Browsing by author "Kenis, Karine"
Now showing items 41-60 of 115
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Evaluation of megasonic cleaning for sub-90-nm technologies
Vereecke, Guy; Holsteyns, Frank; Arnauts, Sophia; Kenis, Karine; Lux, Marcel; Vos, Rita; Snow, Jim; Mertens, Paul (2004) -
Evaluation of megasonic cleaning for sub-90-nm technologies
Vereecke, Guy; Holsteyns, Frank; Arnauts, Sophia; Beckx, Stephan; Jaenen, Patrick; Kenis, Karine; Lismont, Mark; Lux, Marcel; Vos, Rita; Snow, Jim; Mertens, Paul (2005) -
Evaluation of megasonic cleaning systems for particle removal efficiency and damaging
Vereecke, Guy; Holsteyns, Frank; Veltens, J.; Lux, Marcel; Arnauts, Sophia; Kenis, Karine; Vos, Rita; Mertens, Paul; Heyns, Marc (2003) -
Evaluation of megasonic cleaning systems for particle removal efficiency and damaging
Vereecke, Guy; Holsteyns, Frank; Veltens, Tom; Lux, Marcel; Arnauts, Sophia; Kenis, Karine; Vos, Rita; Mertens, Paul; Heyns, Marc (2004) -
Evaluation of Si surface conditions by the use of surface photovoltage technique
Trauwaert, Marie-Astrid; Kenis, Karine; Caymax, Matty; Mertens, Paul; Heyns, Marc; Vanhellemont, J.; Gräf, D.; Wagner, P. (1998) -
Evaluation of time-of-flight secondary ion mass spectrometry for metal contamination monitoring on Si wafer surfaces
De Witte, Hilde; De Gendt, Stefan; Douglas, M.; Conard, Thierry; Kenis, Karine; Mertens, Paul; Vandervorst, Wilfried; Gijbels, Renaat (2000) -
Fabrication challenges and opportunities for high-mobility materials: from CMOS applications to emerging derivative technologies
Collaert, Nadine; Alian, AliReza; De Jaeger, Brice; Peralagu, Uthayasankaran; Vais, Abhitosh; Walke, Amey; Witters, Liesbeth; Yu, Hao; Capogreco, Elena; Devriendt, Katia; Hopf, Toby; Kenis, Karine; Mannaert, Geert; Milenin, Alexey; Peter, Antony; Sebaai, Farid; Teugels, Lieve; van Dorp, Dennis; Wostyn, Kurt; Horiguchi, Naoto; Waldron, Niamh (2019-03) -
Fin bending in dimensional scaling
Zhang, Liping; Hellin, David; Sepulveda Marquez, Alfonso; Altamirano Sanchez, Efrain; Lazzarino, Frederic; Morin, Pierre; Wang, Shouhua; Hopf, Toby; Kenis, Karine; Lorant, Christophe; Sebaai, Farid; Batuk, Dmitry; Briggs, Basoene; Mertens, Hans; Demuynck, Steven (2020) -
HF-last wet clean in combination with a low temperature GeH4-assisted HCl in-situ clean prior to Si0.8Ge0.2-on-Si epitaxial growth
Wostyn, Kurt; Dhayalan, Sathish Kumar; Hikavyy, Andriy; Loo, Roger; Douhard, Bastien; Moussa, Alain; Rondas, Dirk; Kenis, Karine; Mertens, Paul; Holsteyns, Frank; De Gendt, Stefan; Profijt, Harald (2014) -
High velocity aerosol cleaning with organic solvents: particle removal and substrate damage
Andreas, Michael; Wostyn, Kurt; Wada, Masayuki; Janssens, Tom; Kenis, Karine; Bearda, Twan; Mertens, Paul (2008) -
High velocity aerosol cleaning with organic solvents: particle removal and substrate damage
Andreas, Michael; Wostyn, Kurt; Wada, Masayuki; Janssens, Tom; Kenis, Karine; Bearda, Twan; Mertens, Paul (2009) -
How clean is clean enough?
Mertens, Paul; Teerlinck, Ivo; Hurd, Trace; Kenis, Karine; Schmidt, Harald; Rotondaro, Antonio; Hall, L.; Gräf, D.; De Pestel, Freddy; Meuris, Marc; Heyns, Marc (1995) -
Impact of iron contamination and roughness generated in ammonia hydrogen peroxide mixtures (SC1) on 5nm gate oxides
De Gendt, Stefan; Knotter, D. M.; Kenis, Karine; Mertens, Paul; Heyns, Marc (1998) -
Impact of iron contamination and SC1 generated roughness on 5nm gate oxides
De Gendt, Stefan; Knotter, D. M.; Kenis, Karine; Mertens, Paul; Heyns, Marc (1997) -
Impact of organic contamination on gate oxide integrity
De Gendt, Stefan; Knotter, Martin; Kenis, Karine; Depas, Michel; Meuris, Marc; Mertens, Paul; Heyns, Marc (1998) -
Impact of organic contamination on thin gate oxide quality
De Gendt, Stefan; Knotter, D. M.; Kenis, Karine; Depas, Michel; Meuris, Marc; Mertens, Paul; Heyns, Marc (1998) -
Implementation of the IMEC-Clean in advanced CMOS manufacturing
Meuris, Marc; Arnauts, Sophia; Cornelissen, Ingrid; Kenis, Karine; Lux, Marcel; De Gendt, Stefan; Mertens, Paul; Teerlinck, Ivo; Vos, Rita; Loewenstein, Lee; Heyns, Marc; Wolke, K. (1999) -
Influences of oxide loss on contamination removal
Eitoku, Atsuro; Snow, Jim; Vos, Rita; Kenis, Karine; Mertens, Paul (2004) -
Influences of oxide loss on contamination removal
Eitoku, Atsuro; Snow, Jim; Vos, Rita; Kenis, Karine; Mertens, Paul (2005) -
Isotropic etches for nanosheet device integration - Wet or dry?
Oniki, Yusuke; Kenis, Karine; Wostyn, Kurt; Altamirano Sanchez, Efrain; Holsteyns, Frank (2020)