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Browsing by Author "Neumann, Jens Timo"

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    Actinic characterization and modeling of the EUV mask stack

    Philipsen, Vicky  
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    Hendrickx, Eric  
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    Jonckheere, Rik  
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    Davydova, Natalia
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    Fliervoet, Timon  
    Proceedings paper
    2013, 29th European Mask and Lithography Conference, 25/06/2013, p.88860B
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    Alternative EUV mask technology for mask 3D effect compensation

    Van Look, Lieve  
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    Philipsen, Vicky  
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    Hendrickx, Eric  
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    Vandenberghe, Geert  
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    Knops, Roel
    Proceedings paper
    2014, International Symposium on Extreme Ultraviolet Lithography - EUVL, 27/10/2014
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    Alternative EUV mask technology to compensate for mask 3D effects

    Van Look, Lieve  
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    Philipsen, Vicky  
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    Hendrickx, Eric  
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    Vandenberghe, Geert  
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    Davydova, Natalia
    Proceedings paper
    2015, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII, 20/04/2015, p.96580I
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    Characterization and control of dynamic lens heating effects under high-volume manufacturing conditions

    Bekaert, Joost  
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    Van Look, Lieve  
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    Vandenberghe, Geert  
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    Van Adrichem, Paul  
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    Maslow, Mark J.
    Proceedings paper
    2011, Optical Microlithography XXIV, 27/02/2011, p.79730V
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    Defect detection and classification on imec iN5 node BEoL test vehicle with multibeam scanning electron microscope

    Neumann, Jens Timo
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    Srikantha, Abhilash
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    Huethwohl, Philipp
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    Lee, Keumsil
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    William, B. James
    Journal article
    2023, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (22) 2, p.Art. 021009
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    Defect detection and classification on imec iN5 node BEoL test vehicle with MultiSEM

    Neumann, Jens Timo
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    Srikantha, Abhilash
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    Huthwohl, Philipp
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    Lee, Keumsil
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    William, James B.
    Proceedings paper
    2022, Conference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference, FEB 24-MAY 27, 2022, p.Art. 1203501
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    Experimental validation of novel EUV mask technology to reduce mask 3D effects

    Van Look, Lieve  
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    Philipsen, Vicky  
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    Hendrickx, Eric  
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    Davydova, Natalia
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    Wittebrood, Friso
    Proceedings paper
    2015, 31st European Mask and Lithography Conference, 22/06/2015, p.966109
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    Experimental validation of novel mask technology to reduce mask 3D effects

    Van Look, Lieve  
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    Philipsen, Vicky  
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    Hendrickx, Eric  
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    Davydova, Natalia
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    Wittebrood, Friso
    Proceedings paper
    2015, Photomask Technology 2015, 29/09/2015, p.96350Z
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    Experimental verification of source-mask optimization and freeform illumination for 22 nm node SRAM cells

    Bekaert, Joost  
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    Laenens, Bart
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    Verhaegen, Staf
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    Van Look, Lieve  
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    Trivkovic, Darko  
    Journal article
    2011-03, Journal of Micro/Nanolithography MEMS and MOEMS, (10) 1, p.13008
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    Impact of mask stack on high NA EUV imaging

    Philipsen, Vicky  
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    Hendrickx, Eric  
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    Jonckheere, Rik  
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    Vandenberghe, Geert  
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    Davydova, Natalia
    Oral presentation
    2012, International Symposium on Extreme Ultraviolet Lithography - EUVL
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    Mask 3D effect mitigation by source optimization and assist feature placement

    Van Look, Lieve  
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    Mochi, Iacopo
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    Philipsen, Vicky  
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    Gallagher, Emily  
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    Hendrickx, Eric  
    Proceedings paper
    2016, International Symposium on Extreme Ultraviolet Lithography - EUVL, 24/10/2016
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    Scanner matching for standard and freeform illumination shapes using FlexRay

    Bekaert, Joost  
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    Van Look, Lieve  
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    D'have, Koen  
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    Laenens, Bart
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    Vandenberghe, Geert  
    Proceedings paper
    2011, Optical Microlithography XXIV, 27/02/2011, p.79731I

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