Browsing by Author "Thakare, Devesh"

Evaluation of Ta-Co alloys as novel high-k EUV mask absorber

Evaluation of Ta-Co alloys as novel high-k extreme ultraviolet mask absorber

Exploring the optimal combination of Ru/Ta bilayer mask stacks and illumination source shapes to mitigate mask 3D effects at high-NA extreme ultraviolet lithography

First results of EUV-scanner compatibility tests performed on novel 'high-NA' reticle absorber materials

High-NA EUV Optical Proximity Correction Modeling Flow: from Data Preparation to Model Validation

Mask absorber for next generation EUV lithography

Mask innovations on the eve of high NA EUV lithography

Nested Sampling aided determination of tantalum optical constants in the EUV spectral range

On the optical constants of cobalt in the M-absorption edge region

Optimizing EUV Imaging Metrics as a Function of Absorber Thickness and Illumination Source: Simulation Case Study of Ta-Co alloys

Optimizing extreme ultraviolet lithography imaging metrics as a function of absorber thickness and illumination source: a simulation case study of Ta-Co alloy

Precise optical constants: determination and impact on metrology, simulation and development of EUV masks

Ru/Ta bilayer approach to EUV mask absorbers: Experimental patterning and simulated imaging perspective

Study of novel EUVL mask absorber candidates

Tunability of the optical constants of tantalum-cobalt alloy thin films in the extreme ultraviolet