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Browsing by Author "Xu, Kaidong"

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    15nm half-pitch patterning: EUV + SELF-aligned double patterning

    Versluijs, Janko  
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    Souriau, Laurent  
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    Hellin, David  
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    Orain, Isabelle
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    Kimura, Yoshie
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    Kunnen, Eddy
    Oral presentation
    2012, International Symposium on Extreme Ultraviolet Lithography - EUVL
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    15nm HP patterning with EUV and SADP: key contributors for improvement of LWR, LER, and CDU

    Xu, Kaidong
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    Souriau, Laurent  
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    Hellin, David  
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    Versluijs, Janko  
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    Wong, Patrick  
    Proceedings paper
    2013, Advanced Etch Technology for Nanopatterning II, 23/02/2013, p.86850C
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    15nm HP patterning with EUV lithography and SADP

    Souriau, Laurent  
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    Hellin, David  
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    Kunnen, Eddy
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    Versluijs, Janko  
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    Dekkers, Harold  
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    Albert, Johan
    Meeting abstract
    2012, 34th International Symposium on Dry Process - DPS, 15/11/2012
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    28nm pitch of line/space pattern transfer into silicon substrates with chemo-epitaxy directed self-assembly (DSA) process flow

    Chan, BT  
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    Tahara, Shigeru
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    Parnell, Doni
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    Rincon Delgadillo, Paulina  
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    Gronheid, Roel  
    Oral presentation
    2013, 39th International Conference on Micro and Nano Engineering - MNE
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    A force study in brush scrubbing

    Xu, Kaidong
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    Vos, Rita  
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    Vereecke, Guy  
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    Doumen, Geert  
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    Mertens, Paul  
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    Heyns, Marc  
    Oral presentation
    2004, 7th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
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    A force study in brush scrubbing

    Xu, Kaidong
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    Vos, Rita  
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    Vereecke, Guy  
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    Doumen, Geert  
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    Fyen, Wim
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    Mertens, Paul  
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    Heyns, Marc  
    Proceedings paper
    2005, Ultra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium, 20/09/2004, p.279-282
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    A force study of on-chip magnetic particle transport based on tapered conductors

    Wirix-Speetjens, Roel
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    Fyen, Wim
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    Xu, Kaidong
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    De Boeck, Jo  
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    Borghs, Gustaaf  
    Journal article
    2005, IEEE Trans. Magnetics, 41, p.4128-4133
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    A study in interactions of plasmas and wet cleans with ULK materials

    Xu, Kaidong
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    Vereecke, Guy  
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    Kesters, Els  
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    Le, Quoc Toan  
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    Lux, Marcel  
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    Kraus, Harald
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    Henry, Sally - Ann
    Proceedings paper
    2007, 1st International Workshop Plasma Etch and Strip in Microelectronics - PESM, 10/09/2007
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    Advanced wafer surface cleaning technology

    Mertens, Paul  
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    Vos, Rita  
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    Vereecke, Guy  
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    Arnauts, Sophia  
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    Bearda, Twan
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    De Waele, Rita
    Oral presentation
    2004, SEMICON Korea 2004 STS, S5: Contamination-free Manufacturing Seminar
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    Advances and challenges in ultra low-k patterning

    Xu, Kaidong
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    Souriau, Laurent  
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    Lazzarino, Frederic  
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    de Marneffe, Jean-Francois  
    Meeting abstract
    2012, China Semiconductor Technology International Conference - CSTIC, 18/03/2012
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    Aging phenomena in the removal of nano-particles from Si wafers

    Vereecke, Guy  
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    Veltens, J.
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    Xu, Kaidong
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    Eitoku, A.
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    Sano, Ken-Ichi
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    Arnauts, Sophia  
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    Kenis, Karine  
    Proceedings paper
    2008, Ultra Clean Processing of Semiconductor Surfaces VIII - UCPSS, 18/09/2006, p.151-154
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    Challenges with respect to high-k/metal gate stack etching and cleaning

    Vos, Rita  
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    Arnauts, Sophia  
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    Bovie, Inge
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    Onsia, Bart  
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    Garaud, Sylvain
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    Xu, Kaidong
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    Yu, HongYu
    Proceedings paper
    2007, Physics and Technology of High-k Dielectrics, 7/10/2007, p.275-283
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    Cleaning of nanoparticles in semiconductor manufacturing

    Vereecke, Guy  
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    Arnauts, Sophia  
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    Doumen, Geert  
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    Eitoku, Atsuro
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    Fransaer, J.
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    Fyen, Wim
    Oral presentation
    2004, BePCIS Seminar on Selected Topics in Nanotechnology
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    Clustered single wafer wet cleaning

    Mertens, Paul  
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    Holsteyns, Frank  
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    Vos, Rita  
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    Vereecke, Guy  
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    Fyen, Wim
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    Lauerhaas, Jeff
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    Xu, Kaidong
    Meeting abstract
    2002, 201st Meeting of the Electrochemical Society. Rapid Thermal and Other Short Time Processing Technologies III, 12/05/2002, p.699
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    Correlation between haze of the wafer and particle-count on wafers: a new approach to monitor nano-sized particles

    Xu, Kaidong
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    Vos, Rita  
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    Vereecke, Guy  
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    Lux, Marcel  
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    Fyen, Wim
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    Holsteyns, Frank  
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    Kenis, Karine  
    Oral presentation
    2002, UCPSS - Ultra Clean Processing Technology Symposium
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    Damage-free removal of nano-sized particles, heading towards a red brick wall

    Mertens, Paul  
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    Fyen, Wim
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    Vereecke, Guy  
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    Xu, Kaidong
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    Lauerhaas, J.
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    Holsteyns, Frank  
    Oral presentation
    2003, International Sematech Wafer Cleaning and Surface Preparation Workshop
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    Development of 2-step plasma texturing process for crystalline silicon solar cells with Linear Microwave Plasma Sources (LPS)

    Chan, BT  
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    Kunnen, Eddy
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    Shamiryan, Denis
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    Xu, Kaidong
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    Boullart, Werner  
    Meeting abstract
    2011, 4th International Workshop Plasma Etch and Strip in Microelectronics - PESM, 5/05/2011
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    Effect of plasma treatments on the compatibility of ULK to wet cleaning

    Xu, Kaidong
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    Kesters, Els  
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    Vereecke, Guy  
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    Lux, Marcel  
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    Kraus, H
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    Henry, S.A.
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    Archer, L
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    Gaulhofer, E.
    Proceedings paper
    2007, Proceedings of the SEMI-ECS International Semiconductor Technology Conference - ISTC, 18/03/2007
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    Effect of precoat on the sidewall profile of through silicon via's

    Babaei Gavan, Khashayar  
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    Lazzarino, Frederic  
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    Brouri, Mohand
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    Tutunjyan, Nina  
    Meeting abstract
    2013, Plasma Etch and Strip in Microtechnology - PESM, 14/03/2013
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    Effect of transient pH on particle deposition during immersion rinsing

    Fyen, Wim
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    Xu, Kaidong
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    Vos, Rita  
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    Vereecke, Guy  
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    Mertens, Paul  
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    Heyns, Marc  
    Proceedings paper
    2003, Ultra Clean Processing of Silicon Surfaces 2002 - UCPSS, 16/09/2002, p.139-143
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