Browsing by author "Pollentier, Ivan"
Now showing items 21-40 of 123
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CNTs in the context of EUV pellicle history
Gallagher, Emily; Timmermans, Marina; Pollentier, Ivan; Lee, Jae Uk; Mariano Juste, Marina; Adelmann, Christoph; Huyghebaert, Cedric; Scholze, Frank; Laubis, Christian (2018) -
Collaborative work on reducing the intersite gaps in outgassing qualification
Inoue, Soichi; Shiobara, Eishi; Sasami, Takeshi; Takagi, Isamu; Kikuchi, Yukiko; Fujimori, Toru; Minegishi, Shinya; Berg, Robert; Lucatorto, Thomas; Hill, Shannon; Tanio, Charles; Pollentier, Ivan; Lin, Yen-Chih; Fan, Yu-Jen; Ashworth, Dominic (2015) -
Comparison of pattern placement errors as measured using traditional overlay targets and design rule structures
Leray, Philippe; Laidler, David; Pollentier, Ivan (2003) -
Correlation of EUV optics contamination and the photoresist chemistry
Pollentier, Ivan; Neira, Imanol; Goethals, Mieke; Gronheid, Roel (2010) -
Dependence of EUV mask printing performance on blank architecture
Jonckheere, Rik; Hyun, Yoonsuk; Iwamoto, Fumio; Baudemprez, Bart; Hermans, Jan; Lorusso, Gian; Pollentier, Ivan; Goethals, Mieke; Ronse, Kurt (2008-03) -
Development of non-chemically amplified photoresists for extreme ultraviolet (EUV) lithography
Lawrie, Kirsten; Blakey, Idriss; Blinco, James; Gronheid, Roel; Jack, Kevin; Pollentier, Ivan; Leeson, Michael; Younkin, Todd R.; Whittaker, Andrew K. (2009) -
Direct comparison of resist outgassing and optics contamination using in-band EUV photon exposure and e-beam exposure from several EUV sensitive resists
Perera, Rupert c.; Pollentier, Ivan; Underwood, James H.; Houser, David C. (2012) -
Dual damascene back-end patterning using 248nm and 193nm lithography
Pollentier, Ivan; Maenhoudt, Mireille; Wiaux, Vincent; Vangoidsenhoven, Diziana; Ronse, Kurt (2000) -
Effect of molecular weight on the EUV-printability of main chain scission type polymers
Rathore, Ashish; Pollentier, Ivan; Singh, Harpreet; Fallica, Roberto; De Simone, Danilo; De Gendt, Stefan (2020) -
Effects of different processing conditions on line edge roughness for 193-nm and 157-nm resists
Ercken, Monique; Leunissen, Peter; Pollentier, Ivan; Patsis, G.; Constantoudis, V.; Gogolides, Evangelos (2004) -
Electrical linewidth metrology for sub-65-nm applications
Storms, Greet; Cheng, Shaunee; Pollentier, Ivan (2004) -
EUV lithography and the materials that propel it forward
Gallagher, Emily; Hendrickx, Eric; Kim, Ryan Ryoung han; Leray, Philippe; Philipsen, Vicky; Pollentier, Ivan; Rincon Delgadillo, Paulina; Ronse, Kurt; Timmermans, Marina; De Simone, Danilo (2020) -
EUV lithography imaging using novel pellicle membranes
Pollentier, Ivan; Vanpaemel, Johannes; Lee, Jae Uk; Adelmann, Christoph; Zahedmanesh, Houman; Huyghebaert, Cedric; Gallagher, Emily (2016) -
EUV lithography implementation on contact and metal interconnect level of a 22nm node 0.099um2 6T-SRAM cell
Goethals, Mieke; Demuynck, Steven; Van Roey, Frieda; Baudemprez, Bart; Hermans, Jan; Huffman, Craig; Lazzarino, Frederic; Pollentier, Ivan; Hendrickx, Eric; Jonckheere, Rik; Verhaegen, Staf; Veloso, Anabela; Vandenberghe, Geert; Ronse, Kurt (2009) -
EUV Lithography in pre-production mode
Hendrickx, Eric; Hermans, Jan; Lorusso, Gian; Foubert, Philippe; Pollentier, Ivan; Goethals, Mieke; Jonckheere, Rik; Vandenberghe, Geert; Ronse, Kurt (2012) -
EUV optical characterization of alternative membrane materials
Scholze, Frank; Laubis, Christian; Krumrey, Michael; Timmermans, Marina; Pollentier, Ivan; Gallagher, Emily (2017) -
EUV outgassing and contamination in multilayer material schemes
Pollentier, Ivan; Truffert, Vincent; Lokasani, Ragava; Gronheid, Roel (2011) -
EUV resist material performance, progress and process improvements at imec
Goethals, Mieke; Niroomand, Ardavan; Ban, Keundo; Hosokawa, Kohei; Van Roey, Frieda; Pollentier, Ivan; Jehoul, Christiane; Van Den Heuvel, Dieter; Ronse, Kurt (2010) -
EUV resist performance update on ADT and NXE:3100 scanner
Goethals, Mieke; Niroomand, Ardavan; Hosokawa, Kohei; Van Roey, Frieda; Pollentier, Ivan; Van Den Heuvel, Dieter (2011) -
EUV resist process development for full field imaging
Niroomand, Ardavan; Goethals, Mieke; Van Roey, Frieda; Kim, Byeong Soo; Lorusso, Gian; Pollentier, Ivan; Jonckheere, Rik; Ronse, Kurt (2007)