Browsing by Author "Schiffelers, Guido"
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Publication A new concept to qualify pattern shift on EUV scanners
Oral presentation2019, 35th European Mask and Lithography Conference EMLC 2019Publication Assist features: placement, impact and relevance
Proceedings paper2016, Extreme Ultraviolet (EUV) Lithography VII, 21/02/2016, p.97761SPublication Benefits of using advanced sub-resolution features for 0.55NA brightfield imaging
Proceedings paper2024, 2024 International Conference on Extreme Ultraviolet Lithography, 2024-09-29Publication Edge placement error analysis for N7 logic patterning options
Publication EUV vote-taking lithography for mitigation of printing mask defects, CDU improvement, and stochastic failure reduction
; ; ; ; van de Kerkhof, Mark A..Journal article2018, Journal of Micro/Nanolithography MEMS and MOEMS, (17) 4, p.41013Publication EUV vote-taking lithography: Crazy.... or not ?
Proceedings paper2018, Extreme Ultraviolet (EUV) Lithography IX, 26/02/2018, p.105830IPublication Experimental verification of phase induced mask 3D effects in EUV imaging
Proceedings paper2015, International Symposium on Extreme Ultraviolet Lithography - EUVL, 5/10/2015Publication Impact of local variability on defect-aware process windows
Proceedings paper2019, Extreme Ultraviolet (EUV) Lithography X, 24/02/2019, p.109570HPublication Impact of sequential infiltration synthesis (SIS) on roughness and stochastic nano-failures for EUVL patterning
; ; ; ; ; Kissoon, NicolaProceedings paper2019, Extreme Ultraviolet (EUV) Lithography X, 24/02/2019, p.109570SPublication Improving exposure latitude and aligning best focus through pitch by curing M3D effects with controlled aberrations
Proceedings paper2019, International conference on Extreme Ultraviolet Lithography, 15/09/2019, p.111470EPublication Mask 3D effect mitigation by source optimization and assist feature placement
Proceedings paper2016, International Symposium on Extreme Ultraviolet Lithography - EUVL, 24/10/2016Publication NXE:3300 insertion for N7 : status and challenges
Proceedings paper2015, International Symposium on Extreme Ultraviolet Lithography - EUVL, 5/10/2015Publication Optimization and stability of CD variability in pitch 40 nm contact holes on NXE:3300
Proceedings paper2018, International Conference on Extreme Ultraviolet Lithography, 17/09/2018, p.108090MPublication Roughness decomposition: an on-wafer methodology to discriminate mask, metrology, and shot noise contributions
Meeting abstract2019, Metrology, Inspection, and Process Control for Microlithography XXXIII, 24/02/2019, p.109590TPublication Single exposure EUV block downscaling for metal pitches below 32nm
Proceedings paper2017, 15th Fraunhofer IISB Lithography Simulation Workshop, 21/09/2017Publication Tool-to-tool optical proximity effect matching
; ; ; ; Proceedings paper2008, Optical Microlithography XXI, 24/02/2008, p.69241QPublication Understanding of Out-of-Band DUV light in EUV lithography: controlling impact on imaging and mitigation strategies
Proceedings paper2015, 31st European Mask and Lithography Conference, 22/06/2015, p.96610B