Browsing by Author "Neumann, Jens Timo"
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Publication Actinic characterization and modeling of the EUV mask stack
Proceedings paper2013, 29th European Mask and Lithography Conference, 25/06/2013, p.88860BPublication Alternative EUV mask technology for mask 3D effect compensation
Proceedings paper2014, International Symposium on Extreme Ultraviolet Lithography - EUVL, 27/10/2014Publication Alternative EUV mask technology to compensate for mask 3D effects
Proceedings paper2015, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII, 20/04/2015, p.96580IPublication Characterization and control of dynamic lens heating effects under high-volume manufacturing conditions
Proceedings paper2011, Optical Microlithography XXIV, 27/02/2011, p.79730VPublication Defect detection and classification on imec iN5 node BEoL test vehicle with multibeam scanning electron microscope
;Neumann, Jens Timo ;Srikantha, Abhilash ;Huethwohl, Philipp ;Lee, KeumsilWilliam, B. JamesJournal article2023, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (22) 2, p.Art. 021009Publication Defect detection and classification on imec iN5 node BEoL test vehicle with MultiSEM
;Neumann, Jens Timo ;Srikantha, Abhilash ;Huthwohl, Philipp ;Lee, KeumsilWilliam, James B.Proceedings paper2022, Conference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference, FEB 24-MAY 27, 2022, p.Art. 1203501Publication Experimental validation of novel EUV mask technology to reduce mask 3D effects
Proceedings paper2015, 31st European Mask and Lithography Conference, 22/06/2015, p.966109Publication Experimental validation of novel mask technology to reduce mask 3D effects
Proceedings paper2015, Photomask Technology 2015, 29/09/2015, p.96350ZPublication Experimental verification of source-mask optimization and freeform illumination for 22 nm node SRAM cells
Journal article2011-03, Journal of Micro/Nanolithography MEMS and MOEMS, (10) 1, p.13008Publication Impact of mask stack on high NA EUV imaging
Oral presentation2012, International Symposium on Extreme Ultraviolet Lithography - EUVLPublication Mask 3D effect mitigation by source optimization and assist feature placement
Proceedings paper2016, International Symposium on Extreme Ultraviolet Lithography - EUVL, 24/10/2016Publication Scanner matching for standard and freeform illumination shapes using FlexRay
Proceedings paper2011, Optical Microlithography XXIV, 27/02/2011, p.79731I