Browsing by author "De Witte, Hilde"
Now showing items 1-20 of 49
-
ALCVD hafnium silicates for low power gate stacks
Maes, Jan; Laitinen, O.; De Witte, Hilde; Deweerd, Wim; Delabie, Annelies; Conard, Thierry; Brijs, Bert; Wang, C. - G.; Velasco, H.; Wilk, G. (2004) -
Alternative gate insulator materials for future generation MOSFETs
Heyns, Marc; Bender, Hugo; Carter, Richard; Caymax, Matty; Conard, Thierry; De Gendt, Stefan; Degraeve, Robin; De Witte, Hilde; Groeseneken, Guido; Haukka, S.; Henson, Kirklen; Houssa, Michel; Kubicek, Stefan; Maes, Jos; Naili, Mohamed; Nohira, Hiroshi; Tsai, Wilman; Tuominen, Marko; Vandervorst, R.; Wilhelm, Rudi; Young, Edward; Zhao, Chao (2001) -
Analytical characterization of new high k dielectric stacks
De Witte, Hilde; Conard, Thierry; Bender, Hugo; Vandervorst, Wilfried (2000) -
Artifacts in SIMS depth profiling
Vandervorst, Wilfried; De Witte, Hilde; Tian, Chunsheng; Geenen, Luc (1997) -
Capablities of TOF-SIMS to study the influence of different oxidation conditions on metal contamination redistribution
De Witte, Hilde; De Gendt, Stefan; Douglas, M.; Conard, Thierry; Kenis, Karine; Mertens, Paul; Vandervorst, Wilfried; Gijbels, Renaat (1999) -
Characterization of (ultra)thin dielectrica
Vandervorst, Wilfried; De Witte, Hilde; Conard, Thierry; Janssens, Tom; Schaekers, Marc; Brijs, Bert; Houssa, Michel (2000) -
Characterization of ultra thin oxynitrides, a general approach
Brijs, Bert; Deleu, Jeroen; Conard, Thierry; De Witte, Hilde; Vandervorst, Wilfried; Nakajima, K.; Kimura, K.; Genchev, I.; Bergmaier, A.; Goergens, I.; Neumaier, P.; Dollinger, G.; Dobeli, M. (1999) -
Characterization of ultra thin oxynitrides: a general approach
Brijs, Bert; Deleu, Jeroen; Conard, Thierry; De Witte, Hilde; Vandervorst, Wilfried; Nakajima, K.; Kimura, K.; Genchev, I.; Bermaier, A.; Goergens, L.; Neumaier, P.; Dollinger, G.; Döbeli, M. (2000) -
Energy and angular dependent profiling of thin (0.5 - 2.5 nm) oxide layers
Vandervorst, Wilfried; Conard, Thierry; De Witte, Hilde; Cooke, G. A. (1999) -
Engineering ALCVD HfSiO gate stacks for LSTP applications
Swerts, Johan; Deweerd, Wim; De Witte, Hilde; Maes, Jan; Wilk, Glenn; Delabie, Annelies (2005) -
Evaluation of Nb(Si)N as metal gate material
Van Hoornick, Nausikaa; De Witte, Hilde; Witters, Thomas; Zhao, Chao; Conard, Thierry; Huatori, H.; Swerts, Johan; Schram, Tom; Maes, Jan; De Gendt, Stefan; Heyns, Marc (2005) -
Evaluation of time-of-flight secondary ion mass spectrometry for metal contamination monitoring on Si wafer surfaces
De Witte, Hilde; De Gendt, Stefan; Douglas, M.; Conard, Thierry; Kenis, Karine; Mertens, Paul; Vandervorst, Wilfried; Gijbels, Renaat (2000) -
Fundamental study of ion-substrate interactions with low energy reactive ions
De Witte, Hilde (2001-03) -
High k dielectric materials prepared by atomic layer CVD
Heyns, Marc; Bender, Hugo; Carter, Richard; Caymax, Matty; Conard, Thierry; De Gendt, Stefan; Degraeve, Robin; De Witte, Hilde; Groeseneken, Guido; Haukka, S.; Henson, Kirklen; Houssa, Michel; Kubicek, Stefan; Maes, Guido; Naili, Mohamed; Nohira, Hiroshi; Tsai, Wilman; Tuominen, Marko; Vandervorst, Wilfried; Wilhelm, Rudi; Yang, E.; Zhao, Chao (2001) -
High resolution dopant/carrier profiling for deep submicron technologies
Vandervorst, Wilfried; Clarysse, Trudo; De Wolf, Peter; Eyben, Pierre; Haegeman, Bart; Xu, Mingwei; Trenkler, Thomas; Hantschel, Thomas; Stephenson, Robert; Conard, Thierry; De Witte, Hilde (1999) -
Improved phosphoric acid mixtures for nitride strip
Vos, Rita; Lux, Marcel; Conard, Thierry; De Witte, Hilde; Mertens, Paul; Heyns, Marc; Hatcher, Z. (2001) -
In-line electrical metrology for high-k gate dielectrics deposited by atomic layer chemical vapour deposition
De Witte, Hilde; Maes, Jan; Passefort, S.; Besling, W.; Eason, K.; Young, E.; Rittersma, Chris; Heyns, Marc (2002-09) -
In-line electrical metrology for high-k gate dielectrics deposited by atomic layer CVD
De Witte, Hilde; Passefort, Sophie; Besling, Wim; Maes, Jos; Eason, K.; Young, Edward; Heyns, Marc (2002) -
In-line electrical metrology for high-k gate dielectrics deposited by atomic layer CVD
De Witte, Hilde; Passefort, Sophie; Besling, Wim; Maes, Jan; Eason, K.; Young, Edward; Rittersma, Chris; Heyns, Marc (2003) -
Influence of oxygen on the analysis of oxynitrides: N-diffusion or ionization?
De Witte, Hilde; Conard, Thierry; Vandervorst, Wilfried (2000)