Browsing by Author "Cooke, Mike"
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Publication A route towards the fabrication of 2D heterostructures using atomic layer etching combined with selective conversion
;Heyne, Markus ;Marinov, Daniil ;Braithwaite, NicholasGoodyear, AndyJournal article2019, 2D Materials, (6) 3, p.35030Publication Advanced etching for nanodevices and 2D materials
Meeting abstract2016, SNM special session at MNE Conference, 19/09/2016Publication Atomic layer etching of amorphous Si on MoS2 for selectively patterned MX2 heterostructures
Proceedings paper2017, iPlasmaNano-VIII, 2/07/2017Publication Atomic layer etching of amorphous silicon with selectivity towards MoS2
Meeting abstract2017, International Atomic Layer Etching Workshop - ALE, 15/07/2017Publication Atomic layer etching of amorphous silicon with selectivity towards MoS2 for novel MX2 heterostructure device concepts
Proceedings paper2017, 10th Plasma Etch and Strip for Microtechnology Workshop - PESM, 19/10/2017Publication Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask
Journal article2021, MICRO AND NANO ENGINEERING, 12, p.100089Publication Cryogenic etching vs P4 approaches: paths towards ultra-low damage integration of mesoporous oxide dielectric materials
Meeting abstract2014, AVS 61st International Symposium and Exhibition, 9/11/2014, p.EM-TuM-6Publication Evaluation of Ta-Co alloys as novel high-k extreme ultraviolet mask absorber
Journal article2023, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (22) 2, p.Art. 024403Publication Growth mechanism of a hybrid structure consisting of a graphite layer on top of vertical carbon nanotubes
Journal article2012, Journal of Nanomaterials, 2012, p.ID 130725Publication Low-damage cryogenic etch of porous organosilicate low-k dielectric
Meeting abstract2015, Micro-Nano Engineering Conference - MNE, 21/09/2015Publication Mitigation of plasma-induced damage in porous low-k dielectrics by cryogenic precursor condensation
Journal article2016, Journal of Physics D: Applied Physics, (49) 17, p.17Publication Molecular glass resists for all-dry high-resolution scanning probe lithography
;Neuber, Christian ;Cooke, Mike ;Despont, Michel ;Durig, Urs ;Kastner, MarkusKnoll, ArminOral presentation2013, 39th International Conference on Micro and Nano EngineeringPublication Molecular glass resists for scanning probe lithography
;Neuber, Christian ;Ringk, Andreas ;Kolb, Tristan ;Wieberger, FloryanStrohriegl, PeterProceedings paper2014, Alternative Lithographic Technologies VI, 23/02/2014, p.90491VPublication Paths towards low-damage etching of highly porous organo-silicate low-k dielectrics
Oral presentation2016, SPIE Advanced Lithography ConferencePublication Selective patterning of amorphous silicon on MoS2 for enabling transition-metal dichalcogenide heterostructures
Meeting abstract2017, MRS Spring Meeting, 17/04/2017Publication Selective patterning of amorphous silicon on MoS2 to fabricate transition-metal dichalcogenide heterostructures
Proceedings paper2017, Graphene 2017, 28/03/2017Publication Single nanometer pattern transfer
Meeting abstract2015, MNE Micro-Nano Engineering Conference / SNM special session, 21/09/2015Publication Ultra-low damage integration of k= 2.3 periodic mesoporous oxide dielectric material using cryogenic etching
Meeting abstract2014, MRS Spring Meeting Symposium CC: New Materials and Processes for Interconnects, Novel Memory and Advanced Display Technologies, 21/04/2014, p.CC1.04Publication Vacuum ultra-violet damage and damage mitigation for plasma processing of highly porous organosilicate glass dielectrics
Journal article2015, Journal of Applied Physics, (118) 13, p.133302