Browsing by author "Franquet, Alexis"
Now showing items 21-40 of 241
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Area-Selective Atomic Layer Deposition of TiN Using Trimethoxy(octadecyl)silane as a Passivation Layer
Zheng, Li; He, Wei; Spampinato, Valentina; Franquet, Alexis; Sergeant, Stefanie; De Gendt, Stefan; Armini, Silvia (2020) -
Atomic layer deposition of gadolinium aluminate layers using Gd(iPrCp)3, TMA, and O3 or H2O
Adelmann, Christoph; Pierreux, Dieter; Swerts, Johan; Dewulf, Daan; Hardy, An; Tielens, Hilde; Franquet, Alexis; Brijs, Bert; Moussa, Alain; Conard, Thierry; Van Bael, Marlies; Maes, Jan; Jurczak, Gosia; Kittl, Jorge; Van Elshocht, Sven (2010) -
Atomic layer deposition of GdAlOx and GdHfOx using Gd(iPr-Cp)3
Adelmann, Christoph; Pierreux, Dieter; Swerts, Johan; Kesters, Jurgen; Richard, Olivier; Conard, Thierry; Franquet, Alexis; Tielens, Hilde; Afanasiev, Valeri; Schaekers, Marc; Van Elshocht, Sven (2009) -
Atomic layer deposition of hafnium based gate dielectric layers for CMOS applications
Delabie, Annelies; Nyns, Laura; Bellenger, Florence; Caymax, Matty; Conard, Thierry; Franquet, Alexis; Houssa, Michel; Lin, Dennis; Meuris, Marc; Ragnarsson, Lars-Ake; Sioncke, Sonja; Swerts, Johan; Fedorenko, Yanina; Maes, Jan; Van Elshocht, Sven; De Gendt, Stefan (2007) -
Atomic layer deposition of hafnium oxide on Ge and GaAs substrates: precursors and surface preparation
Delabie, Annelies; Brunco, David; Conard, Thierry; Favia, Paola; Bender, Hugo; Franquet, Alexis; Sioncke, Sonja; Vandervorst, Wilfried; Van Elshocht, Sven; Heyns, Marc; Meuris, Marc; Kim, Eunji; McIntyre, Paul C.; Saraswat, Krishna C.; LeBeau, James M.; Cagnon, Joel; Stemmer, Susanne; Tsai, Wilman (2008) -
Atomic layer deposition of high-k dielectric layers on Ge and III-V MOS channels
Delabie, Annelies; Alian, AliReza; Bellenger, Florence; Brammertz, Guy; Brunco, David; Caymax, Matty; Conard, Thierry; Franquet, Alexis; Houssa, Michel; Sioncke, Sonja; Van Elshocht, Sven; van Hemmen, J.L.; Keuning, W.; Kessels, W.M.M.; Afanas'ev, V.V.; Stesmans, Andre; Heyns, Marc; Meuris, Marc (2008) -
Atomic layer deposition of high-k dielectrics on sulphur-passivated germanium
Sioncke, Sonja; Lin, Dennis; Nyns, Laura; Brammertz, Guy; Delabie, Annelies; Conard, Thierry; Franquet, Alexis; Meuris, Marc; Struyf, Herbert; De Gendt, Stefan; Heyns, Marc; Fleischmann, Claudia; Temst, Kristiaan; Vantomme, Andre; Muller, Matthias; Kobe, Michael; Beckhoff, Burkhard; Caymax, Matty (2011) -
Atomic layer deposition of Ru thin films using the zero-valence precursor EBECH Ru
Adelmann, Christoph; Popovici, Mihaela Ioana; Groven, Benjamin; Moens, Kristof; Meersschaut, Johan; Franquet, Alexis; Swerts, Johan; Delabie, Annelies; Van Elshocht, Sven (2014) -
Atomic Layer Deposition of Ruthenium Dioxide Based on Redox Reactions between Alcohols and Ruthenium Tetroxide
Poonkottil, Nithin; Minjauw, Matthias M.; Werbrouck, Andreas; Checchia, Stefano; Solano, Eduardo; Nisula, Mikko; Franquet, Alexis; Detavernier, Christophe; Dendooven, Jolien (2022-09-21) -
