Browsing by author "Maenhoudt, Mireille"
Now showing items 21-40 of 92
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Contact layer printing at 0.28k1 by means of double line exposure and negative tone development
Bekaert, Joost; Maenhoudt, Mireille; Vandenberghe, Geert; Reybrouck, Mario (2008) -
Critical assessment of error budget components in double patterning immersion lithography
Hepp, Birgitt; Finders, Jo; Dusa, Mircea; Vleeming, Bert; Megens, henry; Maenhoudt, Mireille; Cheng, Shaunee; Vandeweyer, Tom (2008) -
Cu/LKD-5109 damascene integration demonstration using FF-02 low-k spin-on hard-mask and embedded etch-stop
Kokubo, Terukazu; Das, Arabinda; Furukawa, Yukiko; Vos, Ingrid; Iacopi, Francesca; Struyf, Herbert; Van Aelst, Joke; Maenhoudt, Mireille; Tokei, Zsolt; Vervoort, Iwan; Bender, Hugo; Stucchi, Michele; Schaekers, Marc; Boullart, Werner; Van Hove, Marleen; Vanhaelemeersch, Serge; Peterson, William; Shiota, A.; Maex, Karen (2002) -
Current status of 193 nm immersion lithography and outlook to the future
Ronse, Kurt; Cheng, Shaunee; Ercken, Monique; Leunissen, Peter; Maenhoudt, Mireille; Vandenberghe, Geert; Van den hove, Luc (2005) -
Dense lines created by spacer DPT scheme: process control by local dose adjustment using advanced scanner control
Finders, Jo; Dusa, Mircea; Vleeming, Bert; Fliervoet, Timon; Hepp, Birgitt; Megens, henry; Groenendijk, Remco; Quaedackers, John; Mos, Evert; Leewis, Christian; Bornebroek, Frank; Maenhoudt, Mireille; Leblans, Marc; Vandeweyer, Tom; Murdoch, Gayle; Altamirano Sanchez, Efrain (2009) -
Detection of split design-related weak points in double patterning using PQW and bright-field defect inspection
Van Den Heuvel, Dieter; Cheng, Shaunee; Leray, Philippe; Wiaux, Vincent; Maenhoudt, Mireille; D'have, Koen; Jaenen, Patrick; Marcuccilli, Gino; Malik, Irfan; Klein, Sophie (2008) -
Double litho, double etch (LELE) process challenges for 22nm HP and beyond
Maenhoudt, Mireille; Wiaux, Vincent; Cheng, Shaunee; Vandenberghe, Geert; Ronse, Kurt (2008) -
Double patternig scheme for sub-0.25 k1 single damascene structures at NA=0.75, l=193nm
Maenhoudt, Mireille; Versluijs, Janko; Struyf, Herbert; Van Olmen, Jan; Van Hove, Marleen (2005) -
Double patterning for 32-nm and below: an update
Finders, Jo; Dusa, Mircea; Vleeming, Bert; Hepp, Birgitt; Megens, Henry; Maenhoudt, Mireille; Cheng, Shaunee; Vandeweyer, Tom (2008) -
Double patterning lithography for 32 nm: critical dimensions uniformity and overlay control considerations
Finders, Jo; Dusa, Mircea; Vleeming, Bert; Hepp, Birgitt; Maenhoudt, Mireille; Cheng, Shaunee; Vandeweyer, Tom (2009) -
Double patterning lithography: reducing the cost
Miller, Andy; Provoost, Jan; Maenhoudt, Mireille (2009) -
Double patterning process development at IMEC
Maenhoudt, Mireille; Vangoidsenhoven, Diziana; Vandeweyer, Tom; Gronheid, Roel; Versluijs, Janko; Miller, Andy (2008) -
Double patterning process with resist freezing technique
Hoshiko, Kenji; Shioya, Takeo; Fujiwara, Koichi; Yamaguchi, Yoshikazu; Shimokawa, Tsutomu; Maenhoudt, Mireille; Miller, Andy; Vangoidsenhoven, Diziana (2008) -
Double patterning: from split to process control
Wiaux, Vincent; Ercken, Monique; Maenhoudt, Mireille; Cheng, Shaunee (2007) -
Dual damascene back-end patterning using 248nm and 193nm lithography
Pollentier, Ivan; Maenhoudt, Mireille; Wiaux, Vincent; Vangoidsenhoven, Diziana; Ronse, Kurt (2000) -
Dual damascene patterning for full spin-on stack of porous low-K material
Furukawa, Yukiko; Kokubo, Terukazu; Struyf, Herbert; Maenhoudt, Mireille; Vanhaelemeersch, Serge; Gravesteijn, Dirk (2002) -
Exploration of etch step interactions in the dual patterning process for process modeling
Melvin, Lawrence; Ward, Brian; Song, H.; Rhie, S.U.; Lucas, K.D.; Wiaux, Vincent; Verhaegen, Staf; Maenhoudt, Mireille (2008) -
Extreme scaling of optical lithography: overview of process integration issues
Ronse, Kurt; Wiaux, Vincent; Verhaegen, Staf; Van Look, Lieve; Bekaert, Joost; Laidler, David; Cheng, Shaunee; Maenhoudt, Mireille; Vandenberghe, Geert; Dusa, Mircea (2009) -
Feasibility of printing 0.1μm technology with optical lithography
Maenhoudt, Mireille; Verhaegen, Staf; Ronse, Kurt; Flagello, D.; Geh, B.; Kaiser, W. (1999) -
Immersion lithography and double patterning in advanced microelectronics
Vandeweyer, Tom; Bekaert, Joost; Ercken, Monique; Gronheid, Roel; Miller, Andy; Truffert, Vincent; Verhaegen, Staf; Versluijs, Janko; Wiaux, Vincent; Wong, Patrick; Vandenberghe, Geert; Maenhoudt, Mireille (2010)