Browsing by author "Teerlinck, Ivo"
Now showing items 21-40 of 49
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Electrochemical copper deposition in IC manufacturing
Teerlinck, Ivo (2002-06) -
Electrochemical study of copper depostion on silicon surfaces in HF solutions
Teerlinck, Ivo; Gomes, W. P.; Strubbe, K.; Mertens, Paul; Heyns, Marc (1999) -
Electrochemical study on the mechanism of copper depostion on silicon surfaces in HF solutions
Teerlinck, Ivo; Gomes, W.; Mertens, Paul; Heyns, Marc (1999) -
Ge deep sub-micron pFETs with etched TaN metal gate on a High-K dielectric, fabricated in a 200mm silicon prototyping line
De Jaeger, Brice; Houssa, Michel; Satta, Alessandra; Kubicek, Stefan; Verheyen, Peter; Van Steenbergen, Jan; Croon, Jeroen; Kaczer, Ben; Van Elshocht, Sven; Delabie, Annelies; Kunnen, Eddy; Sleeckx, Erik; Teerlinck, Ivo; Lindsay, Richard; Schram, Tom; Chiarella, Thomas; Degraeve, Robin; Conard, Thierry; Poortmans, Jef; Winderickx, Gillis; Boullart, Werner; Schaekers, Marc; Mertens, Paul; Caymax, Matty; Vandervorst, Wilfried; Van Moorhem, Els; Biesemans, Serge; De Meyer, Kristin; Ragnarsson, Lars-Ake; Lee, S.; Kota, G.; Raskin, G.; Mijlemans, P.; Autran, J.L.; Afanas'ev, V.; Stesmans, A.; Meuris, Marc; Heyns, Marc (2004) -
How clean is clean enough?
Mertens, Paul; Teerlinck, Ivo; Hurd, Trace; Kenis, Karine; Schmidt, Harald; Rotondaro, Antonio; Hall, L.; Gräf, D.; De Pestel, Freddy; Meuris, Marc; Heyns, Marc (1995) -
Impact of the electrochemical properties of silicon wafer surfaces on copper outplating from HF solutions
Teerlinck, Ivo; Mertens, Paul; Schmidt, Harald; Meuris, Marc; Heyns, Marc (1996) -
Impact of the electrochemical properties of silicon wafer surfaces on copper outplating from HF solutions
Teerlinck, Ivo; Schmidt, Harald; Rotondaro, Antonio; Hurd, Trace; Mouche, Laurent; Mertens, Paul; Meuris, Marc; Heyns, Marc; Vanhaeren, Danielle; Vandervorst, Wilfried (1996) -
Implementation of the IMEC-Clean in advanced CMOS manufacturing
Meuris, Marc; Arnauts, Sophia; Cornelissen, Ingrid; Kenis, Karine; Lux, Marcel; De Gendt, Stefan; Mertens, Paul; Teerlinck, Ivo; Vos, Rita; Loewenstein, Lee; Heyns, Marc; Wolke, K. (1999) -
In situ and real time characterization of wet chemical silicon surface processes by electrochemical open circuit potential measurements
Schmidt, Harald; Teerlinck, Ivo; Meuris, Marc; Mertens, Paul; Heyns, Marc (1995) -
In situ and real time studies of wet chemical silicon cleaning reactions
Schmidt, Harald; Teerlinck, Ivo; Storm, Wolfgang; Bender, Hugo; Heyns, Marc (1996) -
New technologies for reducing chemical costs and environmental impact
Heyns, Marc; Cornelissen, Ingrid; Mertens, Paul; Mertens, S.; Meuris, Marc; Rotondaro, Antonio; Schaekers, Marc; Teerlinck, Ivo; Vos, Rita; Wolke, K. (1998) -
Optimized HF solutions for ultra-clean Si surfaces
Teerlinck, Ivo; Mertens, Paul; Meuris, Marc; Heyns, Marc (1996) -
Optimized HF solutions in ULSI technology
Teerlinck, Ivo; Mertens, Paul; Vos, Rita; Meuris, Marc; Heyns, Marc (1996) -
Optimized HF solutions in ULSI technology
Teerlinck, Ivo; Mertens, Paul; Vos, Rita; Meuris, Marc; Heyns, Marc (1997) -
Outplating of metallic contaminants on silicon wafers from diluted acid solutions
Rotondaro, Antonio; Hurd, Trace; Schmidt, Harald; Teerlinck, Ivo; Heyns, Marc; Claeys, Cor (1995) -
Pattern dependent corrosion effects in HF based post-Cu CMP cleanings
Fyen, Wim; Teerlinck, Ivo; Lagrange, Sébastien; Brongersma, Sywert; Steegen, An; Mertens, Paul; Heyns, Marc (2001) -
Physical characterization of HfO2 deposited on Ge substrates by MOCVD
Van Elshocht, Sven; Brijs, Bert; Caymax, Matty; Conard, Thierry; De Gendt, Stefan; Kubicek, Stefan; Meuris, Marc; Onsia, Bart; Richard, Olivier; Teerlinck, Ivo; Van Steenbergen, Jan; Zhao, Chao; Heyns, Marc (2003) -
Physical characterization of HfO2 deposited on Ge substrates by MOCVD
Van Elshocht, Sven; Brijs, Bert; Caymax, Matty; Conard, Thierry; De Gendt, Stefan; Kubicek, Stefan; Meuris, Marc; Onsia, Bart; Richard, Olivier; Teerlinck, Ivo; Van Steenbergen, Jan; Zhao, Chao; Heyns, Marc (2004) -
Real-time monitoring of wet chemial oxidation and etching processes on semiconductor surfaces for process optimization and waste minimization
Schmidt, Harald; Teerlinck, Ivo; Biesemans, Serge; Heyns, Marc (1996) -
Recent advances in wafer cleaning
Mertens, Paul; Vos, Rita; Bearda, Twan; Maes, Marjan; Lauerhaas, Jeff; Loewenstein, Lee; Fyen, Wim; Holsteyns, Frank; Kenis, Karine; Xu, Kaidong; Teerlinck, Ivo; Arnauts, Sophia; Schmidt, Michael; Heyns, Marc (2001)