Browsing by author "Berry, Ivan"
Now showing items 1-11 of 11
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Effects of UV-cure on mechanical, physical and electrical properties of microporous SiOC:H dielectric films
Iacopi, Francesca; Waldfried, Carlo; Abell, Thomas; Guyer, Eric; Eyckens, Brenda; Travaly, Youssef; Sajavaara, Timo; Gage, David M.; Beyer, Gerald; Berry, Ivan; Dauskardt, Reinhold; Maex, Karen (2005) -
Improved low-k dielectric properties using He/H2 plasma for resist removal
Urbanowicz, Adam; Shamiryan, Denis; Marsik, Premysl; Travaly, Youssef; Verdonck, Patrick; Vanstreels, Kris; Ferchichi, Abdelkarim; De Roest, David; Sprey, Hessel; Matsushita, K.; Kaneko, S.; Tsuji, N.; Luo, S.; Escorcia, O.; Berry, Ivan; Waldfried, Carlo; De Gendt, Stefan; Baklanov, Mikhaïl (2008) -
Improved low-k dielectric properties using He/H2 plasma for resist removal
Urbanowicz, Adam; Shamiryan, Denis; Marsik, Premysl; Travaly, Youssef; Jonas, Alain; Verdonck, Patrick; Vanstreels, Kris; Ferchichi, Abdelkarim; De Roest, David; Sprey, Hessel; Matsushita, Kiyohiro; Kaneko, Shinya; Tsuji, Naoto; Luo, Shijian; Escorcia, Orlando; Berry, Ivan; Waldfried, Carlo; De Gendt, Stefan; Baklanov, Mikhaïl (2009) -
Metrology for implanted Si substrate and dopant loss studies
Radisic, Dunja; Shamiryan, Denis; Mannaert, Geert; Boullart, Werner; Rosseel, Erik; Bogdanowicz, Janusz; Goossens, Jozefien; Marrant, Koen; Bender, Hugo; Sonnemans, Roger; Berry, Ivan (2009) -
Metrology for implanted Si substrate loss studies
Radisic, Dunja; Shamiryan, Denis; Mannaert, Geert; Boullart, Werner; Rosseel, Erik; Bogdanowicz, Janusz; Goossens, Jozefien; Marrant, Koen; Bender, Hugo; Sonnemans, Roger; Berry, Ivan (2010) -
Non-oxidizing solvent-based strip of ion implanted photoresist
Tsvetanova, Diana; Vos, Rita; Vanstreels, Kris; Radisic, Dunja; Sonnemans, Roger; Berry, Ivan; Waldfried, Carlo; Mattson, David; DeLuca, J; Vereecke, Guy; Mertens, Paul; Parac-Vogt, Tatjana; Heyns, Marc (2012) -
Non-oxidizing solvent-based strip of ion implanted photoresist
Tsvetanova, Diana; Vos, Rita; Vanstreels, Kris; Sonnemans, Roger; Berry, Ivan; Waldfried, Carlo; Mattson, David; DeLuca, J; Vereecke, Guy; Mertens, Paul; Parac-Vogt, Tatjana; Heyns, Marc (2010) -
Optimization of post ion implant ash plasma and clean for ultra shallow extension/halo implantation
Mannaert, Geert; Schram, Tom; Ortolland, Claude; Demand, Marc; Sonnemans, Roger; Berry, Ivan (2011) -
Post extension ion implant photo resist strip for 32 nm technology and beyond
Mannaert, Geert; Witters, Liesbeth; Shamiryan, Denis; Boullart, Werner; Han, Keping; Luo, Shiian; Falepin, Annelies; Sonnemans, Roger; Berry, Ivan; Waldfried, Carlo (2008) -
Removal of high-dose ion-implanted 248nm deep UV photoresist using UV irradiation and organic solvent
Tsvetanova, Diana; Vos, Rita; Vanstreels, Kris; Radisic, Dunja; Sonnemans, Roger; Berry, Ivan; Waldfried, Carlo; Mattson, David; DeLuca, James; Vereecke, Guy; Mertens, Paul; Parac-Vogt, Tatjana; Heyns, Marc (2011) -
UV-assisted curing: an effective technique for toughening of low-k organosilicate films
Iacopi, Francesca; Waldfried, Carlo; Houthoofd, Kristof; Guyer, Eric; Gage, David; Carlotti, Giovanni; Travaly, Youssef; Abell, Thomas; Escorcia, Orlando; Beyer, Gerald; Berry, Ivan; Dauskardt, Reinhold; Maex, Karen (2005)