Browsing by author "Vermeire, Bert"
Now showing items 1-18 of 18
-
Breakdown and defect generation in ultra-thin gate oxide
Depas, Michel; Vermeire, Bert; Heyns, Marc (1996) -
Breakdown and instability of 3 nm Gate Oxide
Depas, Michel; Vermeire, Bert; Heyns, Marc (1995) -
Chemicals for the Chlorination of Gate Oxides
Mac Geary, M. J.; Boeglin, H. J.; Lubbers, A.; Mertens, Paul; Vermeire, Bert (1994) -
Chlorine precursors for gate oxidation processes
Mc Geary, M. J.; Mertens, Paul; Vermeire, Bert; Heyns, Marc; Sprey, Hessel; Lubbers, A.; Schaekers, Marc (1997) -
Defect density of ultra-thin gate oxides grown by conventional oxidation processes
Depas, Michel; Vermeire, Bert; Mertens, Paul; Schaekers, Marc; Meuris, Marc; Heyns, Marc (1994) -
Determination of tunnelling parameters in ultra-thin oxide poly-Si/SiO2/Si structures
Depas, Michel; Vermeire, Bert; Mertens, Paul; Van Meirhaeghe, R. L.; Heyns, Marc (1995) -
Effect of Cl in gate oxidation
Mertens, Paul; McGeary, M. J.; Schaekers, Marc; Sprey, Hessel; Vermeire, Bert; Depas, Michel; Meuris, Marc; Heyns, Marc (1997) -
Effect of Cl in gate oxidation
Mertens, Paul; McGeary, M. J.; Schaekers, Marc; Sprey, Hessel; Vermeire, Bert; Depas, Michel; Meuris, Marc; Heyns, Marc (1997) -
Effect of different chlorine sources during gate oxidation
Vermeire, Bert; Mertens, Paul; Mac Geary, M. J.; Kenis, Karine; Heyns, Marc; Schaekers, Marc; Lubbers, A. (1994) -
Environmentally-friendly chlorine during oxidation
Mertens, Paul; Vermeire, Bert; McGeary, M. J.; Meuris, Marc; Heyns, Marc; Depas, Michel; Sees, J.; O'Brien, S. C.; Gräf, D. (1995) -
Evaluation of different chlorine sources for gate oxidation
Mertens, Paul; Vermeire, Bert; Depas, Michel; Schaekers, Marc; Heyns, Marc (1995) -
Growth kinetics and electrical characteristics of ultra-thin pyrogenetic silicon oxide
Depas, Michel; Vermeire, Bert; Mertens, Paul; Heyns, Marc (1995) -
Just-Clean- Enough technology for the 21st century
Heyns, Marc; Meuris, Marc; Mertens, Paul; Hurd, Trace; Schmidt, Harald; Depas, Michel; Rotondaro, Antonio; Vermeire, Bert; Vandervorst, Wilfried; Storm, Wolfgang; Polleunis, C.; Bertrand, P.; McGeary, M. J.; Lubbers, A.; Hatcher, Z. (1995) -
Microroughness of clean silicon surfaces and gate oxide breakdown
Depas, Michel; Crossley, A.; Vermeire, Bert; Mertens, Paul; Sofield, C. J.; Heyns, Marc (1995) -
Statistical analysis of gate oxide integrity test
Mertens, Paul; Vermeire, Bert; Depas, Michel; Meuris, Marc; Heyns, Marc; Gräf, D. (1994) -
The relation between sodium and aluminum contamination and dielectric breakdown in MOS structures
Vermeire, Bert; Rotondaro, Antonio; Mertens, Paul; Verhaverbeke, Steven; Heyns, Marc (1994) -
Ultra-thin gate oxide yield and reliability
Depas, Michel; Vermeire, Bert; Mertens, Paul; Meuris, Marc; Heyns, Marc (1994) -
Wear-out of ultra-thin gate oxides during high-field electron tunnelling
Depas, Michel; Vermeire, Bert; Mertens, Paul; Meuris, Marc; Heyns, Marc (1995)