Browsing by author "Holsteyns, Frank"
Now showing items 21-40 of 212
-
Characterization of etch residues generated on damascene structures
Le, Quoc Toan; Kesters, Els; Hoflijk, Ilse; Conard, Thierry; Shen, M.; Braun, S.; Burk, Y.; Holsteyns, Frank (2016) -
Characterization of patterned porous dielectrics after plasma patterning and subsequent wet processing
Le, Quoc Toan; Kesters, Els; Decoster, Stefan; Chan, BT; Holsteyns, Frank; De Gendt, Stefan (2015) -
Characterization of patterned porous low-k dielectrics: surface sealing and residue removal by wet processing/cleaning
Le, Quoc Toan; Kesters, Els; Decoster, Stefan; Chan, BT; Nguyen, Mai Phuong; Conard, Thierry; Vanleenhove, Anja; Holsteyns, Frank; De Gendt, Stefan (2016) -
Characterization of Wetting of Deep Silica Nanoholes by Aqueous Solutions Using ATR-FTIR
Darcos, Audrey; Iino, Hideaki; Vereecke, Guy; Holsteyns, Frank; Altamirano Sanchez, Efrain (2021) -
Cleaning of nanoparticles in semiconductor manufacturing
Vereecke, Guy; Arnauts, Sophia; Doumen, Geert; Eitoku, Atsuro; Fransaer, J.; Fyen, Wim; Holsteyns, Frank; Kenis, Karine; Lee, Kuntack; Lux, Marcel; Snow, Jim; Vinckier, Chris; Vos, Rita; Xu, Kaidong; Mertens, Paul (2004) -
Cleaning the high aspect ratio STI structures for advanced logic devices by implementation of a surface modification drying technique
Sebaai, Farid; Vereecke, Guy; Xu, XiuMei; Baudot, Sylvain; Amemiya, Fumihiro; Komori, Kana; Holsteyns, Frank (2018) -
Cleaning uniformity of silicon wafers in megasonic tanks
Vereecke, Guy; Holsteyns, Frank; Veltens, J.; Vos, Rita; Mertens, Paul (2003) -
Clustered single wafer wet cleaning
Mertens, Paul; Holsteyns, Frank; Vos, Rita; Vereecke, Guy; Fyen, Wim; Lauerhaas, Jeff; Xu, Kaidong; Bearda, Twan; Teerlinck, Ivo; Arnauts, Sophia; Kenis, Karine; Schmidt, Michael; Heyns, Marc (2002) -
Co and Ru dual damascene compatible metallization studies
van der Veen, Marleen; Heylen, Nancy; Lariviere, Stephane; Vega Gonzalez, Victor; Kesters, Els; Le, Quoc Toan; Teugels, Lieve; Chew, Soon Aik; Philipsen, Harold; Hung, Joey; Adelmann, Christoph; Vanstreels, Kris; Jourdan, Nicolas; Holsteyns, Frank; Struyf, Herbert; Wilson, Chris; Tokei, Zsolt (2019) -
Cobalt pre-metallization clean and functional water rinse in BEOL interconnect
Kesters, Els; Le, Quoc Toan; van der Veen, Marleen; Akanishi, Yuya; Hideaki, Iino; Mizutani, Atsushi; Holsteyns, Frank (2019) -
Controlled and Uniform Wet Etching of Molybdenum Nanowires
Deng, Kerong; Erofeev, Ivan; Ray Chowdhuri, Angshuman; Saidov, Khakimjon; Aabdin, Zainul; Pacco, Antoine; Philipsen, Harold; Holsteyns, Frank; Vinh Huynh, Han; Mirsaidov, Utkur (2023-09) -
Controlled cobalt recess for advanced interconnect metallization
Pacco, Antoine; Akanishi, Yuya; Le, Quoc Toan; Kesters, Els; Murdoch, Gayle; Holsteyns, Frank (2019) -
Controlled cobalt recess for advanced interconnect metallization
Pacco, Antoine; Akanishi, Yuya; Murdoch, Gayle; Le, Quoc Toan; Holsteyns, Frank (2019) -
Controlled isotropic etches for Gate-All-Around (GAA) device architectures
Muraki, Yusuke; Oniki, Yusuke; Kenis, Karine; Altamirano Sanchez, Efrain; Holsteyns, Frank; Kal, Subhadeep; Alix, Cheryl; Kumar, Kaushik; Mosden, Aelan (2020) -
Controlling the Wet-Etch Directionality in Nanostructured Silicon
Aabdin, Zainul; Ghosh, Tanmay; Pacco, Antoine; Raj, Sanoj; Do, Hue Thi Bich; Saidov, Khakimjon; Weei, Tjiu Weng; Anand, Utkarsh; Kral, Petr; Holsteyns, Frank; Bosman, Michel; Mirsaidov, Utkur (2022) -
Correlation between haze of the wafer and particle-count on wafers: a new approach to monitor nano-sized particles
Xu, Kaidong; Vos, Rita; Vereecke, Guy; Lux, Marcel; Fyen, Wim; Holsteyns, Frank; Kenis, Karine; Mertens, Paul; Heyns, Marc; Vinckier, Chris (2002) -
Corrosion of Co in BEOL interconnects in dilute HF solution
Akanishi, Yuya; Kesters, Els; Le, Quoc Toan; Holsteyns, Frank (2018) -
Damage-free removal of nano-sized particles, heading towards a red brick wall
Mertens, Paul; Fyen, Wim; Vereecke, Guy; Xu, Kaidong; Lauerhaas, J.; Holsteyns, Frank; Van Doorne, Patrick; Kesters, Els; Vos, Rita (2003) -
Deep Learning-Based High Throughput Inspection in 3D Nanofabrication and Defect Reversal in Nanopillar Arrays: Implications for Next Generation Transistors
Anand, Utkarsh; Ghosh, Tanmay; Aabdin, Zainul; Vrancken, Nandi; Yan, Hongwei; Xu, XiuMei; Holsteyns, Frank; Mirsaidov, Utkur (2021) -
Defect inspection of Cu metallization
Holsteyns, Frank; Carbonell, Laure; Vos, Ingrid; Vrancken, Evi; Tokei, Zsolt; Mertens, Paul (2002)