Authors

Armeanu, Ana-Maria; Pellens, Nick; Philipsen, Vicky; Malankin, Evgeny; Xu, Dongbo; Mizuuchi, Keisuke; Curvacho, Gabriel; Wei, Chih-, I; Lafferty, Neal; Fenger, Germain

DOI

10.1117/12.3031718

EISBN

978-1-5106-8289-4

ISBN

978-1-5106-8288-7

ISSN

0277-786X

Conference

39th European Mask and Lithography Conference (EMLC)

Journal

Proceedings of SPIE

Volume

13273

Title

High NA EUV single patterning of advanced metal logic nodes: Inverse lithography techniques in combination with alternative mask absorbers

Publication type

Proceedings paper