Browsing by Author "van Setten, Eelco"
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Publication 22nm node imaging and beyond: a comparison of EUV and ArFi double patterning
Proceedings paper2010, International Symposium on Lithography Extensions, 20/10/2010Publication 22nm node imaging and beyond: When will EUV take over?
Proceedings paper2010, International Symposium on Extreme Ultraviolet Lithography, 18/10/2010Publication Edge placement error analysis for N7 logic patterning options
Publication EUV resist contrast loss determination using interference lithography
Publication Evaluation of resist performance for 22nm half-pitch and beyond using EUV interference lithography
Proceedings paper2010, International Symposium on Extreme Ultraviolet Lithography, 18/10/2010Publication Experimental verification of high-NA imaging simulations using SHARP
Publication Measuring resist-induced contrast loss using EUV interference lithography
Proceedings paper2010, Extreme Ultraviolet (EUV) Lithography, 21/02/2010, p.76362XPublication NXE:3300 insertion for N7 : status and challenges
Proceedings paper2015, International Symposium on Extreme Ultraviolet Lithography - EUVL, 5/10/2015Publication Patterning options for N7 logic : Prospects and challenges for EUV
Proceedings paper2015, 31st European Mask and Lithography Conference, 22/06/2015, p.96610GPublication Stitching for High NA: zooming in on CDU budget
Proceedings paper2023, International Conference on Extreme Ultraviolet Lithography, OCT 02-05, 2023, p.Art. 1275002Publication Understanding of Out-of-Band DUV light in EUV lithography: controlling impact on imaging and mitigation strategies
Proceedings paper2015, 31st European Mask and Lithography Conference, 22/06/2015, p.96610B