Atomic layer deposition of ruthenium thin films from (ethylbenzyl) (1-ethyl-1,4-cyclohexadienyl) Ru: process characteristics, surface chemistry, and film properties
Popovici, Mihaela Ioana; Groven, Benjamin; Marcoen, Kristof; Phung, Quan; Dutta, Shibesh; Swerts, Johan; Meersschaut, Johan; Van den Berg, Jaap; Franquet, Alexis; Moussa, Alain; Vanstreels, Kris; Lagrain, Pieter; Bender, Hugo; Jurczak, Gosia; Van Elshocht, Sven; Delabie, Annelies; Adelmann, Christoph (2017) -
Atomic layer deposition of tantalum oxide and tantalum silicate from chloride precursors
Adelmann, Christoph; Delabie, Annelies; Schepers, Bart; Rodriguez, Leonard; Franquet, Alexis; Conard, Thierry; Opsomer, Karl; Vaesen, Inge; Moussa, Alain; Pourtois, Geoffrey; Pierloot, Christine; Caymax, Matty; Van Elshocht, Sven (2012) -
Atomic layer deposition of tantalum oxide and tantalum silicate from TaCl5, SiCl4, and O3: growth behaviour and film characteristics
Han, Jeong Hwan; Ungur, Elisaveta; Franquet, Alexis; Opsomer, Karl; Conard, Thierry; Moussa, Alain; De Gendt, Stefan; Van Elshocht, Sven; Adelmann, Christoph (2013-07) -
Atomic-layer deposition of lutetium aluminate thin films for non-volatile memory applications
Adelmann, Christoph; Swerts, Johan; Conard, Thierry; Brijs, Bert; Franquet, Alexis; Hardy, An; Tielens, Hilde; Opsomer, Karl; Moussa, Alain; Van Bael, Marlies; Jurczak, Gosia; Kittl, Jorge; Van Elshocht, Sven (2011) -
Carbon nanotube EUV pellicle tunability and performance in a scanner-like environment
Timmermans, Marina; Pollentier, Ivan; Korytov, Maxim; Nuytten, Thomas; Sergeant, Stefanie; Conard, Thierry; Meersschaut, Johan; Zhang, Yide; Dialameh, Masoud; Alaerts, Wilfried; Jazaeri, Ehsan; Spampinato, Valentina; Franquet, Alexis; Brems, Steven; Huyghebaert, Cedric; Gallagher, Emily (2021) -
Cesium near-surface concentration in low energy, negative mode dynamic SIMS
Berghmans, Bart; Van Daele, Benny; Geenen, Luc; Conard, Thierry; Franquet, Alexis; Vandervorst, Wilfried (2007-10) -
Cesium near-surface concentration in low energy, negative mode dynamic SIMS
Berghmans, Bart; Van Daele, Benny; Geenen, Luc; Conard, Thierry; Franquet, Alexis; Vandervorst, Wilfried (2008) -
Challenges for atomic layer deposition in CMOS devices with high-mobility channel materials
Delabie, Annelies; Alian, AliReza; Bellenger, Florence; Caymax, Matty; Conard, Thierry; Franquet, Alexis; Sioncke, Sonja; Vandervorst, Wilfried; Van Elshocht, Sven; Heyns, Marc; Meuris, Marc (2009) -
Characterisation of the silicon nitride thin films deposited by plasmamagnetron
Batan, A; Franquet, Alexis; Vereecken, Jean; Reniers, Francois (2008) -
Characterization of grain boundaries and impact of plasma-induced patterned in 2D materials
Celano, Umberto; Virkki, Olli; Chiappe, Daniele; Heyne, Markus; Hoflijk, Ilse; Franquet, Alexis; Huyghebaert, Cedric; Paredis, Kristof; De Gendt, Stefan; Radu, Iuliana; Vandervorst, Wilfried (2017) -
Characterization of organic solar cell materials by G-SIMS
Franquet, Alexis; Conard, Thierry; Voroshazi, Eszter; Poleunis, Claude; Cheyns, David; Vandervorst, Wilfried (2011)