Browsing by Author "Verhaverbeke, Steven"
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Publication A HF vapour etch process for integration in cluster-tool processes: characteristics and applications
Publication A new cleaning concept for particle and metal removal on Si surfaces
Proceedings paper1994, Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 15/10/1993, p.15-25Publication Analysis of Iddq failures through spectral photon emission microscopy
Journal article1998, Microelectronics Reliability, (38) 6_8, p.877-882Publication Analysis of Iddq failures through spectral photon emission microscopy
Proceedings paper1998, Proceedings of the 9th European Symposium on Reliability of Electron Devices and Failure Physics - ESREF, 5/10/1998, p.877-882Publication Cleaning technology for highly reliable gate oxides
Proceedings paper1994, Proceedings of the International Conference on Advanced Microelectronic Devices and Processing - AMDP, 03/03/1994, p.59-66Publication Hydrogen passivation of HF last cleaned (100) silicon surfaces investigated by multiple internal reflection infrared spectroscopy
Journal article1994, Journal of the Electrochemical Society, (141) 11, p.3128-3136Publication Hydrogen passivation of HF-last cleaned (100) silicon surfaces: a MIR-FTIR study
Proceedings paper1994, Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 15/10/1993, p.186-194Publication Modelling of the hydrogen passivation kinetics of Si in dilute HF solutions
Proceedings paper1994, Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 15/10/1993, p.176-185Publication New wet cleaning technology for highly reliable thin oxides
Verhaverbeke, StevenOral presentation1994, Semicon/West : Large Diameter Silicon Wafer Cleaning TechnologyPublication Silicon surface roughening by the decomposition of hydrogen peroxide
Proceedings paper1994, Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 15/10/1993, p.102-110Publication Surface reconstruction of hydrogen annealed (100) silicon
Journal article1994, Journal of Applied Physics, (75) 2, p.1207-1209Publication The etching mechanisms of SiO2 in hydrofluoric acid
Journal article1994, Journal of the Electrochemical Society, (141) 10, p.2852-2857Publication The IMEC Clean concept : an advanced wafer cleaning technology
Oral presentation1994, 23rd Symposium on ULSI Ultra Clean TechnologyPublication The relation between sodium and aluminum contamination and dielectric breakdown in MOS structures
Proceedings paper1994, Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 15/10/1993, p.58-64Publication Ultra Clean Processing Technologies: Advanced Si-Surface Preparation Techniques
Proceedings paper1994, Isolators and Minienvironments. Scottish Society for Contamination Control; November 9, 1994; Glasgow, UK., p.38-48Publication Ultra clean processing technologies: advanced si-surface preparation techniques
Proceedings paper1994, Technical Conference SEMICON / Europe, 12/04/1994Publication Ultra clean processing technology for highly reliable gate oxides
Proceedings paper1994, Proceedings of the Institute of Environmental Science: 40th Annual Technical Meeting, 01/05/1994, p.200-209