Browsing by Author "Gogolides, Evangelos"
- Results Per Page
- Sort Options
Publication Challenges in LER/CDU metrology in DSA: placement error and cross-line correlations
Proceedings paper2016, Metrology, Inspection, and Process Control for Microlithography XXX, 20/02/2016, p.97781XPublication Challenges in line edge roughness metrology in directed self-assembly lithography: placement errors and cross-line correlations
Journal article2017, Journal of Micro/Nanolithography MEMS and MOEMS, (16) 2, p.24001Publication Computational nanometrology of line edge roughness: recent challenges and advances
Proceedings paper2017, EMLC2017, 27/06/2017Publication Computational nanometrology of line edge roughness: recent challenges and advances
Oral presentation2017, 43rd International Conference on Micro and Nanoengineering - MNEPublication Computational nanometrology of line-edge roughness: noise effectd, cross-line correlations and the role of etch transfer
Proceedings paper2018, Advanced Etch Technology for Nanopatterning VII, 25/02/2018, p.105890YPublication Contact edge roughness and CD uniformity in EUV: effect of photo acid generator and sensitizer
Publication Contact edge roughness: effects of dose and PAG concentration in EUV lithography
Publication Contact-edge roughness (CER) characterization and modeling: effect of dose on CER and crtitical dimension uniformity
Publication Critical dimension uniformity and contact edge roughness in extreme ultraviolet lithography: effect of photoacid generator, sensitizer and quencher
Publication Deep learning nanometrology of line edge roughness
Publication Effects of different processing conditions on line edge roughness for 193-nm and 157-nm resists
Proceedings paper2004, Metrology, Inspection, and Process Control for Microlithography XVIII, 22/02/2004, p.266-275Publication Multifractal analysis of line-edge roughness
Proceedings paper2018, Metrologia, Inspection, and Process Control for Microlithography XXXII, 25/02/2018, p.1058534Publication Setting up a proper power spectral density (PSD) and autocorrelation analysis for material and process characterization
Proceedings paper2018, Metrology, Inspection, and Process Control for Microlithography XXXII, 25/02/2018, p.105851KPublication Towards a complete description of line width roughness: a comparison of different methods for vertical and spatial LER and LWR analysis