomposition
Cork, Christopher M.; Ward, Brian; Barnes, Levi D.; Painter, Ben; Lucas, Kevin; Luk-Pat, Gerry; Wiaux, Vincent; Verhaegen, Staf; Maenhoudt, Mireille (2008) -
CMOS 32nm technology node: business as usual for interconnect damascene patterning?
Beyer, Gerald; Ciofi, Ivan; Van Olmen, Jan; Carbonell, Laure; Versluijs, Janko; Wiaux, Vincent; Op de Beeck, Maaike; Maenhoudt, Mireille; Struyf, Herbert; Hendrickx, Dirk; de Marneffe, Jean-Francois; Vereecke, Guy; Claes, Martine; Bearda, Twan; Volders, Henny; Heylen, Nancy; Travaly, Youssef; Stucchi, Michele; Tokei, Zsolt; Cartuyvels, Rudi (2008-12) -
Comparison of LFLE and LELE manufacturability
Miller, Andy; Maenhoudt, Mireille; Vangoidsenhoven, Diziana; Murdoch, Gayle; Shioya, Takeo; Hoshiko, Kenji (2008)