Browsing by Author "D'Urzo, Lucia"

Capture probability of assembly defects in 14 nm half-pitch line/space DSA patterns

Continuous improvements of defectivity rates in immersion photolithography via functionalized membranes in point-of-use photochemical filtration

Defect capture sensitivity in 14 nm half-pitch line/space DSA patterns

Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow

Defect mitigation and root cause studies in imec's 14 nm half-pitch chemo-epitaxy DSA flow

Defect reduction and defect stability in imec's 14nm half pitch chemo-epitaxy DSA flow

Defectivity modulation in EUV resists through advanced filtration technologies

Defectivity study on dry development rinse process (DDRP)

DSA materials contributions to the defectivity performance of the 14nm half-pitch LiNe flow @ imec

High performance filtration for bulk materials: a novel HDPE membrane filter designed for EUV Lithography

High volume manufacturing compatible dry development rinse process (DDRP): patterning and defectivity performance for EUVL

Point-of-use filtration strategy for negative tone developer in extended immersion and extreme-ultraviolet (EUV) lithography

Use of a purged FOUP to improve H-terminated silicon surface stability prior to epitaxial growth