Browsing by Author "Goodyear, Andy"
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Publication A route towards the fabrication of 2D heterostructures using atomic layer etching combined with selective conversion
;Heyne, Markus ;Marinov, Daniil ;Braithwaite, NicholasGoodyear, AndyJournal article2019, 2D Materials, (6) 3, p.35030Publication Advanced etching for nanodevices and 2D materials
Meeting abstract2016, SNM special session at MNE Conference, 19/09/2016Publication Atomic layer etching of amorphous Si on MoS2 for selectively patterned MX2 heterostructures
Proceedings paper2017, iPlasmaNano-VIII, 2/07/2017Publication Atomic layer etching of amorphous silicon with selectivity towards MoS2
Meeting abstract2017, International Atomic Layer Etching Workshop - ALE, 15/07/2017Publication Atomic layer etching of amorphous silicon with selectivity towards MoS2 for novel MX2 heterostructure device concepts
Proceedings paper2017, 10th Plasma Etch and Strip for Microtechnology Workshop - PESM, 19/10/2017Publication Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask
Journal article2021, MICRO AND NANO ENGINEERING, 12, p.100089Publication Cryogenic etching vs P4 approaches: paths towards ultra-low damage integration of mesoporous oxide dielectric materials
Meeting abstract2014, AVS 61st International Symposium and Exhibition, 9/11/2014, p.EM-TuM-6Publication Evaluation of Ta-Co alloys as novel high-k extreme ultraviolet mask absorber
Journal article2023, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (22) 2, p.Art. 024403Publication Low damage cryogenic etching of low-k materials for advanced interconnects
Meeting abstract2014, 23rd Conference on Materials for Advanced Metallization - MAM, 2/03/2014, p.59-60Publication Low-damage cryogenic etch of porous organosilicate low-k dielectric
Meeting abstract2015, Micro-Nano Engineering Conference - MNE, 21/09/2015Publication Mitigation of plasma-induced damage in porous low-k dielectrics by cryogenic precursor condensation
Journal article2016, Journal of Physics D: Applied Physics, (49) 17, p.17Publication Paths towards low-damage etching of highly porous organo-silicate low-k dielectrics
Oral presentation2016, SPIE Advanced Lithography ConferencePublication Photoresist treatment using an ICP H2 plasma and low ESC temperature: LWR study
Proceedings paper2014, 1st Single nanometer Manufacturing Workshop, 2/07/2014Publication Photoresist treatment using an ICP H2 plasma and low ESC temperature: LWR study
Meeting abstract2014, Plasma Etch and Strip Processes in Microtechnology - PESM, 12/05/2014Publication Selective patterning of amorphous silicon on MoS2 for enabling transition-metal dichalcogenide heterostructures
Meeting abstract2017, MRS Spring Meeting, 17/04/2017Publication Selective patterning of amorphous silicon on MoS2 to fabricate transition-metal dichalcogenide heterostructures
Proceedings paper2017, Graphene 2017, 28/03/2017Publication Ultra-low damage integration of k= 2.3 periodic mesoporous oxide dielectric material using cryogenic etching
Meeting abstract2014, MRS Spring Meeting Symposium CC: New Materials and Processes for Interconnects, Novel Memory and Advanced Display Technologies, 21/04/2014, p.CC1.04Publication Vacuum ultra-violet damage and damage mitigation for plasma processing of highly porous organosilicate glass dielectrics
Journal article2015, Journal of Applied Physics, (118) 13, p.133302