Low Landing Energy as an Enabler for Optimal Contour Based OPC Modeling in the EUV Era

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Authors
Alkoken, Ran; Baram, Mor; Oron, Gadi; Schuch, Nivea; Robert, Frederic; Figueiro, Thiago; Brand, Omri; Geta, Matan; Saha, Kasturi; Miller, Elias; Zavhon, Tal; Tiwari, Dipayan; Singh, Deepakkumar; Sarkar, Sujan Kumar; Rincon Delgadillo, Paulina; Lorusso, Gian; Beral, Christophe; Wei, Chih-I; Curvacho, Gabriel; Kim, Young Chang; Fenger, Germain
DOI
10.1117/12.3010898
EISBN
978-1-5106-7217-8
ISBN
978-1-5106-7216-1
ISSN
0277-786X
Conference
Conference on Metrology, Inspection, and Process Control XXXVIII
Journal
Proceedings of SPIE
Volume
12955
Title
Low Landing Energy as an Enabler for Optimal Contour Based OPC Modeling in the EUV Era
Publication type
Proceedings paper
Embargo date
2024-04-09
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220.500.12860/44048.2*2024-08-26T08:35:56Zvalidation by library/open access desk
120.500.12860/440482024-06-15T17:25:53Z

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