Browsing by author "Shite, Hideo"
Now showing items 1-16 of 16
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EUV baseline process optimizations for NXE:3100 evaluation
Foubert, Philippe; Shite, Hideo; Nafus, Kathleen; Hermans, Jan; Hendrickx, Eric (2011) -
EUV process sensitivities and optimizations for track processing
Shite, Hideo; Bradon, Neil; Nafus, Kathleen; Kitano, Junichi; Kosugi, Hitoshi; Hermans, Jan; Hendrickx, Eric; Foubert, Philippe; Gronheid, Roel; Jehoul, Christiane; Van Den Heuvel, Dieter; Goethals, Mieke; Cheng, Shaunee (2010) -
EUV processing investigation on state-of-the-art coater/developer system
Shite, Hideo; Bradon, Neil; Shimoaoki, T.; Kobayashi, S.; Nafus, Kathleen; Kosugi, Hitoshi; Foubert, Philippe; Hermans, Jan; Hendrickx, Eric; Goethals, Mieke; Gronheid, Roel; Jehoul, Christiane (2011) -
EUV reolution-LWR-sensitivity performance tradeoffs for a polymer bound PAG resist
Gronheid, Roel; Vaglio Pret, Alessandro; Rathsack, Benjamin; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Shite, Hideo; Kitano, Junichi (2010) -
EUV RLS performance tradeoffs for a polymer bound PAG resist
Gronheid, Roel; Vaglio Pret, Alessandro; Rathsack, Benjamin; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Shite, Hideo; Kitano, Junichi (2010) -
EUV RLS performance tradeoffs for a polymer bound PAG resist process
Rathsack, Ben; Hooge, Josh; Somervell, Mark; Scheer, Steve; Nafus, Kathleen; Shite, Hideo; Bradon, Neil; Kitano, Junichi; Gronheid, Roel; Vaglio Pret, Alessandro (2009) -
Further investigation of EUV process sensitivities for wafer track processing
Bradon, Neil; Nafus, Kathleen; Shite, Hideo; Kitano, J.; Kosugi, H.; Goethals, Mieke; Cheng, Shaunee; Hermans, Jan; Hendrickx, Eric; Baudemprez, Bart; Van Den Heuvel, Dieter (2010) -
Latest cluster performance for EUV lithography
Shite, Hideo; Matsunaga, Koichi; Nafus, Kathleen; Kosugi, H.; Foubert, Philippe; Hermans, Jan; Hendrickx, Eric; Goethals, Mieke; Van Den Heuvel, Dieter (2012) -
LWR reduction by novel lithographic and etch techniques
Kobayashi, Shinji; Shimura, Satoru; Kawasaki, Tetsu; Nafus, Kathleen; Hatakeyama, Shinichi; Shite, Hideo; Nishimura, Eiichi; Kushibiki, Masato; Hara, Arisa; Gronheid, Roel; Vaglio Pret, Alessandro; Kitano, Junichi (2010) -
Process evaluation and optimization for EUV manufacturing
Foubert, Philippe; Nafus, Kathleen; Shite, Hideo; Goethals, Mieke; Matsunaga, Koichi; Hermans, Jan; Hendrickx, Eric (2012) -
Resist coating and developing process technology toward EUV manufacturing sub 7nm node
Kamei, Yuya; Shiozawa, Takahiro; Kawakami, Shinichiro; Shite, Hideo; Ichinomiya, Hiroshi; Hashimoto, Yusaku; Enomoto, Masashi; Nafus, Kathleen; Sonoda, Akihiko; Demand, Marc; Foubert, Philippe (2018) -
Resolution-linewidth roughness-sensitivity performance tradeoffs for an extreme ultraviolet polymer bound photo-acid generator resist
Gronheid, Roel; Vaglio Pret, Alessandro; Rathsack, Benjamin; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Shite, Hideo; Kitano, Junichi (2011) -
Technology for defectivity improvement in resist coating and developing process in EUV lithography process
Kamei, Yuya; Shiozawa, Takahiro; Kawakami, Shinichiro; Shite, Hideo; Ichinomiya, Hiroshi; Enomoto, Masashi; Nafus, Kathleen; Demand, Marc; Foubert, Philippe (2017) -
Track processing optimizations for different EUV resist platforms: preparing for a 3300 baseline process
Foubert, Philippe; Matsunaga, Koichi; Shite, Hideo; Shimoaoki, Takeshi; Nafus, Kathleen; Goethals, Mieke; Van Den Heuvel, Dieter; Hermans, Jan; Hendrickx, Eric; Kosugi, Hitoshi (2013) -
Understanding EUV resist dissolution characteristics and its impact to RLS limitations
Fonseca, Carlos; Head, Brian H.; Shite, Hideo; Nafus, Kathleen; Gronheid, Roel; Winroth, Gustaf (2011) -
Understanding RLS limitations for EUV pre-production stages ; impact of resist dissolution
Fonseca, Carlos; Shite, Hideo; Head, Brian; Nafus, Kathleen; Gronheid, Roel; Winroth, Gustaf (2010)