Browsing by Author "Dollinger, G."
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Publication Advanced characterization of high-K materials: a nuclear approach
Journal article2002, Nuclear Instruments & Methods in Physics Research B, 190, p.505-509Publication An (un)solvable problem in SIMS: B-interfacial profiling
Journal article2003, Applied Surface Science, 203-204, p.371-376Publication Assessment of the near-surface profiling capabilities of SIMS
Meeting abstract2003, Ultra Shallow Junctions. 7th Int. Worksh. Fabrication, Characterization and Modeling of Ultra Shallow Doping Profiles in Semic., 27/04/2003, p.165Publication Characterization of the B and As pile-up at the Si-SiO2 interface
Proceedings paper2003, Ultra Shallow Junctions. 7th Int. Worksh. Fabrication, Characterization and Modeling of Ultra Shallow Doping Profiles in Semic., 27/04/2003, p.399-404Publication Characterization of ultra thin oxynitrides, a general approach
Oral presentation1999, IBA-14-ECAART-6; July 1999; Dresden, Germany.Publication Characterization of ultra thin oxynitrides: a general approach
Journal article2000, Nuclear Instruments and Methods B, 161-163, p.429-434Publication Errors in near-surface and interfacial profiling of boron and arsenic
Proceedings paper2004-05, Proceedings of the 14th Int. Conference on Secondary Ion Mass Spectometry and Related Topics, 14/09/2003, p.618-631Publication Errors in near-surface and interfacial profiling of boron and arsenic
Journal article2004-06, Applied Surface Science, 231-232, p.618-631Publication High resolution depth profiling of future gate dielectric materials
; Publication High resolution elastic recoil detection
Journal article2004, Nuclear Instruments & Methods in Physics Research B, 219-220, p.333-343Publication Near-surface B/As profiling with SIMS: (in)solvable problems?
Meeting abstract2003, International Conference on Secondary Ion Mass Spectrometry - SIMS XIV, 14/09/2003, p.233Publication Physical characterization of mixed HfAlOx layers by complementary analysis techniques
Journal article2004, Materials Science and Engineering B, 109, p.60-63Publication Physical characterization of thin HfO2 layers by the combined analysis with complementary techniques
Proceedings paper2003, Analytical Techniques for Semiconductor Materials and Processes, 27/04/2003, p.223-232Publication Quantification and depth profiling of a ZrO2 (2nm)/A1203 (1nm) layer with NRA, RBS, HRBS, HERD
Oral presentation2001, 15th International Conference on Ion Beam Analysis (IBA); July 2001; Cairns, Australia.Publication Recent developments in nuclear methods in support of semiconductor characterization
Proceedings paper2003, Analytical Techniques for Semiconductor Materials and Processes, 27/04/2003, p.50-62