Browsing by author "Vereecke, Guy"
Now showing items 21-40 of 227
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Aqueous photoresist and BARC wet strip in BEOL MHM patterning using UV and ozonated chemistry
Kesters, Els; Vereecke, Guy; Lux, Marcel; Pittevils, Joris; Struyf, Herbert (2011) -
Beyond CMOS technologies: from nanowires to graphene
Claeys, Cor; Vereecke, Guy; De Gendt, Stefan (2009) -
Bulk properties of MOCVD-deposited HfO2 layers for high-k dielectric applications
Van Elshocht, Sven; Baklanov, Mikhaïl; Brijs, Bert; Carter, R.; Caymax, Matty; Carbonell, Laure; Claes, Martine; Conard, Thierry; Cosnier, Vincent; Date, Lucien; De Gendt, Stefan; Kluth, J.; Pique, Didier; Richard, Olivier; Vanhaeren, Danielle; Vereecke, Guy; Witters, Thomas; Zhao, Chao; Heyns, Marc (2004) -
Capturing wetting states in nanopatterned silicon
Xu, XiuMei; Vereecke, Guy; Chen, Chang; Pourtois, Geoffrey; Armini, Silvia; Verellen, Niels; Struyf, Herbert; Holsteyns, Frank; De Gendt, Stefan (2013) -
Capturing wetting states in nanopatterned silicon
Xu, XiuMei; Vereecke, Guy; Chen, Chang; Pourtois, Geoffrey; Armini, Silvia; Verellen, Niels; tsai, Wei-Kang; Struyf, Herbert; Holsteyns, Frank; machalkov, victor; indekeu, joseph; De Gendt, Stefan (2013) -
Capturing wetting states in nanopatterned silicon
Xu, XiuMei; Vereecke, Guy; Chen, Chang; Pourtois, Geoffrey; Armini, Silvia; Verellen, Niels; tsai, Wei-Kang; Kim, Dong-Wook; Lee, Eunsongyi; Lin, Chang-You; Van Dorpe, Pol; Struyf, Herbert; Holsteyns, Frank; Moshchalkov, Victor; indekeu, joseph; De Gendt, Stefan (2014) -
Capturing wetting states in nanopatterned silicon
Xu, XiuMei; Vereecke, Guy; Chen, Chang; Pourtois, Geoffrey; Armini, Silvia; Verellen, Niels; tsai, Wei-Kang; Kim, Dong-Wook; Lee, Eusonghyi; Lin, Chang You; Van Dorpe, Pol; Struyf, Herbert; Holsteyns, Frank; Moshchalkov, Victor; indekeu, joseph; De Gendt, Stefan (2014) -
Challenges and novel approaches for photo resist removal and post-etch residue removal for 22 nm interconnects
Mertens, Paul; Kim, Tae-Gon; Claes, Martine; Le, Quoc Toan; Vereecke, Guy; Kesters, Els; Suhard, Samuel; Pacco, Antoine; Lux, Marcel; Kenis, Karine; Urbanowicz, Adam; Tokei, Zsolt; Beyer, Gerald (2009) -
Challenges for chemical processing of high aspect ratio nanostructures
Vereecke, Guy (2018) -
Characterization and removal of post-etch residues in interconnect patterning
Le, Quoc Toan; de Marneffe, Jean-Francois; Conard, Thierry; Lux, Marcel; Vereecke, Guy (2010) -
Characterization of 248nm deep ultraviolet (DUV) photoresist after ion implantation
Tsvetanova, Diana; Vos, Rita; Vereecke, Guy; Clemente, Francesca; Vanstreels, Kris; Conard, Thierry; Vogt, Tatjana; Mertens, Paul; Heyns, Marc (2009) -
Characterization of 248nm deep ultraviolet (DUV) photoresist after ion implantation
Tsvetanova, Diana; Vos, Rita; Vereecke, Guy; Clemente, Francesca; Vanstreels, Kris; Conard, Thierry; Parac-Vogt, Tatjana; Mertens, Paul; Heyns, Marc (2009) -
Characterization of advanced semiconductor materials by thermal desorption mass spectrometry with atmospheric pressure ionization
Carbonell, Laure; Vereecke, Guy; Van Elshocht, Sven; Caymax, Matty; Van Hove, Marleen; Maex, Karen; Mertens, Paul (2003) -
Characterization of low-k dielectric etch residue on the sidewall by chemical force microscope
Kim, Tae-Gon; Le, Quoc Toan; Suhard, Samuel; Lux, Marcel; Vereecke, Guy; Claes, Martine; Struyf, Herbert; De Gendt, Stefan; Mertens, Paul; Heyns, Marc (2010) -
Characterization of modification of 193-nm photoresist by HBr plasma
Vereecke, Guy; Claes, Martine; Le, Quoc Toan; Kesters, Els; Struyf, Herbert; Carleer, Robert; Adriaensens, Peter (2011) -
Characterization of modification of 193-nm photoresist by HBr plasma
Vereecke, Guy; Claes, Martine; Le, Quoc Toan; Kesters, Els; Struyf, Herbert; Carleer, Robert; Adriaensens, Peter (2011) -
Characterization of post-etch photoresists used in metal hardmask and photoresist mask patterning schemes
Kesters, Els; Claes, Martine; Lux, Marcel; Le, Quoc Toan; Vereecke, Guy; Franquet, Alexis; Conard, Thierry; Mertens, Paul; Adriaensens, Peter; Carleer, Robert; Biebuyck, J.J.; Van Veltem, P.; Bebelman, Sabine (2007) -
Characterization of post-etched photoresist and residues by various analytical techniques
Franquet, Alexis; Claes, Martine; Conard, Thierry; Kesters, Els; Vereecke, Guy; Vandervorst, Wilfried (2007-11) -
Characterization of post-etched photoresist and residues by various analytical techniques
Franquet, Alexis; Claes, Martine; Conard, Thierry; Kesters, Els; Vereecke, Guy; Vandervorst, Wilfried (2008) -
Characterization of Wetting of Deep Silica Nanoholes by Aqueous Solutions Using ATR-FTIR
Darcos, Audrey; Iino, Hideaki; Vereecke, Guy; Holsteyns, Frank; Altamirano Sanchez, Efrain (2021)