Recently added

Characterization of selective emitter structures formed by laser doping through ALD Al2O3 layers

Sharma, Aashish; Cornagliotti, Emanuele; Uruena De Castro, Angel; Aleman, Monica; Tous, Loic; Russell, Richard; Duerinckx, Filip; Szlufcik, Jozef; Poortmans, Jef (2015)

Reverse replication of circular micro grating structures with soft lithography

Shang, Xiaobing; Missinne, Jeroen; Teigell Beneitez, Nuria; Jablonski, Michal; De Smet, Jelle; Joshi, Pankaj; Cuypers, Dieter; Baghdasaryan, T.; Vervaeke, Michael; Thienpont, Hugo; De Smet, Herbert (2015)

Switchable liquid crystal devices for efficient light steering

Shang, Xiaobing; De Smet, Jelle; Joshi, Pankaj; Cuypers, Dieter; Tan, J.; Willekens, O.; Beeckman, Jeroen; Neyts, K.; Baghdasaryan, T.; Vervaeke, M.; Thienpont, H.; De Smet, Herbert (2015)

The role of guide stripe chemistry in block copolymer directed self assembly

Seidel, Robert; Williamson, Lance; Her, YoungJun; Kim, Jihoon; Lin, Guanyang; Nealey, Paul; Gronheid, Roel (2015)

Recent progress in advanced in-line metrology for high-mobility semiconductors

Schulze, Andreas; Loo, Roger; Meersschaut, Johan; van Dorp, Dennis; Gachet, David; Berney, Jean; Vandervorst, Wilfried; Caymax, Matty (2015)

Advanced metrology for beyond silicon semiconductor device structures

Schulze, Andreas; Loo, Roger; Meersschaut, Johan; van Dorp, Dennis; Gachet, David; Berney, Jean; Vandervorst, Wilfried; Caymax, Matty (2015)

Actinic characterization of EUV photomasks by EUV scatterometry

Scholze, Frank; Soltwisch, Victor; Ullrich, A.; Philipsen, Vicky; Burger, Sven (2015)

ESD protection design in smart interposer

Scholz, Mirko; Hellings, Geert; Linten, Dimitri; Detalle, Mikael; La Manna, Antonio; Van der Plas, Geert; Beyne, Eric (2015-05)

ESD protection design in active interposer for 2.5 and 3D systems-in-package

Scholz, Mirko; Hellings, Geert; Chen, Shih-Hung; Linten, Dimitri; Detalle, Mikael; Roda Neve, Cesar; Shibkov, Andrei; La Manna, Antonio; Van der Plas, Geert; Beyne, Eric (2015-09)

Impact of local interconnects on ESD design

Scholz, Mirko; Chen, Shih-Hung; Hellings, Geert; Linten, Dimitri; Boschke, Roman (2015-06)

Neural network for blood cell classification in a holographic microscopy system

Schneider, Bendix; Vanmeerbeeck, Geert; Stahl, Richard; Lagae, Liesbet; Dambre, Joni; Bienstman, Peter (2015)

Using neural networks for high-speed blood cell classification in a holographic-microscopy flow-cytometry system

Schneider, Bendix; Vanmeerbeeck, Geert; Stahl, Richard; Lagae, Liesbet; Bienstman, Peter (2015)

Dry development rinse process for ultimate resolution Improvement via pattern collapse mitigation

Sayan, Safak; Tao, Zheng; Chan, BT; De Simone, Danilo; Kuwahara, Yuhei; Nafus, Kathleen; Leeson, Michael J.; Gstrein, Florian; Singh, Arjun; Vandenberghe, Geert (2015)

Directed self-assembly process integration – fin patterning

Sayan, Safak; Chan, BT; Marzook, Taisir; Vandenbroeck, Nadia; Altamirano Sanchez, Efrain; Gronheid, Roel; Singh, Arjun; Rincon Delgadillo, Paulina (2015)

In-line monitoring test structure for Charge-Based Capacitance Measurement (CBCM) with a start-stop self-pulsing circuit

Sawada, Ken; Van der Plas, Geert; Mori, Shigetaka; Cherman, Vladimir; Mercha, Abdelkarim; Verkest, Diederik; Fukuzaki, Yuzo; Ammo, Hiroaki (2015)

Novel junction design for NMOS Si bulk-FinFETs with extension doping by phosphorus doped silicate glass

Sasaki, Yuichiro; Ritzenthaler, Romain; Kimura, Y.; De Roest, David; Shi, Xiaoping; De Keersgieter, An; Kim, Min-Soo; Chew, Soon Aik; Kubicek, Stefan; Schram, Tom; Kikuchi, Yoshiaki; Demuynck, Steven; Veloso, Anabela; Vandervorst, Wilfried; Horiguchi, Naoto; Mocuta, Dan; Mocuta, Anda; Thean, Aaron (2015)

A comparison of arsenic and phosphorus extension by room temperature and hot ion implantation for NMOS Si bulk-FinFET at N7 (7nm) technology relevant fin dimensions

