Browsing by Author "Schmidt, Harald"
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Publication A new cleaning concept for particle and metal removal on Si surfaces
Proceedings paper1994, Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 15/10/1993, p.15-25Publication A semi-quantitative method for studying photoresist stripping
Proceedings paper1994, Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 15/10/1993, p.581-586Publication Cleaning of metal contamination
Proceedings paper1994, Contamination Control and Defect Reduction in Semiconductor Manufacturing III, 23/05/1994, p.241-252Publication Cleaning technology for highly reliable gate oxides
Proceedings paper1994, Proceedings of the International Conference on Advanced Microelectronic Devices and Processing - AMDP, 03/03/1994, p.59-66Publication Development of a reduced cleaning process for application in a spray processor
Proceedings paper1996, Proceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 23/09/1996, p.149-52Publication Effect of oxidation ramp up on the redistribution of metallic contamination in gate oxides
Proceedings paper1994, Proceedings of the Institute of Environmental Science: 40th Annual Technical Meeting, 01/05/1994, p.325-331Publication H2O2 decomposition and its impact on silicon surface roughening and gate oxide integrity
Journal article1995, Japanese Journal of Applied Physics. Part 1, (34) 2B, p.727-731Publication How clean is clean enough?
Proceedings paper1995, Proceedings of SEMICON/West 1995 Technical Seminar: Cleaning Technology for the Submicron Era, 11/07/1995, p.7Publication Impact of the electrochemical properties of silicon wafer surfaces on copper outplating from HF solutions
Journal article1996, Journal of the Electrochemical Society, (143) 10, p.3323-3327Publication Impact of the electrochemical properties of silicon wafer surfaces on copper outplating from HF solutions
Proceedings paper1996, Proceedings of the Fourth International Symposium on Cleaning technology in Semiconductor Device Manufacturing, 9/10/1995, p.284-291Publication Improvement and evaluation of drying techniques for HF-last wafer cleaning
Proceedings paper1994, Proceedings of the 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 19/09/1994, p.167-170Publication In situ and real time characterization of wet chemical silicon surface processes by electrochemical open circuit potential measurements
Proceedings paper1995, ALTECH 95: Analytical Techniques for Semiconductor Materials and Process Characterization II. Proceedings of the Satellite Sympo, 28/09/1995, p.316-327Publication In situ and real time studies of wet chemical silicon cleaning reactions
Proceedings paper1996, Proceedings of the4th International Symposium on Cleaning technology in Semiconductor Device Manufacturing, 9/10/1995, p.480-491Publication Interaction of the sulphuric acid hydrogen peroxide mixture with silicon surfaces
Proceedings paper1994, Proceedings of the 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 19/09/1994, p.301-304Publication Just-Clean- Enough technology for the 21st century
Oral presentation1995, SEMICON EuropePublication Limitations of minority carrier lifetime as a parameter for evaluating iron contamination in silicon
Meeting abstract1994, 186th Electrochemical Society Fall Meeting: Symposium on High Purity Silicon III, 9/10/1994, p.625Publication Metal interactions with silica (SiO2) surfaces: adsorption and ion exchange
Proceedings paper1996, Proceedings of the Fourth International Symposium on Cleaning technology in Semiconductor Device Manufacturing, 9/10/1995, p.277-283Publication Modelling of the hydrogen passivation kinetics of Si in dilute HF solutions
Proceedings paper1994, Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 15/10/1993, p.176-185Publication New drying techology for advanced cleaning in IC manufacturing
Proceedings paper1994, Vacuum and Semiconductor Processing Conference, 15/06/1994Publication Outplating of metallic contaminants on silicon wafers from diluted acid solutions
Proceedings paper1995, Ultraclean Semiconductor Processing Technology and Surface Chemical Cleaning and Passivation, 17/04/1995, p.183-188