Browsing by author "Kaiser, M."
Now showing items 1-17 of 17
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45nm nMOSFET with metal gate on thin SiON driving 1150μA/μm and off-state of 10nA/μm
Henson, Kirklen; Lander, Rob; Demand, Marc; Dachs, Charles; Kaczer, Ben; Deweerd, Wim; Schram, Tom; Tokei, Zsolt; Hooker, Jacob; Cubaynes, Florence; Beckx, Stephan; Boullart, Werner; Coenegrachts, Bart; Vertommen, Johan; Richard, Olivier; Bender, Hugo; Vandervorst, Wilfried; Kaiser, M.; Everaert, Jean-Luc; Jurczak, Gosia; Biesemans, Serge (2004) -
A manufacturable 25nm planar MOSFET technology
Ponomarev, Youri; Loo, Josine; Dachs, Charles; Cubaynes, Florence; Verheijen, M. A.; Kaiser, M.; van Berkum, J. G. M.; Kubicek, Stefan; Bolk, J.; Rovers, Madelon (2001) -
Advanced PMOS device architecture for highly-doped ultra-shallow junctions
Surdeanu, Radu; Pawlak, Bartek; Lindsay, Richard; Van Dal, Mark; Doornbos, Gerben; Dachs, C.J.J.; Ponomarev, Youri; Loo, Josine; Cubaynes, Florence; Henson, Kirklen; Verheijen, M.A.; Kaiser, M.; Pagès, Xavier; Stolk, Peter; Jurczak, Gosia (2004) -
Atomistic modeling of impurity ion implantation in ultra-thin-body Si devices
Pelaz, L.; Duffy, Ray; Aboy, M.; Marques, L.; Lopez, P.; Santos, I.; Pawlak, Bartek; Van Dal, Mark; Duriez, Blandine; Merelle, Thomas; Doornbos, Gerben; Collaert, Nadine; Witters, Liesbeth; Rooyackers, Rita; Vandervorst, Wilfried; Jurczak, Gosia; Kaiser, M.; Weemaes, R.; Van Berkum, J.; Breimer, P.; Lander, Rob (2008) -
Characterization of thermal and electrical stability of MOCVD HfO2-HfSiO4 dielectric layers with polysilicon electrodes for advanced CMOS technologies
Rittersma, Chris; Loo, Josine; Ponomarev, Youri; Verheijen, M.A.; Kaiser, M.; Roozeboom, F.; Van Elshocht, Sven; Caymax, Matty (2004) -
Gatestacks for scalable high-performance FinFETs
Vellianitis, Georgios; Van Dal, Mark; Witters, Liesbeth; Curatola, Gilberto; Doornbos, Gerben; Collaert, Nadine; Jonville, C.; Torregiani, Cristina; Lai, Li-Shyue; Petry, Jasmine; Pawlak, Bartek; Duffy, Ray; Demand, Marc; Beckx, Stephan; Mertens, Sofie; Delabie, Annelies; Vandeweyer, Tom; Delvaux, Christie; Leys, Frederik; Hikavyy, Andriy; Rooyackers, Rita; Kaiser, M.; Weemaes, R.G.R.; Voogt, F.; Roberts, H.; Donnet, D.; Biesemans, Serge; Jurczak, Gosia; Lander, Rob (2007) -
Highly manufacturable FinFETs with sub-10nm fin width and high aspect ratio fabricated with immersion lithography
Van Dal, Mark; Collaert, Nadine; Doornbos, Gerben; Vellianitis, Georgios; Curatola, Gilberto; Pawlak, Bartek; Duffy, Ray; Jonville, Carole; Degroote, Bart; Altamirano Sanchez, Efrain; Kunnen, Eddy; Demand, Marc; Beckx, Stephan; Vandeweyer, Tom; Delvaux, Christie; Leys, Frederik; Hikavyy, Andriy; Rooyackers, Rita; Kaiser, M.; Weemaes, R.G.R.; Biesemans, Serge; Jurczak, Gosia; Kottantharayil, Anil; Witters, Liesbeth; Lander, Rob (2007) -
Improved fin width scaling in fully-depleted FinFETs
Duffy, Ray; Van Dal, Mark; Pawlak, Bartek; Collaert, Nadine; Witters, Liesbeth; Rooyackers, Rita; Kaiser, M.; Weemaes, R. G. R.; Jurczak, Gosia; Lander, Rob (2008) -