Sasaki, Yuichiro; Ritzenthaler, Romain; De Keersgieter, An; Chiarella, Thomas; Kubicek, Stefan; Rosseel, Erik; Waite, Andrew; del Agua Borniquel, Jose Ignacio; Colombeau, Benjamin; Chew, Soon Aik; Kim, Min-Soo; Schram, Tom; Demuynck, Steven; Vandervorst, Wilfried; Horiguchi, Naoto; Mocuta, Dan; Mocuta, Anda; Thean, Aaron (2015-06)

Conference contributions: Recent submissions

Characterization of selective emitter structures formed by laser doping through ALD Al2O3 layers

Reverse replication of circular micro grating structures with soft lithography

Switchable liquid crystal devices for efficient light steering

The role of guide stripe chemistry in block copolymer directed self assembly

Recent progress in advanced in-line metrology for high-mobility semiconductors

Advanced metrology for beyond silicon semiconductor device structures

Actinic characterization of EUV photomasks by EUV scatterometry

ESD protection design in smart interposer

ESD protection design in active interposer for 2.5 and 3D systems-in-package

Impact of local interconnects on ESD design

Neural network for blood cell classification in a holographic microscopy system

Using neural networks for high-speed blood cell classification in a holographic-microscopy flow-cytometry system

Dry development rinse process for ultimate resolution Improvement via pattern collapse mitigation

Directed self-assembly process integration – fin patterning

In-line monitoring test structure for Charge-Based Capacitance Measurement (CBCM) with a start-stop self-pulsing circuit

Novel junction design for NMOS Si bulk-FinFETs with extension doping by phosphorus doped silicate glass

A comparison of arsenic and phosphorus extension by room temperature and hot ion implantation for NMOS Si bulk-FinFET at N7 (7nm) technology relevant fin dimensions

Enhanced dynamic threshold UTBB SOI at high temperature

Dispersion free high voltage III-N buffer development on 200 mm silicon for power electronics

Gallium nitride epitaxy on large area silicon substrates for power and optoelectronic applications

Conference contributions: Recent submissions

Characterization of selective emitter structures formed by laser doping through ALD Al2O3 layers ﻿

Reverse replication of circular micro grating structures with soft lithography ﻿

Switchable liquid crystal devices for efficient light steering ﻿

The role of guide stripe chemistry in block copolymer directed self assembly ﻿

Recent progress in advanced in-line metrology for high-mobility semiconductors ﻿

Advanced metrology for beyond silicon semiconductor device structures ﻿

Actinic characterization of EUV photomasks by EUV scatterometry ﻿

ESD protection design in smart interposer ﻿

ESD protection design in active interposer for 2.5 and 3D systems-in-package ﻿

Impact of local interconnects on ESD design ﻿

Neural network for blood cell classification in a holographic microscopy system ﻿

Using neural networks for high-speed blood cell classification in a holographic-microscopy flow-cytometry system ﻿

Dry development rinse process for ultimate resolution Improvement via pattern collapse mitigation ﻿

Directed self-assembly process integration – fin patterning ﻿

In-line monitoring test structure for Charge-Based Capacitance Measurement (CBCM) with a start-stop self-pulsing circuit ﻿

Novel junction design for NMOS Si bulk-FinFETs with extension doping by phosphorus doped silicate glass ﻿

A comparison of arsenic and phosphorus extension by room temperature and hot ion implantation for NMOS Si bulk-FinFET at N7 (7nm) technology relevant fin dimensions ﻿

Enhanced dynamic threshold UTBB SOI at high temperature ﻿

Dispersion free high voltage III-N buffer development on 200 mm silicon for power electronics ﻿

Gallium nitride epitaxy on large area silicon substrates for power and optoelectronic applications ﻿

Characterization of selective emitter structures formed by laser doping through ALD Al2O3 layers

Reverse replication of circular micro grating structures with soft lithography

Switchable liquid crystal devices for efficient light steering

The role of guide stripe chemistry in block copolymer directed self assembly

Recent progress in advanced in-line metrology for high-mobility semiconductors

Advanced metrology for beyond silicon semiconductor device structures

Actinic characterization of EUV photomasks by EUV scatterometry

ESD protection design in smart interposer

ESD protection design in active interposer for 2.5 and 3D systems-in-package

Impact of local interconnects on ESD design

Neural network for blood cell classification in a holographic microscopy system

Using neural networks for high-speed blood cell classification in a holographic-microscopy flow-cytometry system

Dry development rinse process for ultimate resolution Improvement via pattern collapse mitigation

Directed self-assembly process integration – fin patterning

In-line monitoring test structure for Charge-Based Capacitance Measurement (CBCM) with a start-stop self-pulsing circuit

Novel junction design for NMOS Si bulk-FinFETs with extension doping by phosphorus doped silicate glass

A comparison of arsenic and phosphorus extension by room temperature and hot ion implantation for NMOS Si bulk-FinFET at N7 (7nm) technology relevant fin dimensions

Enhanced dynamic threshold UTBB SOI at high temperature

Dispersion free high voltage III-N buffer development on 200 mm silicon for power electronics

Gallium nitride epitaxy on large area silicon substrates for power and optoelectronic applications