Advanced EUV patterning of 2D TMDs for CMOS integration

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Authors
Faramarzi, Vina; de Poortere, Etienne; Venugopalan, Syam Parayil; Woltgens, Pieter; Woo, Youngtag; van de Kerkhof, Mark; Kumar, Pawan; Medina Silva, Henry; Morin, Pierre; Asselberghs, Inge; Dorow, Chelsey; O'Brien, Kevin; Maxey, Kirby; Avci, Uygar
DOI
10.1117/12.3011818
EISBN
978-1-5106-7219-2
ISBN
978-1-5106-7218-5
ISSN
0277-786X
Conference
Conference on Novel Patterning Technologies
Journal
Proceedings of SPIE
Volume
12956
Title
Advanced EUV patterning of 2D TMDs for CMOS integration
Publication type
Proceedings paper
Embargo date
2024-04-09
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220.500.12860/43996.2*2024-08-19T15:05:07Zvalidation by library/open access desk
120.500.12860/439962024-06-06T18:30:28Z

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