Browsing Conference contributions by imec author "c30f16620323628cf391d29809be5c5894e1ab9e"
Now showing items 21-33 of 33
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Impact of mask corner rounding on pitch 40 nm contact hole variability
van Look, Lieve; Gillijns, Werner; Gallagher, Emily (2021) -
Introducing the EUV CNT pellicle
Lee, Jae Uk; Vanpaemel, Johannes; Pollentier, Ivan; Adelmann, Christoph; Zahedmanesh, Houman; Huyghebaert, Cedric; Timmermans, Marina; De Volder, Michael; Gallagher, Emily (2016) -
Introducing the euv cnt pellicle
Gallagher, Emily; Huyghebaert, Cedric; Lee, Jae Uk; Pollentier, Ivan; Timmermans, Marina; Zahedmanesh, Houman (2016) -
Mask 3D effect mitigation by source optimization and assist feature placement
Van Look, Lieve; Mochi, Iacopo; Philipsen, Vicky; Gallagher, Emily; Hendrickx, Eric; McIntyre, Greg; Wittebrood, Friso; Lyakhova, Kateryna; de Winter, Laurens; Last, Thorsten; Fliervoet, Timon; Schiffelers, Guido; Finders, Jo; Van Adrichem, Paul; Lyons, Adam; Laenens, Bart; Liddle, Jack; Neumann, Jens Timo (2016) -
Novel membrane solutions for the EUV pellicle : better or not ?
Pollentier, Ivan; Lee, Jae Uk; Timmermans, Marina; Adelmann, Christoph; Zahedmanesh, Houman; Huyghebaert, Cedric; Gallagher, Emily (2017) -
Properties and performance of EUVL pellicle membranes
Gallagher, Emily; Vanpaemel, Johannes; Pollentier, Ivan; Zahedmanesh, Houman; Adelmann, Christoph; Huyghebaert, Cedric; Jonckheere, Rik; Lee, Jae Uk (2015) -
Properties and performance of EUVL pellicle membranes
Gallagher, Emily; Vanpaemel, Johannes; Pollentier, Ivan; Zahedmanesh, Houman; Adelmann, Christoph; Huyghebaert, Cedric; Jonckheere, Rik; Lee, Jae Uk (2015) -
Reticle enhancement techniques toward iN7 metal2
Gillijns, Werner; Tan, Ling Ee; Blanco, Victor; Trivkovic, Darko; Kim, Ryan Ryoung han; Gallagher, Emily; McIntyre, Greg (2017) -
SAQP and EUV block patterning of BEOL metal layers on IMEC's iN7 platform
Bekaert, Joost; Di Lorenzo, Paolo; Mao, Ming; Decoster, Stefan; Lariviere, Stephane; Franke, Joern-Holger; Blanco, Victor; Kutrzeba Kotowska, Bogumila; Lazzarino, Frederic; Gallagher, Emily; Hendrickx, Eric; Leray, Philippe; Kim, Ryan Ryoung han; McIntyre, Greg; Colsters, Paul; Wittebrood, Friso; van Dijk, Joep; Maslow, Mark; Timoshkov, Vadim; Kiers, Ton (2017) -
Single exposure EUV patterning for BEOL metal layers on the imec iN7 platform
Blanco, Victor; Bekaert, Joost; Mao, Ming; Kutrzeba Kotowska, Bogumila; Lariviere, Stephane; Ciofi, Ivan; Baert, Rogier; Kim, Ryan Ryoung han; Gallagher, Emily; Hendrickx, Eric; Tan, Ling Ee; Gillijns, Werner; Trivkovic, Darko; Leray, Philippe; Halder, Sandip; Gallagher, Matt; Lazzarino, Frederic; Paolillo, Sara; Wan, Danny; Mallik, Arindam; Sherazi, Yasser; McIntyre, Greg; Dusa, Mircea; Rusu, Paul; Hollink, Thijs; Fliervoet, Timon; Wittebrood, Friso (2017) -
The development of an EUVL pellicle comprising carbon nanomaterials
Vanpaemel, Johannes; Lee, Jae Uk; Krishnaraj, Chidharth; Pollentier, Ivan; Huyghebaert, Cedric; Adelmann, Christoph; Gallagher, Emily (2016) -
The EUV CNT pellicle: balancing material properties to optimize performance
Pollentier, Ivan; Timmermans, Marina; Huyghebaert, Cedric; Brems, Steven; Gallagher, Emily (2020) -
The imec iN7 EUV platform: M2-Block and Via patterning developments
Bekaert, Joost; Franke, Joern-Holger; Mao, Ming; Lariviere, Stephane; Decoster, Stefan; Di Lorenzo, Paolo; Kutrzeba Kotowska, Bogumila; Blanco, Victor; Hendrickx, Eric; Gallagher, Emily; Leray, Philippe; Kim, Ryan Ryoung han; McIntyre, Greg; Colsters, Paul; Wittebrood, Friso; van Dijk, Joep; Timoshkov, Vadim; Kiers, Ton; Maslow, Mark (2016)