Browsing by imec author "e632831b6ad7576998b3cf24720d40acca7a111e"
Now showing items 21-40 of 68
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Cu/Low-k thickness measurement for advanced Cu CMP process development and control
Li, Yunlong; Heylen, Nancy; Delande, Tinne; Kellens, Kristof; Ong, Patrick; Leunissen, Peter; Tarnowka, Alexandre; Eliyahu, Aviv (2009-03) -
Defect-free isolation on high-thermal-conductivity SOI substrates for complementary BiCMOS technology
Van Wichelen, Koen; Ong, Patrick; Moussa, Alain; Radisic, Dunja; Devriendt, Katia; Halder, Sandip; Kenis, Karine; Lee, Willie; Vandevelde, Bart; Soonekindt, Christophe; Shahar, Abdul Hadi; Smet, Tom; Van Huylenbroeck, Stefaan; Decoutere, Stefaan; Seacrist, Mike; Ries, Mike; Drobny, Vladimir; Wise, Rick (2009) -
Demonstration of scaled 0.099μm² FinFET 6T-SRAM cell using full-field EUV lithography for (Sub-)22nm node single-patterning technology
Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Locorotondo, Sabrina; Lazzarino, Frederic; Altamirano Sanchez, Efrain; Huffman, Craig; De Keersgieter, An; Brus, Stephan; Demand, Marc; Struyf, Herbert; De Backer, Johan; Hermans, Jan; Delvaux, Christie; Baudemprez, Bart; Vandeweyer, Tom; Van Roey, Frieda; Baerts, Christina; Goossens, Danny; Dekkers, Harold; Ong, Patrick; Heylen, Nancy; Kellens, Kristof; Volders, Henny; Hikavyy, Andriy; Vrancken, Christa; Rakowski, Michal; Verhaegen, Staf; Dusa, Mircea; Romijn, Leon; Pigneret, Charles; van Dijk, Andre; Schreutelkamp, Rob; Cockburn, Andrew; Gravey, Virginie; Meiling, H.; Hultermans, B.; Lok, S.; Shah, K.; Rajagopalan, R.; Gelatos, J.; Richard, Olivier; Bender, Hugo; Vandenberghe, Geert; Beyer, Gerald; Absil, Philippe; Hoffmann, Thomas Y.; Ronse, Kurt; Biesemans, Serge (2009-12) -
Development of a dielectric CMP process for replacement gate applications
Devriendt, Katia; Ong, Patrick; Kellens, Kristof; Veloso, Anabela; Crabbe, Yvo; Brus, Stephan; Claes, Martine; Leunissen, Peter (2010) -
Dummy design characterization for STI CMP with fixed abrasive
Tsvetanova, Diana; Devriendt, Katia; Ong, Patrick; Vandeweyer, Tom; Delande, Tinne; Chew, Soon Aik; Horiguchi, Naoto; Struyf, Herbert (2014-11) -
Dummy gate amorphous silicon CMP using in-situ profile CLC endpoint system for advanced FinFET
Tsvetanova, Diana; Iizumi, Takeshi; Ito, Ban; Royere, Gael; Durix, Fabien; Devriendt, Katia; Ong, Patrick; Struyf, Herbert (2017) -
Electrical characteristics of P-type bulk Si fin field-effect transistor using solid-source doping with 1-nm phosphosilicate glass
Kikuchi, Yoshiaki; Chiarella, Thomas; De Roest, David; Blanquart, Timothee; De Keersgieter, An; Kenis, Karine; Peter, Antony; Ong, Patrick; Van Besien, Els; Tao, Zheng; Kim, Min-Soo; Kubicek, Stefan; Chew, Soon Aik; Schram, Tom; Demuynck, Steven; Mocuta, Anda; Mocuta, Dan; Horiguchi, Naoto (2016) -
Environmental and health risks due to CMP of III/V materials
Ong, Patrick (2011) -
Fabrication of high qualtiy Ge virtual substrates by selective epitaxial growth in shallow trench isolated Si (001) trenches
Wang, Gang; Loo, Roger; Takeuchi, Shotaro; Souriau, Laurent; Lin, Vic; Moussa, Alain; Bender, Hugo; De Jaeger, Brice; Ong, Patrick; Lee, Willie; Meuris, Marc; Caymax, Matty; Vandervorst, Wilfried; Blanpain, Bart; Heyns, Marc (2010) -
First demonstration of MOVPE In1-xGaxAs macaroni channel for 3-D NAND memory devices
