Browsing by author "Baeyens, Martien"
Now showing items 1-19 of 19
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Alkaline cleaning of silicon wafers: additives for the prevention of metal contamination
Martin Hoyas, Ana; Baeyens, Martien; Hub, W.; Mertens, Paul; Kolbesen, B. O. (1999) -
Effect of metal contamination and improved cleaning strategies
Mertens, Paul; Bearda, Twan; Loewenstein, Lee; Martin, A.R.; Hub, W.; Kolbesen, B. O.; Teerlinck, Ivo; Vos, Rita; Baeyens, Martien; De Gendt, Stefan; Kenis, Karine; Heyns, Marc (1999) -
Effect of metal contamination and improved cleaning strategies
Mertens, Paul; Bearda, Twan; Loewenstein, Lee; Martin, Andreas; Hub, Walter; Kolbesen, Bernd; Teerlinck, Ivo; Vos, Rita; Baeyens, Martien; De Gendt, Stefan; Kenis, Karine; Heyns, Marc (1999) -
Evaluation of cleaning recipes based on ozonated water for pre-gate oxide cleaning
Jeon, J. S.; Ogle, B.; Baeyens, Martien; Mertens, Paul (1998) -
Evaluation of cleaning recipes based on ozonated water for pre-gate oxide cleaning
Jeon, J. S.; Ogle, B.; Baeyens, Martien; Mertens, Paul (1999) -
Fluorine in thermal oxides from HF preoxidation surface treatments
Ruzyllo, Jerzy; Röhr, Erika; Baeyens, Martien; Mertens, Paul; Heyns, Marc (1999) -
Gas-phase surface proessing prior to 3.2nm gate oxidation
Ruzyllo, Jerzy; Röhr, Erika; Baeyens, Martien; Bearda, Twan; Mertens, Paul; Heyns, Marc (1998) -
Gas-phase surface proessing prior to 3.2nm gate oxidation
Ruzyllo, Jerzy; Röhr, Erika; Baeyens, Martien; Bearda, Twan; Mertens, Paul; Heyns, Marc (1999) -
Hydrogen peroxide decomposition in ammonia solutions
Knotter, D. M.; De Gendt, Stefan; Baeyens, Martien; Mertens, Paul; Heyns, Marc (1999) -
Hydrogen peroxide decomposition in ammonia solutions
Knotter, D. M.; De Gendt, Stefan; Baeyens, Martien; Mertens, Paul; Heyns, Marc (1999) -
Hydrogen peroxide decomposition in ammonin solutions
Knotter, D. M.; De Gendt, Stefan; Baeyens, Martien; Mertens, Paul; Heyns, Marc (1998) -
Influence of frequency on the removal efficiency of nano-particles in a megasonic spray cleaning tool
Schmidt, M.O.; Vereecke, Guy; Vos, Rita; Holsteyns, Frank; Baeyens, Martien; Mertens, Paul (2003) -
Influence of hardware and chemistry on the removal of nano-particles in a megasonic cleaning tank
Vereecke, Guy; Vos, Rita; Holsteyns, Frank; Schmidt, M.O.; Baeyens, Martien; Gomme, Steven; Snow, Jim; Coenen, V.; Mertens, Paul; Bauer, T.; Heyns, Marc (2003) -
Quantitative modeling of H2O2 decomposition in SC1
Mertens, Paul; Baeyens, Martien; Moyaerts, Gert; Okorn-Schmidt, H. F.; Vos, Rita; De Waele, Rita; Hatcher, Z.; Hub, W.; De Gendt, Stefan; Knotter, Martin; Meuris, Marc; Heyns, Marc (1998) -
Role of UV/chlorine exposure during dry surface conditioning before integrated epi deposition process
Ruzyllo, Jerzy; Röhr, Erika; Baeyens, Martien; Conard, Thierry; Mertens, Paul; Heyns, Marc (1998) -
Role of UV/chlorine exposure during dry surface conditioning before integrated epi deposition process
Ruzyllo, Jerzy; Röhr, Erika; Caymax, Matty; Baeyens, Martien; Conard, Thierry; Mertens, Paul; Heyns, Marc (1999) -
Silicon surface metal contamination measurements using grazing-emission XRF spectrometry
De Gendt, Stefan; Kenis, Karine; Baeyens, Martien; Mertens, Paul; Heyns, Marc; Wiener, G.; Kidd, S. J.; Knotter, D. M.; De Bokx, P. K. (1997) -
Single step alkaline cleaning solution for advanced semiconductor cleaning
Baeyens, Martien; Hub, W.; Kolbesen, B. O.; Martin, A.R.; Mertens, Paul (1998) -
Single step alkaline cleaning solution for advanced semiconductor cleaning
Baeyens, Martien; Hub, W.; Kolbesen, B. O.; Martin, A.R.; Mertens, Paul (1999)