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Browsing by Author "Hellings, Geert"

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    1mA/μm-ION strained SiGe45%-IFQW pFETs with raised and embedded S/D

    Mitard, Jerome  
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    Witters, Liesbeth  
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    Hellings, Geert  
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    Krom, Raymond
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    Franco, Jacopo  
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    Eneman, Geert  
    Proceedings paper
    2011, Symposium on VLSI Technology, 13/06/2011, p.134-135
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    3D sequential stacked planar devices featuring low-temperature replacement metal gate junctionless top devices with improved reliability

    Vandooren, Anne  
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    Franco, Jacopo  
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    Parvais, Bertrand  
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    Wu, Zhicheng  
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    Witters, Liesbeth  
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    Walke, Amey  
    Journal article
    2018-11, IEEE Transactions on Electron Devices, (65) 11, p.5165-5171
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    3D sequential stacked planar devices on 300 mm wafers featuring replacement metal gate junction-less top devices processed at 525°C with improved reliability

    Vandooren, Anne  
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    Franco, Jacopo  
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    Parvais, Bertrand  
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    Wu, Zhicheng  
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    Witters, Liesbeth  
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    Walke, Amey  
    Proceedings paper
    2018, IEEE Symposium on VLSI Technology, 18/06/2018, p.69-70
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    3D SRAM Macro Design in 3D Nanofabric Process Technology

    Abdi, Dawit  
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    Salahuddin, Shairfe Muhammad  
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    Boemmels, Juergen  
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    Giacomin, Edouard
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    Weckx, Pieter  
    Journal article
    2023, IEEE TRANSACTIONS ON CIRCUITS AND SYSTEMS I-REGULAR PAPERS, (70) 7, p.2858-2867
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    50 nm Gate Length FinFET Biosensor & the Outlook for Single-Molecule Detection

    Santermans, Sybren  
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    Barge, David  
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    Hellings, Geert  
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    Bergfeld Mori, Carlos  
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    Migacz, Konrad Joseph  
    Proceedings paper
    2020, IEEE International Electron Devices Meeting (IEDM), DEC 12-18, 2020
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    85nm-wide 1.5mA/μm-ION IFQW SiGe-pFET: raised vs embedded Si0.75Ge0.25 S/D benchmarking and in-depth hole transport study

    Mitard, Jerome  
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    Witters, Liesbeth  
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    Eneman, Geert  
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    Hellings, Geert  
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    Pantisano, Luigi
    Proceedings paper
    2012, Symposium on VLSI Technology - VLSIT, 12/06/2012, p.163-164
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    A 1.8-V GPIO With Design-Technology-Reliability Co-Optimization in Sub-3-nm GAA-NS Technology

    Chen, Wen-Chieh  
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    Chen, Shih-Hung  
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    Huang, Man-Ching  
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    Chang, Shu-Wei
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    Hellings, Geert  
    Journal article
    2025, IEEE JOURNAL OF SOLID-STATE CIRCUITS, (60) 2, p.615-625
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    A Compact Physics Analytical Model for Hot-Carrier Degradation

    Tyaginov, Stanislav  
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    Grill, Alexander  
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    Vandemaele, Michiel  
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    Grasser, Tibor
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    Hellings, Geert  
    Proceedings paper
    2020, IEEE International Reliability Physics Symposium (IRPS), APR 28-MAY 30, 2020
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    A fast and accurate method to study the impact of interface traps on germanium MOS performance

    Hellings, Geert  
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    Eneman, Geert  
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    Mitard, Jerome  
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    Martens, Koen  
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    Wang, Wei-E
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    Hoffmann, Thomas Y.
    Journal article
    2011, IEEE Transactions on Electron Devices, (58) 4, p.938-944
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    A Holistic Evaluation of Buried Power Rails and Back-Side Power for Sub-5 nm Technology Nodes

