Browsing by author "Loo, Roger"
Now showing items 41-60 of 761
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An investigation of growth and properties of Si capping layers used in advanced SiGe/Ge based pMOS transistors
Hikavyy, Andriy; Witters, Liesbeth; Mitard, Jerome; Vanherle, Wendy; Vandervorst, Wilfried; Dekoster, Johan; Loo, Roger; Caymax, Matty (2012) -
Analysis of homogeneous broadening in n-type doped Ge layers on Si for laser application
Srinivasan, Ashwyn; Porret, Clément; Pantouvaki, Marianna; Shimura, Yosuke; Gieregat, Pieter; Loo, Roger; Van Campenhout, Joris; Van Thourhout, Dries (2017) -
Analysis of junctions formed in strained Si/SiGe substrates
Eneman, Geert; Simoen, Eddy; Lauwers, Anne; Lindsay, Richard; Verheyen, Peter; Delhougne, Romain; Loo, Roger; Caymax, Matty; Meunier-Beillard, Philippe; Demuynck, Steven; De Meyer, Kristin; Vandervorst, Wilfried (2004) -
Analysis of selectively grown epitaxial Si1-xGex by spectroscopic ellipsometry and comparison with other established techniques
Loo, Roger; Caymax, Matty; Libezny, Milan; Blavier, G.; Brijs, Bert; Geenen, Luc; Vandervorst, Wilfried (2000) -
Analysis of selectively grown epitaxial Si1-xGex by spectroscopic ellipsometry and comparison with RBS and SIMS
Loo, Roger; Caymax, Matty; Libezny, Milan; Blavier, G.; Brijs, Bert; Geenen, Luc; Vandervorst, Wilfried (1999) -
Analysis of the pre-epi bake conditions on the defect creation in recessed Si1-xGex S/D junctions
Bargallo Gonzalez, Mireia; Thomas, Nicole; Simoen, Eddy; Verheyen, Peter; Hikavyy, Andriy; Leys, Frederik; Okuno, Yasutoshi; Vissouvanadin Soubaretty, Bertrand; Van Daele, Benny; Geenen, Luc; Loo, Roger; Claeys, Cor; Machkaoutsan, Vladimir; Tomasini, P.; Thomas, S.G.; Lu, J.P.; Weijtmans, J.W.; Wise, R. (2007) -
Analysis of the time-dependent electrical current in reverse-biased p-GeSn/n-Ge mesa diodes
Baert, Bruno; Gupta, Somya; Gencarelli, Federica; Loo, Roger; Simoen, Eddy; Nguyen, Duy (2015-09) -
Analysis of trap-assisted tunneling in vertical Si homo-junction and SiGe hetero-junction tunnel-FETs
Vandooren, Anne; Rooyackers, Rita; Leonelli, Daniele; Hikavyy, Andriy; Devriendt, Katia; Demand, Marc; Loo, Roger; Groeseneken, Guido; Huyghebaert, Cedric (2013) -
Application of atom probe tomography to epitaxial layers
Kumar, Arul; Gilbert, Matthieu; Kambham, Ajay Kumar; Gencarelli, Federica; Loo, Roger; Vandervorst, Wilfried (2013) -
Application of Cl2 for low temperature etch and epitaxy
Hikavyy, Andriy; Porret, Clément; Rosseel, Erik; Loo, Roger (2018) -
Application of Cl2 for low temperature etch and epitaxy
Hikavyy, Andriy; Porret, Clément; Rosseel, Erik; Milenin, Alexey; Loo, Roger (2019) -
Application of group IV epitaxy for production of gate all around transistors
Hikavyy, Andriy; Mertens, Hans; Witters, Liesbeth; Loo, Roger; Horiguchi, Naoto (2017) -
Application of group IV epitaxy in the advanced CMOS fabrication
Hikavyy, Andriy; Porret, Clément; Rosseel, Erik; Vohra, Anurag; Loo, Roger (2018) -
Application of HCl etch in the production of novel devices
Hikavyy, Andriy; Rooyackers, Rita; Verheyen, Peter; Vellianitis, Georgios; Van Dal, Mark; Lander, Rob; Loo, Roger; Caymax, Matty (2008) -
Application of HCl gas phase etch in the production of novel devices
Hikavyy, Andriy; Rooyackers, Rita; Verheyen, Peter; Leys, Frederik; Vellianitis, Georgios; Van Dal, Mark; Lander, Rob; Loo, Roger (2008-05) -
Application of selective epitaxial growth for merging fins in source/drain areas of sub 20 nm FinFET transistors
Hikavyy, Andriy; Kubicek, Stefan; Chew, Soon Aik; Boccardi, Guillaume; Favia, Paola; Eneman, Geert; Loo, Roger (2013) -
Application of selective epitaxial growth for merging fins in source/drain areas of sub 20 nm FinFET transistors
Hikavyy, Andriy; Chew, Soon Aik; Boccardi, Guillaume; Favia, Paola; Loo, Roger (2013) -
Application of selective epitaxial growth in the sub 20 nm FinFET device fabrication
Hikavyy, Andriy; Rosseel, Erik; Eneman, Geert; Favia, Paola; Loo, Roger (2014) -
Application of single-wafer wet cleaning prior to epitaxial SiGe process
Sano, K.; Wada, Masayuki; Leys, Frederik; Loo, Roger; Mertens, Paul W.; Snow, James; Izumi, Akira; Miya, Katsuhiko; Eitoku, Atsuro (2008) -
Application of single-wafer wet cleaning prior to epitaxial SiGe process
Sano, Ken-Ichi; Wada, Masayuki; Leys, Frederik; Loo, Roger; Hikavyy, Andriy; Mertens, Paul; Snow, Jim; Izumi, A.; Miya, Katsuhiko; Eitoku, Atsuro (2009)