Browsing by author "Van Autryve, Luc"
Now showing items 1-13 of 13
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Characterization and integration of a new Si-O-C film deposited by CVD
Alves Donaton, Ricardo; Struyf, Herbert; Lepage, Muriel; Coenegrachts, Bart; Stucchi, Michele; De Roest, David; Baklanov, Mikhaïl; Vanhaelemeersch, Serge; Maex, Karen; Gaillard, F.; Xia, L. Q.; Lim, T. H.; Gotuaco, M.; Yieh, E.; Van Autryve, Luc (2001) -
Development of an SBT MOCVD production process for FERAM applications
Everaert, Jean-Luc; Bartic, Andrei; Kaczer, Ben; Wouters, Dirk; Monchoix, Hervé; Mitaut, Christian; Van Autryve, Luc; Pavano, Rita; Casella, Patrizia; Zambrano, R. (2001) -
Electrical properties of MOCVD HfO2 dielectric layers with polysilicon gate electrodes for CMOS applications
Date, Lucien; Rittersma, Chris; Massoubre, D.; Ponomarev, Youri; Roozeboom, F.; Pique, Didier; Van Autryve, Luc; Van Elshocht, Sven; Caymax, Matty (2003) -
Impact of material/process interactions on the properties of a porous CVD-O3 low-k dielectric film
Travaly, Youssef; Eyckens, Brenda; Carbonell, Laure; Rothschild, Aude; Le, Quoc Toan; Brongersma, Sywert; Ciofi, Ivan; Struyf, Herbert; Furukawa, Yukiko; Stucchi, Michele; Schaekers, Marc; Bender, Hugo; Rosseel, Erik; Vanhaelemeersch, Serge; Maex, Karen; Gaillard, F.; Van Autryve, Luc; Rabinzohn, P. (2002) -
Integration of ferroelectric SrBi2Ta2O9-based capacitors beyond 0.18 CMOS technology
Johnson, J.; Goux, Ludovic; Schwitters, Michael; Paraschiv, Vasile; Maes, David; Haspeslagh, Luc; Wouters, Dirk; Caputa, Concetta; Casella, C.; Zambrano, R.; Vecchio, Emma; Monchoix, Hervé; Van Autryve, Luc; Lisoni, Judit (2003) -
Integration of ferroelectric SrBi2Ta2O9-based capacitors in 0.35 μm CMOS technology
Lisoni, Judit; Johnson, Jo; Goux, Ludovic; Schwitters, Michael; Paraschiv, Vasile; Maes, David; Haspeslagh, Luc; Caputa, Concetta; Casella, P.; Zambrano, R.; Vecchio, G.; Monchoix, H.; Van Autryve, Luc; Wouters, Dirk (2004) -
Integration of MOCVD SBT stacked ferroelectric capacitors in a 0.35 μm CMOS technology
Maes, David; Everaert, Jean-Luc; Goux, Ludovic; Lisoni, Judit; Paraschiv, Vasile; Schwitters, M.; Haspeslagh, Luc; Wouters, Dirk; Artoni, C.; Caputa, Concetta; Casella, P.; Corallo, G.; Russo, G.; Zambrano, R.; Monchoix, H.; Van Autryve, Luc (2004) -
Integration of MOCVD SBT stacked ferroelectric capacitors in A 0.35um CMOS technology
Maes, David; Everaert, Jean-Luc; Goux, Ludovic; Lisoni, Judit; Paraschiv, Vasile; Schuster, Thomas; Haspeslagh, Luc; Wouters, Dirk; Artoni, C.; Caputa, Concetta; Casella, P.; Corallo, G.; Russo, G.; Zambrano, R.; Monchoix, H.; Van Autryve, Luc (2004) -
Integration of SrBi2Ta2O9 (SBT) based FRAM capacitors: plasma etch issues and solutions
Paraschiv, Vasile; Boullart, Werner; Vanhaelemeersch, Serge; Lisoni, Judit; Schwitters, Michael; Maes, David; Wouters, Dirk; Casella, P.; Zambrano, R.; Vecchio, G.; Van Autryve, Luc (2004) -
Oxygen barrier for stacked SBT-FeCAP on W-plugs
Zambrano, R.; Casella, Patrizia; Corvasce, C.; Monchoix, Hervé; Van Autryve, Luc; Lisoni, Judit; Maes, David; Everaert, Jean-Luc; Johnson, Jo; Paraschiv, Vasile; Haspeslagh, Luc; Wouters, Dirk (2002) -
Spacers alternatives for integration of 3D stacked SBT FeCAPs
Lisoni, Judit; Johnson, J.; Everaert, Jean-Luc; Paraschiv, Vasile; Boullart, Werner; Maes, David; Haspeslagh, Luc; Wouters, Dirk; Caputa, Concetta; Casella, P.; Zambrano, R.; Vecchio, Emma; Monchoix, Hervé; Van Autryve, Luc (2003) -
SrBi2Ta2O2 Patterning for feram applications: a dry -wet approach
Paraschiv, Vasile; Boullart, Werner; Vanhaelemeersch, Serge; Wouters, Dirk; Vecchio, Emma; Fragala, Maria-Elena; Van Autryve, Luc; Monchoix, Hervé; Casella, Patrizia; Zambrano, Raffaele (2003) -
Use of a purged FOUP to improve H-terminated silicon surface stability prior to epitaxial growth
Wostyn, Kurt; Rondas, Dirk; Kenis, Karine; Loo, Roger; Hikavyy, Andriy; Douhard, Bastien; Mertens, Paul; Holsteyns, Frank; De Gendt, Stefan; D'Urzo, Lucia; Van Autryve, Luc (2014)