Browsing by Author "Winroth, Gustaf"
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Publication 193nm immersion lithography for high performance silicon photonic circuits
Proceedings paper2014, Optical Microlithography XXVII, 23/02/2014, p.90520FPublication A comparison of positive- and negative tone contact hole process flows using the IMEC NXE 3100
Proceedings paper2012, International Symposium on Extreme Ultraviolet Lithography - EUVL, 30/09/2012Publication Advanced 300-mm waferscale patterning for silicon photonics devices with record low loss and phase errors
Proceedings paper2012, 17th Opto-Electronics and Communications Conference - OECC, 2/07/2012, p.15-16Publication Critical material properties for pattern collapse mitigation
Proceedings paper2012, Advances in Resist Materials and Processing Technology XXIX, 12/02/2012, p.83250RPublication Critical material properties for pattern collapse mitigation
Journal article2012, Journal of Micro/Nanolithography MEMS and MOEMS, (11) 3, p.33004Publication Double patterning with dual hard mask for 28nm node devices and below
Journal article2013, Journal of Micro/Nanolithography MEMS and MOEMS, (12) 4, p.41306Publication Double patterning with dual hard mask for 28nm node devices and below
Proceedings paper2013, Advanced Etch Technology for Nanopatterning II, 24/02/2013, p.86850PPublication Highly uniform and low-loss passive silicon photonics devices using a 300mm CMOS platform
Proceedings paper2014, Optical Fiber Communication Conference and Exposition - OFC, 9/03/2014, p.Th2A.33Publication Mechanism of pattern collapse improvement using TBAH development
; Winroth, GustafProceedings paper2010, International Symposium on Extreme Ultraviolet Lithography, 17/10/2010Publication Modelling the lithography of ion implantation resists on topography
Proceedings paper2014, Optical Microlithography XXVII, 23/02/2014, p.90520ZPublication Molecular Layer Deposition of organic-inorganic hybrid materials for implant BARC applications
Meeting abstract2013, AVS 60th International Symposium & Exhibition, 27/10/2013, p.53Publication Precuring implant photoresists for shrink and patterning control
Journal article2013, Journal of Micro/Nanolithography MEMS and MOEMS, (12) 4, p.41303Publication Precuring implant photoresists for shrink and patterning control
Proceedings paper2013, Advances in Resist Materials and Processing Technology XXX, 24/02/2013, p.868207Publication Process optimization enabled by novel quantitative pattern collapse metrology
Publication Quantification of shot noise contributions to contact hole local CD non-uniformity
Proceedings paper2012, Extreme Ultraviolet (EUV) Lithography III, 12/02/2012, p.83220MPublication Quantitative pattern collapse metrology for 193nm immersion lithography
Journal article2011, Journal of Photopolymer Science and Technology, (24) 2, p.233-238Publication Relationship between film thickness loss and polymer deprotection for extreme ultraviolet and ArF photoresists
Journal article2012, Journal of Vacuum Science and Technology B, (30) 6, p.06FG01Publication Roughness and variability in EUV lithography: Who is to blame? (Part 1)
Proceedings paper2013, Extreme Ultraviolet (EUV) Lithography IV, 24/02/2013, p.86792OPublication Strength analysis of EUV-exposed photo resists by AFM at 40 nm half pitch
Journal article2012, Microelectronic Engineering, 98, p.159-162Publication Understanding EUV resist dissolution characteristics and its impact to RLS limitations
Proceedings paper2011, Extreme Ultraviolet (EUV) Lithography II, 27/02/2011, p.796911