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Browsing by Author "Goodyear, Andy"

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    A route towards the fabrication of 2D heterostructures using atomic layer etching combined with selective conversion

    Heyne, Markus
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    Marinov, Daniil
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    Braithwaite, Nicholas
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    Goodyear, Andy
    Journal article
    2019, 2D Materials, (6) 3, p.35030
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    Advanced etching for nanodevices and 2D materials

    de Marneffe, Jean-Francois  
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    Cooke, Mike
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    Goodyear, Andy
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    Braithwaite, Nicolas
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    Sutton, Yvonne
    Meeting abstract
    2016, SNM special session at MNE Conference, 19/09/2016
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    Atomic layer etching of amorphous Si on MoS2 for selectively patterned MX2 heterostructures

    Heyne, Markus
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    Goodyear, Andy
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    de Marneffe, Jean-Francois  
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    Cooke, Mike
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    Neyts, Erik
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    Radu, Iuliana  
    Proceedings paper
    2017, iPlasmaNano-VIII, 2/07/2017
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    Atomic layer etching of amorphous silicon with selectivity towards MoS2

    Heyne, Markus
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    Goodyear, Andy
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    de Marneffe, Jean-Francois  
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    Cooke, Mike
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    Radu, Iuliana  
    Meeting abstract
    2017, International Atomic Layer Etching Workshop - ALE, 15/07/2017
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    Atomic layer etching of amorphous silicon with selectivity towards MoS2 for novel MX2 heterostructure device concepts

    Heyne, Markus
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    Goodyear, Andy
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    de Marneffe, Jean-Francois  
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    Cooke, Mike
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    Neyts, Erik C.
    Proceedings paper
    2017, 10th Plasma Etch and Strip for Microtechnology Workshop - PESM, 19/10/2017
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    Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask

    Wu, Meiyi  
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    de Marneffe, Jean-Francois  
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    Opsomer, Karl  
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    Detavernier, Christophe
    Journal article
    2021, MICRO AND NANO ENGINEERING, 12, p.100089
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    Cryogenic etching vs P4 approaches: paths towards ultra-low damage integration of mesoporous oxide dielectric materials

    de Marneffe, Jean-Francois  
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    Zhang, Liping  
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    Heyne, Markus
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    Krishtab, Mikhail  
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    Goodyear, Andy
    Meeting abstract
    2014, AVS 61st International Symposium and Exhibition, 9/11/2014, p.EM-TuM-6
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    Evaluation of Ta-Co alloys as novel high-k extreme ultraviolet mask absorber

    Thakare, Devesh  
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    Wu, Meiyi  
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    Opsomer, Karl  
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    Saadeh, Qais
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    Soltwisch, Victor
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    Naujok, Philipp
    Journal article
    2023, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (22) 2, p.Art. 024403
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    Low damage cryogenic etching of low-k materials for advanced interconnects

    Baklanov, Mikhaïl
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    Zhang, Liping  
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    de Marneffe, Jean-Francois  
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    Dussart, Remi
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    Goodyear, Andy
    Meeting abstract
    2014, 23rd Conference on Materials for Advanced Metallization - MAM, 2/03/2014, p.59-60
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    Low-damage cryogenic etch of porous organosilicate low-k dielectric

    Zhang, Liping  
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    Goodyear, Andy
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    Cooke, Mike
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    de Marneffe, Jean-Francois  
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    De Gendt, Stefan  
    Meeting abstract
    2015, Micro-Nano Engineering Conference - MNE, 21/09/2015
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    Mitigation of plasma-induced damage in porous low-k dielectrics by cryogenic precursor condensation

    Zhang, Liping  
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    de Marneffe, Jean-Francois  
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    Leroy, Florian
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    Lefaucheux, Philippe
    Journal article
    2016, Journal of Physics D: Applied Physics, (49) 17, p.17
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    Paths towards low-damage etching of highly porous organo-silicate low-k dielectrics

    de Marneffe, Jean-Francois  
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    Zhang, Liping  
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    Watanabe, Mitsuhiro
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    yatsuda, koichi
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    Maekawa, Kaoru
    Oral presentation
    2016, SPIE Advanced Lithography Conference
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    Photoresist treatment using an ICP H2 plasma and low ESC temperature: LWR study

    De Schepper, Peter  
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    Altamirano Sanchez, Efrain  
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    Goodyear, Andy
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    El Otell, Ziad  
    Proceedings paper
    2014, 1st Single nanometer Manufacturing Workshop, 2/07/2014
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    Photoresist treatment using an ICP H2 plasma and low ESC temperature: LWR study

    De Schepper, Peter  
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    Altamirano Sanchez, Efrain  
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    Goodyear, Andy
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    El Otell, Ziad  
    Meeting abstract
    2014, Plasma Etch and Strip Processes in Microtechnology - PESM, 12/05/2014
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    Selective patterning of amorphous silicon on MoS2 for enabling transition-metal dichalcogenide heterostructures

    Heyne, Markus
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    de Marneffe, Jean-Francois  
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    Goodyear, Andy
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    Cooke, Mike
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    Radu, Iuliana  
    Meeting abstract
    2017, MRS Spring Meeting, 17/04/2017
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    Selective patterning of amorphous silicon on MoS2 to fabricate transition-metal dichalcogenide heterostructures

    Heyne, Markus
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    Goodyear, Andy
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    de Marneffe, Jean-Francois  
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    Cooke, Mike
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    Radu, Iuliana  
    Proceedings paper
    2017, Graphene 2017, 28/03/2017
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    Ultra-low damage integration of k= 2.3 periodic mesoporous oxide dielectric material using cryogenic etching

    de Marneffe, Jean-Francois  
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    Zhang, Liping  
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    Krishtab, Mikhail  
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    Goodyear, Andy
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    Cooke, Mike
    Meeting abstract
    2014, MRS Spring Meeting Symposium CC: New Materials and Processes for Interconnects, Novel Memory and Advanced Display Technologies, 21/04/2014, p.CC1.04
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    Vacuum ultra-violet damage and damage mitigation for plasma processing of highly porous organosilicate glass dielectrics

    de Marneffe, Jean-Francois  
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    Zhang, Liping  
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    Heyne, Markus
    ;
    Lukaszewicz, Mikolasj
    Journal article
    2015, Journal of Applied Physics, (118) 13, p.133302

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