Browsing Presentations by author "Pantisano, Luigi"
Now showing items 1-13 of 13
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Charge trapping and dielectric reliability in alternative gate dielectrics: a key challenge for integration
Kerber, Andreas; Cartier, Eduard; Degraeve, Robin; Roussel, Philippe; Pantisano, Luigi; Kauerauf, Thomas; Groeseneken, Guido; De Gendt, Stefan; Heyns, Marc (2002) -
Charge trapping, mobility degradation and reliability of high-e gate stacks
Cartier, Eduard; Kerber, Andreas; Pantisano, Luigi; Carter, Richard; Kauerauf, Thomas; Degraeve, Robin (2002) -
Charging instability in n-channel MOSFETs with SiO2/HfO2 gate dielectrics
Kerber, Andreas; Cartier, Eduard; Pantisano, Luigi; Degraeve, Robin; Groeseneken, Guido; Maes, Herman; Schwalke, U. (2002) -
Correlation between charge Injection and trapping in SiO2/HfO2 gate stacks
Cartier, Eduard; Pantisano, Luigi; Kerber, Andreas; Groeseneken, Guido (2003) -
Electrical and physical characterization of MOSFETs with MBE grown La2HfO7 and HfO2 high-k dielectrics integrated in a conventional flow
Conard, Thierry; Pantisano, Luigi; Claes, Martine; Demand, Marc; Deweerd, Wim; De Gendt, Stefan; Houssa, Michel; Lujan, Guilherme; Ragnarsson, Lars-Ake; Rohr, Erika; Schram, Tom; Hooker, Jacob; Rittersma, Chris; Fompeyrinne, J.; Loquet, J.P. (2005) -
Electron energy dependence of defect generation in high-k gate stacks
O'Connor, Robert; Pantisano, Luigi; Degraeve, Robin; Kauerauf, Thomas; Kaczer, Ben; Roussel, Philippe; Groeseneken, Guido (2007) -
Interface state passivation in conventional SiO2/HfO2 p-channel FETs
Chen, Jerry; Pantisano, Luigi; Kerber, Andreas; Ragnarsson, Lars-Ake; Cartier, Eduard (2003) -
Molecular beam epitaxy for advanced gate stack materials and processes
Locquet, Jean-Pierre; Marchiori, Chiara; Sousa, M.; Siegwart, H.; Caimi, D.; Fompeyrine, Jean; Pantisano, Luigi; Claes, Martine; Conard, Thierry; Demand, Marc; Deweerd, Wim; De Gendt, Stefan; Heyns, Marc; Houssa, Michel; Aoulaiche, Marc; Lujan, Guilherme; Ragnarsson, Lars-Ake; Rohr, Erika; Schram, Tom; Hooker, Jacob; Rittersma, Chris; Furukawa, Yukiko; Seo, J.W.; dimoulas, A. (2005) -
MOSFET with La2HfO7 and HfO2 high-k dielectrics integrated in a conventional flow
Pantisano, Luigi; Conard, Thierry; Claes, Martine; Demand, Marc; Deweerd, Wim; De Gendt, Stefan; Heyns, Marc; Houssa, Michel; Aoulaiche, Marc; Lujan, Guilherme; Ragnarsson, Lars-Ake; Rohr, Erika; Schram, Tom; Hooker, Jacob; Rittersma, Chris; Fompereyne, Jean; Locquet, Jean-Pierre; dimoulas, A. (2005) -
On the thermal stability of Atomic Layer Deposition (ALD) TiN as gate electrode in MOS devices
Westlinder, J.; Schram, T.; Pantisano, Luigi; Cartier, Eduard; Kerber, Andreas; Lujan, Guilherme; Groeseneken, Guido (2002) -
Polarity dependent charge trapping in thin SiO2/Al2O3 gate staks with poly-Si gate electrodes: influence of high temperature annealing
Lucci, Luca; Pantisano, Luigi; Cartier, Eduard; Kerber, Andreas; Groeseneken, Guido; Ho, M.Y.; Green, Martin; Selmi, L. (2002) -
SiO2/HfO2 MOSFETs after X-rays irradiation: impact on MOSFET performance and interface degradation
Cimino, Salvatore; Pantisano, Luigi; Paccagnella, Alessandro; Giubilato, Pietro; Groeseneken, Guido (2004) -
Threshold voltage instability in CMOS high-K dielectrics: comparison between hafnium and aluminum oxide
Cimino, S.; Pantisano, Luigi; Pacagnella, A.; Groeseneken, Guido (2003)