Ramesh, Siva; Vadakupudhu Palayam, Senthil; Rosseel, Erik; Arreghini, Antonio; Kunert, Bernardette; Baryshnikova, Marina; Zhang, Liping; Ong, Patrick; Teugels, Lieve; Pak, Murat; Jossart, Nico; Raymaekers, Tom; Stiers, Jimmy; Van den Bosch, Geert; Furnemont, Arnaud (2019) -
Full-field EUV and immersion lithography integration in 0.186μm² FinFET 6T-SRAM cell
Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Demand, Marc; de Marneffe, Jean-Francois; Altamirano Sanchez, Efrain; De Keersgieter, An; Delvaux, Christie; De Backer, Johan; Brus, Stephan; Hermans, Jan; Baudemprez, Bart; Van Roey, Frieda; Lorusso, Gian; Baerts, Christina; Goossens, Danny; Vrancken, Christa; Mertens, Sofie; Versluijs, Janko; Truffert, Vincent; Huffman, Craig; Laidler, David; Heylen, Nancy; Ong, Patrick; Parvais, Bertrand; Rakowski, Michal; Verhaegen, Staf; Hikavyy, Andriy; Meiling, H.; Hultermans, B.; Romijn, L.; Pigneret, C.; Lok, S.; Van Dijk, A.; Shah, K.; Noori, A.; Gelatos, J.; Arghavani, R.; Schreutelkamp, Rob; Boelen, Pieter; Richard, Olivier; Bender, Hugo; Witters, Liesbeth; Collaert, Nadine; Rooyackers, Rita; Absil, Philippe; Lauwers, Anne; Jurczak, Gosia; Hoffmann, Thomas Y.; Vanhaelemeersch, Serge; Cartuyvels, Rudi; Ronse, Kurt; Biesemans, Serge (2008) -
Fundamental investigation of chemical mechanical polishing of GaAs in ailica dispersions: Material removal and arsenic trihydride formation pathways
Ong, Patrick; Matovu, J.B.; Leunissen, Peter; Krishnan, Sitaraman; Babu, S.V. (2013) -
Future trends of semiconductor process technology
Ong, Patrick; Tokei, Zsolt; Thean, Aaron; Horiguchi, Naoto (2012) -
Ge CMP process development
Ong, Patrick; Leunissen, Peter; Ansar, Sheik; Gillot, Christophe; Lan, Yongqing; Noller, Bastian; Li, Yuzhuo (2012) -
Ge STI CMP using fixed abrasive pads
Zhao, Ming; Ong, Patrick; Leunissen, Peter (2011) -
Ge, III/V Materials CMP
Ong, Patrick; Lan, Yongqing; Noller, Bastian; Gillot, Christophe; Usman Ibrahim, Ansar; Lauter, Michael; Golzarian, Reza; Li, Yuzhuo (2012) -
Ge- and III/V-CMP for integration of high mobility channel materials
Ong, Patrick; Witters, Liesbeth; Waldron, Niamh; Leunissen, Peter (2011) -
High yield sub-0.1μm² 6T-SRAM Cells, featuring high-k/metal-gate Finfet devices, double gate patterning, a novel Fin etch strategy, full-field EUV lithography and optimized junction design & layout
Horiguchi, Naoto; Demuynck, Steven; Ercken, Monique; Locorotondo, Sabrina; Lazzarino, Frederic; Altamirano Sanchez, Efrain; Huffman, Craig; Brus, Stephan; Demand, Marc; Struyf, Herbert; De Backer, Johan; Hermans, Jan; Delvaux, Christie; Vandeweyer, Tom; Baerts, Christina; Mannaert, Geert; Truffert, Vincent; Verluijs, j; Alaerts, Wilfried; Dekkers, Harold; Ong, Patrick; Heylen, Nancy; Kellens, Kristof; Volders, Henny; Hikavyy, Andriy; Vrancken, Christa; Rakowski, Michal; Verhaegen, Staf; Vandenberghe, Geert; Beyer, Gerald; Lauwers, Anne; Absil, Philippe; Hoffmann, Thomas Y.; Ronse, Kurt; Biesemans, Serge (2010) -
Highly uniform and low-loss passive silicon photonics devices using a 300mm CMOS platform
Selvaraja, Shankar; De Heyn, Peter; Winroth, Gustaf; Ong, Patrick; Lepage, Guy; Cailler, Celine; Rigny, Arnaud; Bourdelle, Konstantin; Bogaerts, Wim; Van Thourhout, Dries; Van Campenhout, Joris; Absil, Philippe (2014) -
Hybrid fixed abrasive CMP for 65 nm STI integration, FinFet structures and other advanced applications
Ong, Patrick; Devriendt, Katia; Redolfi, Augusto (2008)