imec Institutional Repository Browsing {{ collection }} by Author "Rakhimova, T.V."

Publication

1-D model of OSG low-k films modification by EUV/VUV emission

Rakhimova, T.V.

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Rakhimov, A.T.

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Mankelevich, Y.A.

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Lopaev, D.V.

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Ziryanov, S.M.

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Kovalev, A.S.

Meeting abstract

2013, Plasma Etch and Strip in Microtechnology - PESM, 14/03/2013

Publication

Plasma processing of low-k dielectrics

Baklanov, Mikhaïl

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de Marneffe, Jean-Francois

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Shamiryan, D.

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Urbanowicz, A.

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Shi, H.

Journal article

2013, Journal of Applied Physics, (113) 4, p.41101

Publication

Recombination of O and H atoms with low-k SiOCH films pretreated in He plasma

Baklanov, Mikhaïl

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Braginsky, O.V.

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Kovalev, A.S.

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Lopaev, D.V.

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Mankelevich, Y.A.

Proceedings paper

2009, Materials, Processes and Reliability for Advanced Interconnects for Micro- and Nanoelectronics, 14/04/2009, p.1156-D01-06

Publication

Recombination probabilities of O and H atoms on the surface of nanoporous low dielectric constant SiCOH films

Braginsky, O.V.

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Kovalev, A.S.

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Lopaev, D.V.

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Malykhin, E.M.

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Mankelevich, Y.A.

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Rakhimova, T.V.

Proceedings paper

2009, Advanced Metallization Conference 2008 (AMC 2008), 8/10/2008, p.573-579

Publication

Recombination probabilities of O and H atoms on the surface of nanoporous Low-k SiCOH dielectrics

Braginsky, O.V.

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Kovalev, A.S.

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Lopaev, D.V.

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Malykhin, E.M.

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Mankelevich, Y.A.

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Rakhimova, T.V.

Meeting abstract

2008, ADMETA: Advanced Metallization Conference, 8/10/2008, p.38-39

Publication

Spatially resolved dynamics of methyl groups removal from SiOCH films by oxygen atoms. Monte-Carlo model of O atoms behavior in nanoporous material

Mankelevivh, Yu.A.

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Braginsky, O.V

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Kovalev, A.S.

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Lopaev, D.V.

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Malykhin, E.M.

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Rakhimova, T.V.

Meeting abstract

2010, Materials for Advanced Metallization Conference - MAM, 8/03/2010

Publication

The effect of He plasma treatment on properties of organosilicate glass low-k films

Braginsky, O.V.

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Kovalev, A.S.

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Lopaev, D.V.

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Malykhin, E.M.

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Mankelevich, Y.A.

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Proshina, O.V.

Journal article

2011, Journal of Applied Physics, (109) 4, p.43303

Publication

The influence of He plasma pretreatment on O and H atom interaction with low-k nanoporous materials

Braginsky, O.V.

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Kovalev, A.S.

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Lopaev, D.V.

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Malykhin, E.M.

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Mankelevich, Y.A.

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Rakhimova, T.V.

Proceedings paper

2009, 62nd Annual Gaseous Electronics Conference - GEC, 20/10/2009

Publication

The mechanism of low-k SiOCH film modification by oxygen atoms

Braginsky, O.V.

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Kovalev, A.S.

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Lopaev, D.V.

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Malykhin, E.M.

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Mankelevich, Y.A.

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Rakhimova, T.V.

Journal article

2010, Journal of Applied Physics, (108) 7, p.73303

Browsing by Author "Rakhimova, T.V."