Browsing by author "Boullart, Werner"
Now showing items 21-40 of 205
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Chemical and electrical characterization of the interaction of BCl 3/Cl2 etching and CF4/H2O stripping plasmas with aluminum surfaces
Proost, Joris; Li, H.; Conard, Thierry; Boullart, Werner; Maex, Karen (1999) -
Chemical and structural analysis of etching residue layers in semiconductor devices with energy filtering transmission electron microscopy
Hens, S.; Van Landuyt, J.; Bender, Hugo; Boullart, Werner; Vanhaelemeersch, Serge (2001) -
CMP-less integration of fully Ni-silicided metal gates in FinFETs by simultaneous silicidation of the source, drain, and the gate using a novel dual hard mask approach
Kottantharayil, Anil; Verheyen, Peter; Collaert, Nadine; Dixit, Abhisek; Kaczer, Ben; Snow, Jim; Vos, Rita; Locorotondo, Sabrina; Degroote, Bart; Shi, Xiaoping; Rooyackers, Rita; Mannaert, Geert; Brus, Stephan; Yim, Yong Sik; Lauwers, Anne; Goodwin, Michael; Kittl, Jorge; Van Dal, Mark; Richard, Olivier; Veloso, Anabela; Kubicek, Stefan; Beckx, Stephan; Boullart, Werner; De Meyer, Kristin; Absil, Philippe; Jurczak, Gosia; Biesemans, Serge (2005) -
Computer simulations of SiCl4/O2 ICP discharges used for coatings deposition or mask damage recovery
Tinck, Stefan; Bogaerts, Annemie; Boullart, Werner (2012) -
Confined chemical cleaning: a novel concept evaluated for front end of line applications
Vos, Ingrid; Peeters, Stefan; Verbeeck, Rita; Boullart, Werner; Vertommen, Johan (2008) -
Contact patterning scheme for organo-siloxane Low-k material as pre-metal dielectric
de Marneffe, Jean-Francois; Le, Quoc Toan; Conard, Thierry; Demuynck, Steven; Struyf, Herbert; Baklanov, Mikhaïl; Boullart, Werner (2005) -
Cu/LKD-5109 damascene integration demonstration using FF-02 low-k spin-on hard-mask and embedded etch-stop
Kokubo, Terukazu; Das, Arabinda; Furukawa, Yukiko; Vos, Ingrid; Iacopi, Francesca; Struyf, Herbert; Van Aelst, Joke; Maenhoudt, Mireille; Tokei, Zsolt; Vervoort, Iwan; Bender, Hugo; Stucchi, Michele; Schaekers, Marc; Boullart, Werner; Van Hove, Marleen; Vanhaelemeersch, Serge; Peterson, William; Shiota, A.; Maex, Karen (2002) -
Damascene integration feasability of porous SiLK resin films
Waeterloos, Joost; Struyf, Herbert; Van Aelst, Joke; Das, Arabinda; Caluwaerts, Rudy; Alaerts, Carine; Boullart, Werner; Tokei, Zsolt; Van Hove, Marleen; Maex, Karen (2002) -
Development of 2-step plasma texturing process for crystalline silicon solar cells with Linear Microwave Plasma Sources (LPS)
Chan, BT; Kunnen, Eddy; Shamiryan, Denis; Xu, Kaidong; Boullart, Werner (2011) -
Development of a metal gate and silicon selective "dry ash only" process for combined extension and halo implanted photo resist
Mannaert, Geert; Baklanov, Mikhaïl; Goossens, Danny; Vrancken, Christa; Boullart, Werner (2008) -
Development of AlGaN recess etch for Emode POWER HEMTs
Mannaert, Geert; Paraschiv, Vasile; De Jaeger, Brice; Van Hove, Marleen; Demand, Marc; Decoutere, Stefaan; Boullart, Werner (2012) -
Diffusion of solvents in thin porous films
Shamiryan, Denis; Baklanov, Mikhaïl; Lyons, Philip; Beckx, Stephan; Boullart, Werner; Maex, Karen (2007) -
Discovering practical use of sensor wafers in CCP reactors
Milenin, Alexey; Demand, Marc; Boullart, Werner; Arleo, Paul (2011) -
Double hard mask strategy for patterning 0.186 micron2 SRAM cells using FinFET technology
Demand, Marc; Veloso, Anabela; Brus, Stephan; Delvaux, Christie; De Backer, Johan; Ercken, Monique; Boullart, Werner (2008) -
Double patterning with dual hard mask for 28nm node devices and below
Hody, Hubert; Paraschiv, Vasile; Vecchio, Emma; Locorotondo, Sabrina; Winroth, Gustaf; Athimulam, Raja; Boullart, Werner (2013) -
Double patterning with dual hard mask for 28nm node devices and below
Hody, Hubert; Paraschiv, Vasile; Vecchio, Emma; Locorotondo, Sabrina; Winroth, Gustaf; Athimulam, Raja; Boullart, Werner (2013) -
Dry etch challenges for implantable silicon-based semi-flexible neural probe fabrication
Tutunjyan, Nina; Andrei, Alexandru; Verbinnen, Greet; Slabbekoorn, John; Eberle, Wolfgang; Baier, Ulrich; Boullart, Werner (2011) -
Dry etch of bulk Si FinFET structures with tunable CD
Devriendt, Katia; Redolfi, Augusto; Shamiryan, Denis; Boullart, Werner (2009) -
Dry etch of Yb-doped poly-Si gates for low Vt FUSI devices
Demand, Marc; Paraschiv, Vasile; Shamiryan, Denis; Vrancken, Christa; Brus, Stephan; Veloso, Anabela; Boullart, Werner (2007) -
Dry etch processing of Multiple Gate FETs with metal gate electrode
Demand, Marc; Paraschiv, Vasile; Shamiryan, Denis; Beckx, Stephan; Boullart, Werner; Vanhaelemeersch, Serge (2005)