Browsing by Author "Xu, Kaidong"
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Publication 15nm half-pitch patterning: EUV + SELF-aligned double patterning
Oral presentation2012, International Symposium on Extreme Ultraviolet Lithography - EUVLPublication 15nm HP patterning with EUV and SADP: key contributors for improvement of LWR, LER, and CDU
Proceedings paper2013, Advanced Etch Technology for Nanopatterning II, 23/02/2013, p.86850CPublication 15nm HP patterning with EUV lithography and SADP
Meeting abstract2012, 34th International Symposium on Dry Process - DPS, 15/11/2012Publication 28nm pitch of line/space pattern transfer into silicon substrates with chemo-epitaxy directed self-assembly (DSA) process flow
Oral presentation2013, 39th International Conference on Micro and Nano Engineering - MNEPublication A force study in brush scrubbing
Oral presentation2004, 7th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSSPublication A force study in brush scrubbing
Proceedings paper2005, Ultra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium, 20/09/2004, p.279-282Publication A force study of on-chip magnetic particle transport based on tapered conductors
Journal article2005, IEEE Trans. Magnetics, 41, p.4128-4133Publication A study in interactions of plasmas and wet cleans with ULK materials
;Xu, Kaidong; ; ; ; ;Kraus, HaraldHenry, Sally - AnnProceedings paper2007, 1st International Workshop Plasma Etch and Strip in Microelectronics - PESM, 10/09/2007Publication Advanced wafer surface cleaning technology
Oral presentation2004, SEMICON Korea 2004 STS, S5: Contamination-free Manufacturing SeminarPublication Advances and challenges in ultra low-k patterning
Meeting abstract2012, China Semiconductor Technology International Conference - CSTIC, 18/03/2012Publication Aging phenomena in the removal of nano-particles from Si wafers
; ;Veltens, J. ;Xu, Kaidong ;Eitoku, A. ;Sano, Ken-Ichi; Proceedings paper2008, Ultra Clean Processing of Semiconductor Surfaces VIII - UCPSS, 18/09/2006, p.151-154Publication Challenges with respect to high-k/metal gate stack etching and cleaning
Proceedings paper2007, Physics and Technology of High-k Dielectrics, 7/10/2007, p.275-283Publication Cleaning of nanoparticles in semiconductor manufacturing
Oral presentation2004, BePCIS Seminar on Selected Topics in NanotechnologyPublication Clustered single wafer wet cleaning
; ; ; ; ;Fyen, Wim ;Lauerhaas, JeffXu, KaidongMeeting abstract2002, 201st Meeting of the Electrochemical Society. Rapid Thermal and Other Short Time Processing Technologies III, 12/05/2002, p.699Publication Correlation between haze of the wafer and particle-count on wafers: a new approach to monitor nano-sized particles
Oral presentation2002, UCPSS - Ultra Clean Processing Technology SymposiumPublication Damage-free removal of nano-sized particles, heading towards a red brick wall
Oral presentation2003, International Sematech Wafer Cleaning and Surface Preparation WorkshopPublication Development of 2-step plasma texturing process for crystalline silicon solar cells with Linear Microwave Plasma Sources (LPS)
Meeting abstract2011, 4th International Workshop Plasma Etch and Strip in Microelectronics - PESM, 5/05/2011Publication Effect of plasma treatments on the compatibility of ULK to wet cleaning
;Xu, Kaidong; ; ; ;Kraus, H ;Henry, S.A. ;Archer, LGaulhofer, E.Proceedings paper2007, Proceedings of the SEMI-ECS International Semiconductor Technology Conference - ISTC, 18/03/2007Publication Effect of precoat on the sidewall profile of through silicon via's
Meeting abstract2013, Plasma Etch and Strip in Microtechnology - PESM, 14/03/2013Publication Effect of transient pH on particle deposition during immersion rinsing
Proceedings paper2003, Ultra Clean Processing of Silicon Surfaces 2002 - UCPSS, 16/09/2002, p.139-143