Island growth in the atomic layer deposition of zirconium oxide and aluminium oxide on hydrogen-terminated silicon: growth mode modelling and transmission electron microscopy
Puurunen, Riikka; Vandervorst, Wilfried; Besling, Wim F. A.; Richard, Olivier; Bender, Hugo; Conard, Thierry; Zhao, Chao; Delabie, Annelies; Caymax, Matty; De Gendt, Stefan; Heyns, Marc; Viitanen, M.M.; De Ridder, M.; Brongersma, Hidde; Tamminga, Y.; Dao, T.; de Win, T.; Verheijen, M.; Kaiser, M.; Tuominen, M. (2004) -
Laser annealing for ultra-shallow junction formation in advanced CMOS
Surdeanu, Radu; Ponomarev, Youri; Cerutti, R.; Pawlak, Bartek; Nanver, L.K.; Hoflijk, Ilse; Stolk, Peter; Dachs, Charles; Verheijen, M.A.; Kaiser, M.; Hopstaken, M.J.P.; van Berkum, J.G.M.; Roozeboom, F.; Lindsay, Richard (2002) -
Material aspects and challenges for SOI FinFET integration
Van Dal, Mark; Vellianitis, Georgios; Duffy, Ray; Doornbos, Gerben; Pawlak, Bartek; Duriez, Blandine; Lai, Li-Shyue; Hikavyy, Andriy; Vandeweyer, Tom; Demand, Marc; Altamirano Sanchez, Efrain; Rooyackers, Rita; Witters, Liesbeth; Collaert, Nadine; Jurczak, Gosia; Kaiser, M.; Weemaes, R. G. R.; Lander, Rob (2008) -
Materials issues of Ni fully silicided (FUSI) gates for CMOS applications
Kittl, Jorge; Lauwers, Anne; Kmieciak, Malgorzata; Demeurisse, Caroline; Kottantharayil, Anil; Veloso, Anabela; Van Dal, Mark; Schram, Tom; Brijs, Bert; Kaiser, M.; Kubicek, Stefan; Cunniffe, John; Verbeeck, Rita; Vrancken, Christa; Biesemans, Serge; Maex, Karen (2005-05) -
Performance improvement in narrow MuGFETs by gate work function and source/drain implant engineering
Ferain, Isabella; Duffy, Ray; Collaert, Nadine; Van Dal, Mark; Pawlak, Bartek; O'Sullivan, Barry; Witters, Liesbeth; Rooyackers, Rita; Conard, Thierry; Popovici, Mihaela Ioana; Van Elshocht, Sven; Kaiser, M.; Weemaes, R.; Swerts, Johan; Jurczak, Gosia; Lander, Rob; De Meyer, Kristin (2009) -
Pre-amorphization and co-implantation suitability for advanced PMOS devices integration
Surdeanu, Radu; Pawlak, Bartek; Lindsay, Richard; Van Dal, Mark; Doornbos, Gerben; Dachs, Charles; Ponomarev, Youri; Loo, Josine; Henson, Kirklen; Verheijen, M.; Kaiser, M.; Pagès, Xavier; Jurczak, Gosia; Stolk, Peter (2003) -
Silicides for advanced CMOS devices
Lauwers, Anne; Kittl, Jorge; Van Dal, Mark; Chamirian, Oxana; Kmieciak, Malgorzata; Torregiani, Cristina; Liu, J.; Benedetti, Alessandro; Richard, Olivier; Bender, Hugo; van Berkum, J.G.M.; Kaiser, M.; Veloso, Anabela; Kottantharayil, Anil; de Potter de ten Broeck, Muriel; Maex, Karen (2005) -
Solid phase epitaxy versus random nucleation and growth in sub-20 nm wide fin field-effect transistors
Duffy, Ray; Van Dal, Mark; Pawlak, Bartek; Kaiser, M.; Weemaes, R.G.R.; Degroote, Bart; Kunnen, Eddy; Altamirano Sanchez, Efrain (2007) -
The relation between phase formation and onset of thermal degradation in nano-scale CoSi2-polycrystalline silicon structures
Van Dal, Mark; Jawarani, D.; van Berkum, J.G.M.; Kaiser, M.; Kittl, Jorge; Vrancken, Christa; de Potter de ten Broeck, Muriel; Lauwers, Anne; Maex, Karen (2004-12)