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Browsing by Author "Krishnasamy, Rajendran"

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    A novel model for boron diffusion in SiGe strained layers based on a kinetic driven Ge-B pairing mechanism

    Villaneuva, D.
    ;
    Moens, P.
    ;
    Krishnasamy, Rajendran
    ;
    Schoenmaker, Wim
    Proceedings paper
    2001, Proceedings of the International Conference on Simulation of Semiconductor Physics and Processes - SISPAD; 5-7 September 2001; A, p.22-25
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    A simple model and simulation of complete suppression of boron out-diffusion in Si1-xGex by carbon insertion

    Krishnasamy, Rajendran
    ;
    Schoenmaker, Wim
    Proceedings paper
    2001, Proceedings of the International Conference on Simulation of Semiconductor Physics and Processes - SISPAD; 5-7 September 2001; A, p.66-69
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    A simple modelling of device speed in double-gate SOI MOSFETs

    Krishnasamy, Rajendran
    ;
    Samudra, G.
    Journal article
    2000, Microelectronics Journal, (31) 4, p.255-259
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    Comparative analysis of minimum surface potential and location of barrier peaks in various Si MOSFET devices

    Samudra, G.
    ;
    Krishnasamy, Rajendran
    Journal article
    2000, International Journal of Electronics, (87) 5, p.513-530
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    Measurement and simulation of boron diffusion in strained Si1- xGex epitaxial layers

    Krishnasamy, Rajendran
    ;
    Schoenmaker, Wim
    ;
    Decoutere, Stefaan  
    ;
    Loo, Roger  
    ;
    Caymax, Matty  
    Journal article
    2001, IEEE Trans. Electron Devices, (48) 9, p.2022-2031
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    Measurement and simulation of boron diffusion in strained Si1- xGex epitaxial layers with a linearly graded germanium profile

    Krishnasamy, Rajendran
    ;
    Schoenmaker, Wim
    Journal article
    2001, Solid-State Electronics, (45) 11, p.1879-1884
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    Measurement and simulation of boron diffusion in strained Si1-xGex epitaxial layers with linearly graded germanium profile

    Krishnasamy, Rajendran
    ;
    Schoenmaker, Wim
    Proceedings paper
    2000, Proceedings of ICCCD, 15/12/2000
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    Measurement and simulation of boron diffusivity in strained Si1-XGex epitaxial layers

    Krishnasamy, Rajendran
    ;
    Schoenmaker, Wim
    Journal article
    2001, VLSI Design, (13) 1_4, p.317-321
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    Measurement and simulation of boron diffusivity in strained Si1-xGex epitaxial layers

    Krishnasamy, Rajendran
    ;
    Schoenmaker, Wim
    Proceedings paper
    2000, Proceedings of the 7th International Workshop on Computational Electronics - IWCE, 22/05/2000, p.108-109
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    Modeling and simulation of nonlinear electron-hole plasma in deep submicron n-MOSFET devices

    Krishnasamy, Rajendran
    ;
    Ganesh, S. S.
    Journal article
    1999, Journal of Nonlinear Optical Physics and Materials, (8) 2, p.289-304
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    Modeling of clustering reaction and diffusion of boron in strained Si1-xGex epitaxial layers

    Krishnasamy, Rajendran
    ;
    Villaneuva, D.
    ;
    Moens, P.
    ;
    Schoenmaker, Wim
    Journal article
    2003, Solid-State Electronics, (47) 5, p.835-839
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    Modeling of complete suppression of boron out-diffusion in Si1-xGex by carbon incorporation

    Krishnasamy, Rajendran
    ;
    Schoenmaker, Wim
    Journal article
    2001, Solid-State Electronics, 45, p.229-233
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    Modeling of minimum surface potential and sub-threshold swing for grooved-gate MOSFETs

    Krishnasamy, Rajendran
    ;
    Schoenmaker, Wim
    Journal article
    2001, Microelectronics Journal, 32, p.631-639
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    Modelling and computer simulation study of laser-plasma interaction in semiconductor

    Krishnasamy, Rajendran
    Journal article
    1999, COMPEL - The International Journal for Computation and Mathematics in Electrical and Electronic Engineering, (18) 2, p.187-203
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    Modelling of transconductance-to-current ratio (g(m)ID) analysis on double-gate SOI MOSFETs

    Krishnasamy, Rajendran
    ;
    Samudra, G. S.
    Journal article
    2000, Semiconductor Science and Technology, (15) 2, p.139-144
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    Simulation of boron diffusion in strained Si1-xGex epitaxial layers

    Krishnasamy, Rajendran
    ;
    Schoenmaker, Wim
    ;
    Decoutere, Stefaan  
    ;
    Caymax, Matty  
    Proceedings paper
    2000, Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices - SISPAD, 6/09/2000, p.206-209
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    Studies of boron diffusion in strained Si1-xGex epitaxial layers

    Krishnasamy, Rajendran
    ;
    Schoenmaker, Wim
    Journal article
    2001, Journal of Applied Physics, (89) 1, p.980-987

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