Browsing by Author "Röhr, Erika"
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Publication A new HF vapor native oxide removal process for cluster applications
Proceedings paper1998, Proceedings of the Symposium on Contamination Free Manufacturing for Semiconductor Manufacturing; SEMICON West, 13/07/1998, p.J1-J10Publication A new HF vapor process for native oxide removal, suited for cluster applications
; ; ; Publication A perspective on dry laser cleaning for semiconductor manufacturing
Oral presentation2001, International Workshop on New Trends in Laser Cleaning; Joint with the 2nd International Symposium on Laser Precision MicrofabriPublication Compatibility of polysilicon with HfO2-based gate dielectrics for CMOS applications
Proceedings paper2003, ULSI Process Integration III, 28/04/2003, p.391-396Publication Developments in cleaning technology for critical layers
Oral presentation2000, Santa Clara Plastics Symposium on Cleaning Technology; May 2000Publication Effect of postdeposition anneal conditions on defect density of HfO2 layers measured by wet etching
Journal article2004, Journal of the Electrochemical Society, (151) 11, p.F269-F275Publication Effects of interactions between HfO2 and poly-Si on MOSCAP and MESFET electrical behaviour
Proceedings paper2003, Extended Abstracts International Workshop on Gate Insulator - IWGI, 6/11/2003, p.62-63Publication Electrical evaluation of the EPI/substrate interface quality after different in-situ and ex-situ low-temperature pre-epi cleaning methods
; ; ; ; Proceedings paper1999, Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon, 21/09/1998, p.237-240Publication Electrical evaluation of the EPI/substrate interface quality after different in-situ and ex-situ low-temperature pre-epi cleaning methods
; ; ; ; Oral presentation1998, 4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSSPublication Evaluation of a dry laser cleaning process
Proceedings paper1998, 44th Annual Meeting of Inst. Environmental Science and Technology, 26/04/1998, p.202-209Publication Evaluation of a dry laser cleaning process for the removal of surface particles
Proceedings paper1999, Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon, 21/09/1998, p.187-190Publication Evaluation of a dry laser cleaning process for the removal of surface particles
Oral presentation1998, 4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSSPublication Fluorine in thermal oxides from HF preoxidation surface treatments
Journal article1999, Electrochemical and Solid State Letters, (2) 7, p.336-338Publication Gas-phase surface proessing prior to 3.2nm gate oxidation
Oral presentation1998, 4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSSPublication Gas-phase surface proessing prior to 3.2nm gate oxidation
Proceedings paper1999, Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon, 21/09/1998, p.85-88Publication Impact of ALCVD and PVD titanium nitride deposition on metal gate capacitors
Proceedings paper2002, ESSDERC - 32nd European Solid-State Device Research Conference, 24/09/2002, p.583-586Publication Implementation of high-k gate dielectrics - a status update
Proceedings paper2003, Extended Abstracts of International Workshop on Gate Insulator - IWGI, 6/11/2003, p.10-14Publication Influence of beam incidence angle on dry laser cleaning of surface parcticles
Journal article2000, Applied Surface Science, (157) 1_2, p.67-73Publication Integration of high-k gate dielectrics - wet etch, cleaning and surface conditioning
Meeting abstract2003, 204th Meeting of the Electrochemical Society: 8th Int. Symp. on Cleaning Technology in Semiconductor Device Manufacturing, 13/10/2003Publication Investigation of fluorine in dry ultrathin silicon oxides
Journal article2001, Journal of Vacuum Science & Technology B, (19) 6, p.2108-2113