Browsing by author "Veloso, Anabela"
Now showing items 21-40 of 284
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Advanced semiconductor devices for future CMOS technologies
Claeys, Cor; Chiappe, Daniele; Collaert, Nadine; Mitard, Jerome; Radu, Iuliana; Rooyackers, Rita; Simoen, Eddy; Vandooren, Anne; Veloso, Anabela; Waldron, Niamh; Witters, Liesbeth; Thean, Aaron (2015) -
Advances on doping strategies for triple-gate FinFETs and lateral gate-all-around nanowire FETs and their impact on device performance
Veloso, Anabela; De Keersgieter, An; Matagne, Philippe; Horiguchi, Naoto; Collaert, Nadine (2017) -
Advantages of different source/drain engineering on scaled UTBOX FD SOI nMOSFETs at high temperature operation
Nicoletti, Talitha; Dos Santos, Sara; Martino, Joao A.; Aoulaiche, Marc; Veloso, Anabela; Jurczak, Gosia; Simoen, Eddy; Claeys, Cor (2014) -
Al-induced defect generation in cubic phase HfO2/SiO2/Si gate stacks
Arimura, Hiroaki; Ragnarsson, Lars-Ake; Veloso, Anabela; Adelmann, Christoph; Degraeve, Robin; Schram, Tom; Chew, Soon Aik; Franco, Jacopo; Cho, Moon Ju; Kaczer, Ben; Groeseneken, Guido; Horiguchi, Naoto; Thean, Aaron (2012) -
Analog Figures of Merit of Vertically Stacked Silicon Nanosheets nMOSFETs With Two Different Metal Gates for the Sub-7 nm Technology Node Operating at High Temperatures
Silva, Vanessa C. P.; Perina, Welder F.; Martino, Joao A.; Simoen, Eddy; Veloso, Anabela; Agopian, Paula G. D. (2021) -
Analysis of the ZTC-Point for Vertically Stacked Nanosheet pMOS Devices
Coelho, Carlos H. S.; Martino, Joao A.; Simoen, Eddy; Veloso, Anabela; Agopian, Paula G. D. (2021) -
Analysis of zero-temperature coefficient behavior on vertically stacked double nanosheet nMOS devices
Coelho, Carlos H. S.; Martino, Joao A.; Bellodi, Marcello; Simoen, Eddy; Veloso, Anabela; Agopian, Paula G. D. (2021) -
APT analysis of short (~200 nm) Si nanowires embedded in SiO2 and HfO2
Melkonyan, Davit; Fleischmann, Claudia; Veloso, Anabela; Arnoldi, Laurent; Kumar, Arul; Bogdanowicz, Janusz; Vurpillot, Francois; Vandervorst, Wilfried (2016) -
Assessment of DC and low frequency noise performances of triple-gate FinFETs at cryogenic temperatures
Cretu, Bogdan; Boudier, Dimitri; Simoen, Eddy; Veloso, Anabela; Collaert, Nadine (2016) -
Benchmarking time-dependent variability of junctionless nanowire FETs
Kaczer, Ben; Rzepa, G.; Franco, Jacopo; Weckx, Pieter; Vaisman Chasin, Adrian; Putcha, Vamsi; Bury, Erik; Simicic, Marko; Roussel, Philippe; Hellings, Geert; Veloso, Anabela; Matagne, Philippe; Grasser, T.; Linten, Dimitri (2017) -
Beyond-Si materials and devices for more Moore and more than Moore applications
Collaert, Nadine; Alian, AliReza; Arimura, Hiroaki; Boccardi, Guillaume; Eneman, Geert; Franco, Jacopo; Ivanov, Tsvetan; Lin, Dennis; Mitard, Jerome; Ramesh, Siva; Rooyackers, Rita; Schaekers, Marc; Sibaja-Hernandez, Arturo; Sioncke, Sonja; Smets, Quentin; Vais, Abhitosh; Vandooren, Anne; Veloso, Anabela; Verhulst, Anne; Verreck, Devin; Waldron, Niamh; Walke, Amey; Witters, Liesbeth; Yu, Hao; Zhou, Daisy; Thean, Aaron (2016) -
Capping-metal gate integration technology for multiple-VT CMOS in MuGFETs
