Browsing Conference contributions by imec author "a39a62524c31f1c216be1a09593befa831b4dee9"
Now showing items 41-60 of 102
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High-throughput multi-beam SEM: quantitative analysis of imaging capabilities at imec-N10 logic node
Neumann, J.T.; Garbowski, T.; Högele, W.; Korb, T.; Halder, Sandip; Leray, Philippe; Garreis, R.; le Maire, M.; Zeidler, D. (2017) -
Hybrid overlay metrology for high order correction by using CDSEM
Leray, Philippe; Halder, Sandip; Lorusso, Gian; Baudemprez, Bart; Inoue, Osamu; Okagawa, Yutaka (2016) -
Hybrid overlay metrology with CDSEM in a BEOL patterning scheme
Leray, Philippe; Jehoul, Christiane; Inoue, Osamu; Okagawa, Yutaka (2015) -
Image contrast contributions to immersion lithography defect formation and process yield
Rathsack, Ben; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Hatakeyama, Shinichi; Kouichi, Hontake; Kitano, Junichi; Van Den Heuvel, Dieter; Leray, Philippe; Hendrickx, Eric; Foubert, Philippe; Gronheid, Roel (2008) -
Imaging of buried overlay and alignment markers using picosecond acoustic microscopy
Mehendale, Manjusha; Antonelli, Andy; Mair, Robin; Mukundhan, Priya; Bogdanowicz, Janusz; Blanco, Victor; Charley, Anne-Laure; Leray, Philippe (2022) -
IMAGING OF OVERLAY AND ALIGNMENT MARKERS UNDER OPAQUE LAYERS USING PICOSECOND LASER ACOUSTIC MEASUREMENTS AM: Advanced Metrology
Mehendale, M.; Antonelli, A.; Mair, R.; Mukundhan, P.; Bogdanowicz, Janusz; Charley, Anne-Laure; Leray, Philippe; Yasin, Farrukh; Crotti, Davide (2021) -
Imaging semiconductor patterns at N10 logic node with a high-throughput multi-beam SEM
Neumann, J.T.; Garaboski, T.; Halder, Sandip; Leray, Philippe; Garreis, R.; Zeidler, D. (2016) -
In field overlay uncertainty contributors
Frommer, Aviv; Kassel, Elyakim; Izikson, Pavel; Adel, Mike; Leray, Philippe; Shultz, Bernd (2005) -
In-chip overlay metrology in 90 nm production
Schultz, Bernd; Seltmann, Rolf; Paufler, Joerg; Leray, Philippe; Kassel, Elyakim; Adel, Mike; Izikson, Pavel; Frommer, Aviv (2005) -
Influence of photoresist thinning and underlayer film on e-beam using eP5 for High-NA patterning
Hasan, Mahmudul; Beral, Christophe; Lorusso, Gian; De Simone, Danilo; Moussa, Alain; Van den Heuvel, Dieter; Charley, Anne-Laure; Leray, Philippe (2022) -
Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control
Gunay Demirkol, Anil; Altamirano Sanchez, Efrain; Héraud, Stéphane; Godny, Stephane; Charley, Anne-Laure; Leray, Philippe; Urenski, Ronen; Cohen, Oded; Turovets, Igor; Wolfling, Shay (2016) -
Inspection challenges for triple patterning at sub-14 nm nodes with broadband plasma inspection platforms
Halder, Sandip; Truffert, Vincent; Van Den Heuvel, Dieter; Leray, Philippe; Cheng, Shaunee; McIntyre, Greg; Sah, Kaushik; Brown, Jim; Parisi, Paolo; Polli, Marco (2015) -
Integration of tall triple-gate devices with inserted TaxNy gate in a 0.274μm² 6T-SRAM cell and advanced CMOS logic circuits
Witters, Liesbeth; Collaert, Nadine; Nackaerts, Axel; Demand, Marc; Demuynck, Steven; Delvaux, Christie; Lauwers, Anne; Baerts, Christina; Beckx, Stephan; Boullart, Werner; Brus, Stephan; Degroote, Bart; de Marneffe, Jean-Francois; Dixit, Abhisek; De Meyer, Kristin; Ercken, Monique; Goodwin, Michael; Hendrickx, Eric; Heylen, Nancy; Jaenen, Patrick; Laidler, David; Leray, Philippe; Locorotondo, Sabrina; Maenhoudt, Mireille; Moelants, Myriam; Pollentier, Ivan; Ronse, Kurt; Rooyackers, Rita; Van Aelst, Joke; Vandenberghe, Geert; Vandeweyer, Tom; Vanhaelemeersch, Serge; Van Hove, Marleen; Van Olmen, Jan; Verhaegen, Staf; Versluijs, Janko; Vrancken, Christa; Wiaux, Vincent; Willems, Patrick; Wouters, Johan M. D.; Jurczak, Gosia; Biesemans, Serge (2005) -
Knowledge-based APC methodology for overlay control
Laidler, David; Leray, Philippe; Crow, D.A.; Roberts, K.E. (2003) -
Lateral and vertical scaling of a QSA HBT for a 0.13μm 200GHz SiGe:C BiCMOS technology
Van Huylenbroeck, Stefaan; Sibaja-Hernandez, Arturo; Piontek, Andreas; Choi, Li Jen; Xu, Mingwei; Ouassif, Nordin; Vleugels, Frank; Van Wichelen, Koen; Witters, Liesbeth; Kunnen, Eddy; Leray, Philippe; Devriendt, Katia; Shi, Xiaoping; Loo, Roger; Decoutere, Stefaan (2004-09) -
Line-end gap measurement with YieldStar scatterometer: towards an OPC model calibration
Charley, Anne-Laure; Leray, Philippe; Cheng, Shaunee; Dusa, Mircea; Chiou, T.-B.; Fumar-Pici, A. (2012) -
Localized power spectral density analysis on atomic force microscopy images for advanced patterning applications
Moussa, Alain; Saib, Mohamed; Paolillo, Sara; Lazzarino, Frederic; Illiberi, Andrea; Maes, Jan; Deng, Shaoren; Charley, Anne-Laure; Leray, Philippe (2019) -
Low-Voltage Aberration-Corrected SEM Metrology of Thin Resist for High-NA EUVL
Zidan, Mohamed; Fischer, Daniel; Lorusso, Gian; Severi, Joren; De Simone, Danilo; Moussa, Alain; Muellender, Angelika; Mack, Chris A.; Charley, Anne-Laure; Leray, Philippe; De Gendt, Stefan (2022) -
Massive e-beam metrology and inspection for analysis of EUV stochastic defect
Kang, Seulki; Maruyama, K.; Yamazaki, Z.; De Simone, Danilo; Rincon Delgadillo, Paulina; Frommhold, Andreas; Lorusso, Gian; Das, Sayantan; Halder, Sandip; Leray, Philippe (2021) -
Massive metrology of 2D logic patterns on BEOL EUVL
Das, Sayantan; Kang, S.; Halder, Sandip; Maruyama, K.; Leray, Philippe; Yamazaki, Y. (2020)