Browsing by Author "Naujok, Philipp"
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Publication Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask
Journal article2021, MICRO AND NANO ENGINEERING, 12, p.100089Publication Determination of optical constants of thin films in the EUV
Journal article2022, APPLIED OPTICS, (61) 8, p.2060-2078Publication Evaluation of Ta-Co alloys as novel high-k EUV mask absorber
Proceedings paper2022, Conference on Optical and EUV Nanolithography XXXV Part of SPIE Advanced Conference, APR 24-MAY 27, 2022, p.120510DPublication Evaluation of Ta-Co alloys as novel high-k extreme ultraviolet mask absorber
Journal article2023, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (22) 2, p.Art. 024403Publication First results of EUV-scanner compatibility tests performed on novel 'high-NA' reticle absorber materials
Publication Mask absorber for next generation EUV lithography
Proceedings paper2020, Conference on Extreme Ultraviolet Lithography, SEP 21-25, 2020Publication Nested Sampling aided determination of tantalum optical constants in the EUV spectral range
Journal article2022, APPLIED OPTICS, (61) 33, p.10032-10042Publication On the optical constants of cobalt in the M-absorption edge region
Journal article2023, OPTIK, (273) February, p.Art.: 170455Publication Optical constants for EUV scatterometry
Proceedings paper2021, Modeling Aspects in Optical Metrology VII, 21/06/2021, p.117830MPublication Study of novel EUVL mask absorber candidates
Journal article2021, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (20) 2Publication Time-frequency analysis assisted determination of ruthenium optical constants in the sub-EUV spectral range 8 nm-23.75 nm
Journal article2021, OPTICS EXPRESS, (29) 25, p.40993-41013Publication Tunability of the optical constants of tantalum-cobalt alloy thin films in the extreme ultraviolet
Journal article2023, OPTICAL MATERIALS EXPRESS, (13) 1, p.78-91