Veloso, Anabela; Witters, Liesbeth; Demand, Marc; Ferain, Isabelle; Son, Nak Jin; Kaczer, Ben; Roussel, Philippe; Adelmann, Christoph; Brus, Stephan; Richard, Olivier; Bender, Hugo; Conard, Thierry; Vos, Rita; Rooyackers, Rita; Van Elshocht, Sven; Collaert, Nadine; De Meyer, Kristin; Biesemans, Serge; Jurczak, Malgorzata (2008) -
Challenges and opportunities for vertical nanowire FETs: device design and fabrication
Veloso, Anabela; Matagne, Philippe; Huynh Bao, Trong; Eneman, Geert; Loo, Roger; Wostyn, Kurt; Brus, Stephan; Boemmels, Juergen; Mocuta, Dan; Ryckaert, Julien (2018) -
Challenges and opportunities of vertical FET devices using 3D circuit design layouts
Veloso, Anabela; Huynh Bao, Trong; Rosseel, Erik; Paraschiv, Vasile; Devriendt, Katia; Vecchio, Emma; Delvaux, Christie; Chan, BT; Ercken, Monique; Tao, Zheng; Li, Waikin; Altamirano Sanchez, Efrain; Versluijs, Janko; Brus, Stephan; Matagne, Philippe; Waldron, Niamh; Ryckaert, Julien; Mocuta, Dan; Collaert, Nadine (2016) -
Challenges building a 22nm node 6T-SRAM cell using immersion lithography
Ercken, Monique; Altamirano Sanchez, Efrain; Baerts, Christina; Brus, Stephan; De Backer, Johan; Demand, Marc; Delvaux, Christie; Horiguchi, Naoto; Locorotondo, Sabrina; Vandeweyer, Tom; Veloso, Anabela; Verhaegen, Staf (2009) -
Challenges in scaling of CMOS devices towards 65nm node
Jurczak, Gosia; Veloso, Anabela; Rooyackers, Rita; Augendre, Emmanuel; Mertens, Sofie; Rothschild, Aude; Schaekers, Marc; Lindsay, Richard; Lauwers, Anne; Henson, Kirklen; Severi, Simone; Pollentier, Ivan; De Keersgieter, An (2003-06) -
Challenges in using optical lithography for the building of a 22 nm node 6T=-SRAM cell
Ercken, Monique; Altamirano Sanchez, Efrain; Baerts, Christina; Brus, Stephan; De Backer, Johan; Delvaux, Christie; Demand, Marc; Horiguchi, Naoto; Locorotondo, Sabrina; Vandeweyer, Tom; Veloso, Anabela; Verhaegen, Staf (2010) -
Challenges on surface conditioning in 3D device architectures: triple-gate FinFETs, gate-all-around lateral and vertical nanowire FETs
Veloso, Anabela; Paraschiv, Vasile; Vecchio, Emma; Devriendt, Katia; Li, Waikin; Simoen, Eddy; Chan, BT; Tao, Zheng; Rosseel, Erik; Loo, Roger; Milenin, Alexey; Kunert, Bernardette; Teugels, Lieve; Sebaai, Farid; Lorant, Christophe; van Dorp, Dennis; Altamirano Sanchez, Efrain; Brus, Stephan; Marien, Philippe; Fleischmann, Claudia; Melkonyan, Davit; Huynh Bao, Trong; Eneman, Geert; Hellings, Geert; Sibaja-Hernandez, Arturo; Matagne, Philippe; Waldron, Niamh; Mocuta, Dan; Collaert, Nadine (2017) -
Challenges on surface conditioning in 3D device architectures: triple-gate finFETs, gate-all-around lateral and vertical nanowireFETs
Veloso, Anabela; Paraschiv, Vasile; Vecchio, Emma; Devriendt, Katia; Li, Waikin; Simoen, Eddy; Chan, BT; Tao, Zheng; Rosseel, Erik; Loo, Roger; Milenin, Alexey; Kunert, Bernardette; Teugels, Lieve; Sebaai, Farid; Lorant, Christophe; van Dorp, Dennis; Altamirano Sanchez, Efrain; Brus, Stephan; Marien, Philippe; Sibaja-Hernandez, Arturo; Matagne, Philippe; Waldron, Niamh; Mocuta, Dan; Collaert, Nadine (2017) -
Challenges with respect to high-k/metal gate stack etching and cleaning
Vos, Rita; Arnauts, Sophia; Bovie, Inge; Onsia, Bart; Garaud, Sylvain; Xu, Kaidong; Yu, HongYu; Kubicek, Stefan; Rohr, Erika; Schram, Tom; Veloso, Anabela; Conard, Thierry; Leunissen, Peter; Mertens, Paul (2007)