Browsing by Author "Storm, Wolfgang"
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Publication A controlled deposition of organic contamination and the removal with ozone based cleaning
Proceedings paper2001, Ultra Clean Processing of Silicon Surfaces 2000: Proceedings of the 5th International Conference - UCPSS, 18/09/2000, p.223-226Publication Advanced characterisation : an indispensable tool for ultra clean processing
Journal article1995, Microelectronic Engineering, (28) 1_4, p.27-34Publication Controlled deposition of organic contamination and removal with ozone-based cleaning
Journal article2001, Journal of the Electrochemical Society, (148) 3, p.G118-125Publication Degradation of clean Si-surfaces due to storage in clean (?) wafer boxes
Proceedings paper1994, Proceedings of the 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 19/09/1994, p.367-370Publication Improved understanding and characterisation of rapid thermal oxides
Publication In situ and real time studies of wet chemical silicon cleaning reactions
Proceedings paper1996, Proceedings of the4th International Symposium on Cleaning technology in Semiconductor Device Manufacturing, 9/10/1995, p.480-491Publication Just-Clean- Enough technology for the 21st century
Oral presentation1995, SEMICON EuropePublication Protective films formed by RIE of Co and Ti silicides and ways of their removal
Proceedings paper1996, Proceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 23/09/1996, p.171-174Publication Protective films formed during the etching of TiSi2 and CoSi2 in F-based plasmas
Oral presentation1996, Materials Research Society Fall Meeting: Symposium Cb: Thin Films. Surface and Morphology; December 2-6, 1996; Boston, USA.Publication RBS Analysis of Artefacts Induced by Low Energy Ion Sputtering
Oral presentation1994, 13th International Conference on the Application of Accelerators in Research and Industry; November 7-10, 1994; Denton, Texas, UPublication Removal of organic contamination from silicon surfaces
Proceedings paper1996, Proceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 23/09/1996, p.107-110Publication Stoichiometric changes of Si, CoSi2 and TiSi2 during low energy oxygen bombardment in combination with oxygen bleed-in
Journal article1996, Nuclear Instruments and Methods in Physics Research B, 118, p.541-546Publication Stoichiometry changes during low energy oxygen bombardment
Journal article1995, Nuclear Instruments and Methods in Physics Research B, (99) 1_4, p.614-18Publication Surface characterization after different wet chemical cleans
Proceedings paper2001, Ultra Clean Processing of Silicon Surfaces 2000: Proceedings of the 5th International Conference - UCPSS, 18/09/2000, p.67-70Publication Surface processes occuring on TiSi2 and CoSi2 in fluorine-based plasmas: afterglow of NF3 plasma
Journal article1998, Journal of Vacuum Science and Technology B, (16) 1, p.167-172Publication Surface processes occurring on TiSi2 and CoSi2 in fluorine-based plasmas. Reactive ion etching in CF4/CHF3 plasmas
Journal article1997, J. Vacuum Science and Technology A, (15) 6, p.3005-3014Publication The behaviour of Si and CoSi2 during low energy nitrogen bombardment, with and without O-2 flooding
Journal article1996, Nuclear Instruments and Methods in Physics Research B, 113, p.534-538Publication The importance of H-passivation for low-temperature APCVD silicon epitaxy
Proceedings paper1996, Proceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 23/09/1996, p.269-272Publication The kinetics and mechanism of the etching of CoSi2 in HF-based solutions
Publication ToF-SIMS and XPS characterization of plasma etch residues on cobalt silicide surfaces
Proceedings paper1997, Secondary Ion Mass Spectrometry - SIMS X : Proceedings of the 10th International Conference, 2/10/1995, p.921-924