Browsing by author "Grillaert, Joost"
Now showing items 1-20 of 33
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A new dummy-free shallow trench isolation concept for mixed-signal applications
Badenes, Gonçal; Rooyackers, Rita; Augendre, Emmanuel; Vandamme, Ewout; Perello, Carles; Heylen, Nancy; Grillaert, Joost; Deferm, Ludo (1999) -
A new dummy-free shallow trench isolation concept for mixed-signal applications
Badenes, Gonçal; Rooyackers, Rita; Augendre, Emmanuel; Vandamme, Ewout; Perello, Carles; Heylen, Nancy; Grillaert, Joost; Deferm, Ludo (2000) -
A new scaling issue in the electrical behavior of damascene versus plasma-etched interconnects
Proost, Joris; Conard, Thierry; Boullart, Werner; Grillaert, Joost; Maex, Karen (1998) -
A novel approach for the elimination of the pattern density dependence of CMP for shallow trench isolation
Grillaert, Joost; Heylen, Nancy; Vrancken, Evi; Badenes, Gonçal; Rooyackers, Rita; Meuris, Marc; Heyns, Marc (1998) -
A static model for scratches generated during aluminum chemical-mechanical polishing process: orbital technology
Zhong, L.; Yang, Jiping; Holland, K.; Grillaert, Joost; Devriendt, Katia; Heylen, Nancy; Meuris, Marc (1999) -
A study of the planarization process during chemical mechanical polishing for oxides and shallow trench isolation
Grillaert, Joost (1999-05) -
Advanced solutions for copper and low k technology
Beyer, Gerald; Baklanov, Mikhaïl; Brongersma, Sywert; De Roest, David; Donaton, R.; Grillaert, Joost; Lanckmans, Filip; Maenhoudt, Mireille; Maex, Karen; Richard, Emmanuel; Struyf, Herbert; Stucchi, Michele; Tokei, Zsolt; Van Hove, Marleen; Vervoort, Iwan (2000) -
Characterization of slurry system and suppression of oxide erosion in aluminun CMP (chemical-mechanical planarization)
Zhong, L.; Yang, G.; Holland, K.; Grillaert, Joost; Devriendt, Katia; Heylen, Nancy; Meuris, Marc (2000) -
Cleaning, rinsing and drying aspects in post-Cu-CMP clean
Fyen, Wim; Vos, Rita; Teerlinck, Ivo; Vrancken, Evi; Grillaert, Joost; Meuris, Marc; Heyns, Marc (1999) -
Cleaning, rinsing and drying effects in post-Cu CMP clean
Fyen, Wim; Vos, Rita; Teerlinck, Ivo; Vrancken, Evi; Grillaert, Joost; Meuris, Marc; Mertens, Paul; Heyns, Marc (2000) -
Comparison of the performance of slurries for STI processing
Detzel, T.; Hosali, S.; Sethuraman, A.; Wang, J. F.; Cook, L.; Grillaert, Joost (1997) -
Critical issues in the integration of Copper and low-k dielectrics
Donaton, R. A.; Coenegrachts, Bart; Maex, Karen; Struyf, Herbert; Vanhaelemeersch, Serge; Beyer, Gerald; Richard, Emmanuel; Vervoort, Iwan; Fyen, Wim; Grillaert, Joost; van der Groen, Sonja; Stucchi, Michele; De Roest, David (1999) -
Development of a global planarization process without CMP
Forester, Lynn; Coenegrachts, Bart; Stone, M.; Meynen, Herman; Grillaert, Joost; Van den hove, Luc (1994) -
Effect of CMP slurry filtration on wafer defectivity
Devriendt, Katia; Meuris, Marc; Heylen, Nancy; Vrancken, Evi; Grillaert, Joost; Heyns, Marc; Ling, Zhi Ming (1998) -
Impact of dummy metal structures on post oxide CMP planarization
Gillot, Christophe; De Backer, E.; Grillaert, Joost; Heylen, Nancy; Vaca, L. M.; Blavier, G. (1999) -
Influence of the height difference between the first and second nitride layer on erosion and dishing in the dual nitride approach for shallow trench isolation
Heylen, Nancy; Grillaert, Joost; Vrancken, Evi; Badenes, Gonçal; Rooyackers, Rita; Meuris, Marc; Heyns, Marc (1998) -
Integrating a hydrogen silsesquioxane spin-on dielectric in a quarter micron technology
Waeterloos, Joost; Meynen, Herman; Coenegrachts, Bart; Gao, Teng; Grillaert, Joost; Van den hove, Luc (1997) -
Integrations of Cu and low-k dielectrics: effect of hard mask dry etch and post-CMP clean on electrical performance of damascene structures
Donaton, R. A.; Coenegrachts, Bart; Maenhoudt, Mireille; Pollentier, Ivan; Struyf, Herbert; Vanhaelemeersch, Serge; Grillaert, Joost; Fyen, Wim; Beyer, Gerald; Stucchi, Michele; Richard, Emmanuel; Vervoort, Iwan; De Roest, David; Maex, Karen (2000) -
Low-k organic spin-on materials in a non-etchback interconnect strategy
Waeterloos, Joost; Meynen, Herman; Coenegrachts, Bart; Grillaert, Joost; Van den hove, Luc (1996) -
Minimizing within die non uniformity in CMP by optimising polishing parameters and consumables
Grillaert, Joost; Meynen, Herman; Waeterloos, Joost; Coenegrachts, Bart; Van den hove, Luc (1997)