Browsing by author "Maex, Karen"
Now showing items 61-80 of 643
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Boosting the on-current of silicon nanowire tunnel-FETs
Verhulst, Anne; Vandenberghe, William; De Gendt, Stefan; Maex, Karen; Groeseneken, Guido (2008) -
Buckling instabilities of thin cap layers deposited onto low-k dielectric films
Iacopi, Francesca; Brongersma, Sywert; Maex, Karen; Abell, Thomas (2002) -
Buckling instabilities of thin cap layers deposited onto low-k dielectric films
Iacopi, Francesca; Brongersma, Sywert; Abell, Thomas; Maex, Karen (2003) -
CAD-oriented analytic formulas for self and mutual capacitance of interconnects on an Si-SiO2 substrate
Ymeri, Hasan; Nauwelaers, Bart; Maex, Karen; Vandenberghe, S.; De Roest, David; Stucchi, Michele (2001) -
CAD-oriented semi analytic approach for capacitance matrix computation of multilayer VLSI interconnects
Ymeri, Hasan; Nauwelaers, Bart; Maex, Karen (2002) -
Carbon nanotube catalysis by metal silicide: resolving inhibition versus growth
Esconjauregui, Santiago Cruz; Whelan, Caroline; Maex, Karen (2007) -
Challenges for structural stability of ultra-low-k based interconnects
Iacopi, Francesca; Brongersma, Sywert; Vandevelde, Bart; Travaly, Youssef; Maex, Karen (2004) -
Challenges of clean/strip processing for Cu/LowK technology
Baklanov, Mikhaïl; Le, Quoc Toan; Kesters, Els; Iacopi, Francesca; Van Aelst, Joke; Struyf, Herbert; Boullart, Werner; Vanhaelemeersch, Serge; Maex, Karen (2004) -
Characterisation and integration feasibility of JSR's low-k dielectric LKD-5109
Das, Arabinda; Kokubo, Terukazu; Furukawa, Yukiko; Struyf, Herbert; Vos, Ingrid; Sijmus, Bram; Iacopi, Francesca; Van Aelst, Joke; Le, Quoc Toan; Carbonell, Laure; Brongersma, Sywert; Maenhoudt, Mireille; Tokei, Zsolt; Vervoort, Iwan; Sleeckx, Erik; Stucchi, Michele; Schaekers, Marc; Boullart, Werner; Rosseel, Erik; Van Hove, Marleen; Vanhaelemeersch, Serge; Shiota, A.; Maex, Karen (2002) -
Characterisation of Cu surface cleaning by downstream N2/H2 plasma
Baklanov, Mikhaïl; Shamiryan, Denis; Beyer, Gerald; Conard, Thierry; Vanhaelemeersch, Serge; Maex, Karen (2001) -
Characterisation of HF-last cleaning of ion-implanted Si surfaces
Kondoh, Eiichi; Baklanov, Mikhaïl; Jonckx, Franky; Maex, Karen (1998) -
Characterisation of JSR's spin-on hardmask FF-02
Das, Arabinda; Le, Quoc Toan; Furukawa, Yukiko; Nguyen Hoang, Viet; Terzieva, Valentina; de Theije, Femke; Whelan, Caroline; Maenhoudt, Mireille; Struyf, Herbert; Tokei, Zsolt; Iacopi, Francesca; Stucchi, Michele; Carbonell, Laure; Vos, Ingrid; Bender, Hugo; Patz, M.; Beyer, Gerald; Van Hove, Marleen; Maex, Karen (2003) -
Characterisation of plasma etch related residues formed on top of ECD Cu
Baklanov, Mikhaïl; Conard, Thierry; Lanckmans, Filip; Vanhaelemeersch, Serge; Holmes, D.; Maex, Karen (1999) -
Characterisation of plasma etch releted residues formed on top of ECD Cu films
Baklanov, Mikhaïl; Conard, Thierry; Lanckmans, Filip; Vanhaelemeersch, Serge; Holmes, D.; Maex, Karen (2000) -
Characterisation of the local stress in CoSi2 silicided shallow trench isolation structures
Stuer, Cindy; Steegen, An; Bender, Hugo; Van Landuyt, J.; Maex, Karen (2001) -
Characterisation of tungsten nitride barrier layer for copper metallisation
Jin, S.; Li, H.; Bender, Hugo; Heyvaert, Ilse; Maex, Karen (1999) -
Characterization and barrier properties for Cu metallization of tungsten nitride deposited by PECVD using WF6 +N2 +H2
Li, Hua; Heyvaert, Ilse; Sing, Jin; Lanckmans, Filip; Brijs, Bert; Bender, Hugo; Maex, Karen; Froyen, L. (1999) -
Characterization and barrier properties for Cu metallization of tungsten nitride deposited by PECVD using WF6+N2+H2
Li, H.; Heyvaert, Ilse; Jin, S.; Lanckmans, Filip; Bender, Hugo; Maex, Karen; Froyen, L. (1998) -
Characterization and integration in Cu damascene structures of AURORA, an inorganic low-k dielectric
Alves Donaton, Ricardo; Coenegrachts, Bart; Sleeckx, Erik; Schaekers, Marc; Sophie, Guus; Matsuki, N.; Baklanov, Mikhaïl; Struyf, Herbert; Lepage, Muriel; Vanhaelemeersch, Serge; Beyer, Gerald; Stucchi, Michele; De Roest, David; Maex, Karen (2001) -
Characterization and integration of a new Si-O-C film deposited by CVD
Alves Donaton, Ricardo; Struyf, Herbert; Lepage, Muriel; Coenegrachts, Bart; Stucchi, Michele; De Roest, David; Baklanov, Mikhaïl; Vanhaelemeersch, Serge; Maex, Karen; Gaillard, F.; Xia, L. Q.; Lim, T. H.; Gotuaco, M.; Yieh, E.; Van Autryve, Luc (2001)