Browsing by Author "Krishnasamy, Rajendran"
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Publication A novel model for boron diffusion in SiGe strained layers based on a kinetic driven Ge-B pairing mechanism
;Villaneuva, D. ;Moens, P. ;Krishnasamy, RajendranSchoenmaker, WimProceedings paper2001, Proceedings of the International Conference on Simulation of Semiconductor Physics and Processes - SISPAD; 5-7 September 2001; A, p.22-25Publication A simple model and simulation of complete suppression of boron out-diffusion in Si1-xGex by carbon insertion
;Krishnasamy, RajendranSchoenmaker, WimProceedings paper2001, Proceedings of the International Conference on Simulation of Semiconductor Physics and Processes - SISPAD; 5-7 September 2001; A, p.66-69Publication A simple modelling of device speed in double-gate SOI MOSFETs
;Krishnasamy, RajendranSamudra, G.Journal article2000, Microelectronics Journal, (31) 4, p.255-259Publication Comparative analysis of minimum surface potential and location of barrier peaks in various Si MOSFET devices
;Samudra, G.Krishnasamy, RajendranJournal article2000, International Journal of Electronics, (87) 5, p.513-530Publication Measurement and simulation of boron diffusion in strained Si1- xGex epitaxial layers
Journal article2001, IEEE Trans. Electron Devices, (48) 9, p.2022-2031Publication Measurement and simulation of boron diffusion in strained Si1- xGex epitaxial layers with a linearly graded germanium profile
;Krishnasamy, RajendranSchoenmaker, WimJournal article2001, Solid-State Electronics, (45) 11, p.1879-1884Publication Measurement and simulation of boron diffusion in strained Si1-xGex epitaxial layers with linearly graded germanium profile
;Krishnasamy, RajendranSchoenmaker, WimProceedings paper2000, Proceedings of ICCCD, 15/12/2000Publication Measurement and simulation of boron diffusivity in strained Si1-XGex epitaxial layers
;Krishnasamy, RajendranSchoenmaker, WimJournal article2001, VLSI Design, (13) 1_4, p.317-321Publication Measurement and simulation of boron diffusivity in strained Si1-xGex epitaxial layers
;Krishnasamy, RajendranSchoenmaker, WimProceedings paper2000, Proceedings of the 7th International Workshop on Computational Electronics - IWCE, 22/05/2000, p.108-109Publication Modeling and simulation of nonlinear electron-hole plasma in deep submicron n-MOSFET devices
;Krishnasamy, RajendranGanesh, S. S.Journal article1999, Journal of Nonlinear Optical Physics and Materials, (8) 2, p.289-304Publication Modeling of clustering reaction and diffusion of boron in strained Si1-xGex epitaxial layers
;Krishnasamy, Rajendran ;Villaneuva, D. ;Moens, P.Schoenmaker, WimJournal article2003, Solid-State Electronics, (47) 5, p.835-839Publication Modeling of complete suppression of boron out-diffusion in Si1-xGex by carbon incorporation
;Krishnasamy, RajendranSchoenmaker, WimJournal article2001, Solid-State Electronics, 45, p.229-233Publication Modeling of minimum surface potential and sub-threshold swing for grooved-gate MOSFETs
;Krishnasamy, RajendranSchoenmaker, WimJournal article2001, Microelectronics Journal, 32, p.631-639Publication Modelling and computer simulation study of laser-plasma interaction in semiconductor
Krishnasamy, RajendranJournal article1999, COMPEL - The International Journal for Computation and Mathematics in Electrical and Electronic Engineering, (18) 2, p.187-203Publication Modelling of transconductance-to-current ratio (g(m)ID) analysis on double-gate SOI MOSFETs
;Krishnasamy, RajendranSamudra, G. S.Journal article2000, Semiconductor Science and Technology, (15) 2, p.139-144Publication Simulation of boron diffusion in strained Si1-xGex epitaxial layers
Proceedings paper2000, Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices - SISPAD, 6/09/2000, p.206-209Publication Studies of boron diffusion in strained Si1-xGex epitaxial layers
;Krishnasamy, RajendranSchoenmaker, WimJournal article2001, Journal of Applied Physics, (89) 1, p.980-987