    Nibhanupudi, S. S. Teja
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    Prasad, Divya
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    Das, Shidhartha
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    Zografos, Odysseas  
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    Robinson, Alex
    Journal article
    2022-07-07, IEEE TRANSACTIONS ON ELECTRON DEVICES, (69) 8, p.4453-4459
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    A physics-aware compact modeling framework for transistor aging in the entire bias space

    Wu, Zhicheng  
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    Franco, Jacopo  
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    Roussel, Philippe  
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    Tyaginov, Stanislav  
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    Truijen, Brecht  
    Proceedings paper
    2019, IEEE International Electron Devices Meeting - IEDM, 7/12/2019, p.494-497
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    Active-lite interposer for 2.5 & 3D integration

    Hellings, Geert  
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    Scholz, Mirko
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    Detalle, Mikael  
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    Velenis, Dimitrios  
    Proceedings paper
    2015, IEEE Symposium on VLSI Technology, 16/06/2015, p.T222-T223
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    AlGaN Extrem-UV detectors for space applications

    John, Joachim  
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    Malinowski, Pawel  
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    Alparicio, Patricia
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    Hellings, Geert  
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    Germain, Marianne
    Proceedings paper
    2007, 31st Workshop on Compound Semiconductor Devices and Integrated Circuits - WOCSDICE, 20/05/2007, p.291-294
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    AlGaN Schottky diodes for detector applications in the UV wavelength range

    Hellings, Geert  
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    John, Joachim  
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    Lorenz, Anne
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    Mertens, Robert  
    Proceedings paper
    2008, 14th Mediterrean Electrotechnical Conference - MELECON, 5/05/2008, p.916-922
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    AlGaN Schottky diodes for detector applications in the UV wavelength range

    Hellings, Geert  
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    John, Joachim  
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    Lorenz, Anne
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    Malinowski, Pawel  
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    Mertens, Robert  
    Journal article
    2009, IEEE Transactions on Electron Devices, (56) 11, p.2833-2839
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    AlxGa1-xN focal plane arrays for imaging applications in the extreme ultraviolet (EUV) wavelength range

    John, Joachim  
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    Malinowski, Pawel  
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    Aparicio, Patricia
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    Hellings, Geert  
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    Lorenz, Anne
    Proceedings paper
    2007, Optical Sensing Technology and Applications, 16/05/2007, p.658505
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    Analysis of advanced technology nodes and h-NA EUV introduction: a cost perspective

    Mirabelli, Gioele  
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    Wang, Jane  
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    Trivkovic, Darko  
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    Weckx, Pieter  
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    Spessot, Alessio  
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    Ronse, Kurt  
    Proceedings paper
    2021, International Conference on Extreme Ultraviolet Lithography, SEP 27-OCT 01, 2021, p.11854OD
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    Analysis of dopant diffusion and defects in SiGe channel quantum well for laser annealed device using an atomistic kinetic Monte Carlo approach

    Noda, Taji
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    Witters, Liesbeth  
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    Mitard, Jerome  
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    Rosseel, Erik  
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    Hellings, Geert  
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    Vrancken, Christa  
    Proceedings paper
    2011, IEEE International Electron Devices Meeting - IEDM, 5/12/2011, p.797-800
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    Analysis of dopant diffusion and defects in SiGe-channel implant free quantum well (IFQW) devices using an atomistic kinetic Monte Carlo approach

    Noda, Taiji
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    Mitard, Jerome  
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    Witters, Liesbeth  
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    Hellings, Geert  
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    Vrancken, Christa  
    Proceedings paper
    2012, International Electron Devices Meeting - IEDM, 10/12/2012, p.30.2
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    Analysis of the features of hot-carrier degradation in FinFETs

    Makarov, Alexander
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    Tyaginov, Stanislav  
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    Kaczer, Ben  
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    Jech, Markus
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    Vaisman Chasin, Adrian  
    Journal article
    2018-10, Semiconductors, (52) 10, p.1298-1302
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