Browsing by author "Jonckheere, Rik"
Now showing items 1-20 of 226
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2001 Update on the SEMI standards mask qualification terminology task force
Jonckheere, Rik (2002) -
2002 update on the SEMI standards task force on photomask qualification terminology
Jonckheere, Rik (2002) -
4X reticles with 3% linewidth control for the development of 0.18 µm lithography
Jonckheere, Rik; Moonens, Jos; Potoms, Goedele; Bovie, Inge; Van den hove, Luc (1996) -
A functional 41-stage ring oscillator using scaled FinFET devices with 25nm gate lengths and 10nm Fin widths applicable for the 45nm CMOS node
Collaert, Nadine; Dixit, Abhisek; Goodwin, Michael; Kottantharayil, Anil; Rooyackers, Rita; Degroote, Bart; Leunissen, Peter; Veloso, Anabela; Jonckheere, Rik; De Meyer, Kristin; Jurczak, Gosia; Biesemans, Serge (2004-08) -
A printability study for phase-shift masks at 193nm lithography
Philipsen, Vicky; Jonckheere, Rik (2003) -
A year of new mask defectivity insights in imec's EUVL program
Jonckheere, Rik; Van Den Heuvel, Dieter; Baudemprez, Bart; Jehoul, Christiane; Pacco, Antoine (2013) -
ABI tool performance confirmation by NXE3300 printing results for native EUV blank defects at 16nm half pitch
Jonckheere, Rik; Yamane, Takeshi; Takagi, Noriaki; Watanabe, Hidehiro; Beral, Christophe (2016-11) -
ABI tool performance confirmed by NXE3300 printing results
Jonckheere, Rik; Takagi, Noriaki; Watanabe, Hidehiro; Yamane, Takeshi; Van Den Heuvel, Dieter; Gallagher, Emily (2015-10) -
Actinic characterization and modeling of the EUV mask stack
Philipsen, Vicky; Hendrickx, Eric; Jonckheere, Rik; Davydova, Natalia; Fliervoet, Timon; Neumann, Jens Timo (2013) -
Additional evidence of EUV blank defects first seen by wafer printing
Jonckheere, Rik; Van Den Heuvel, Dieter; Hendrickx, Eric; Ronse, Kurt; Bret, Tristan; Hofmann, Thorsten; Magana, John; Aharonson, Israel; Meshulach, Doron (2011) -
Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: an overview of preliminary results
Hourd, Andrew C.; Grimshaw, Anthony; Scheuring, Gerd; Gittinger, Christian; Brück, Hans-Jürgen; Chen, Shiuh-Bin; Chen, Parkson W.; Hartmann, Hans; Ordynskyy, Vladimir; Jonckheere, Rik; Philipsen, Vicky; Schätz, Thomas; Sommer, Karl (2002) -
Aerial image simulations of soft and phase defects in 193-nm lithography for 10-nm node
Driessen, Frank; Philipsen, Vicky; Jonckheere, Rik; Liu, Hua-Yu; Karklin, Linard (2002) -
An update on the SEMI standards mask qualification terminology task force
Jonckheere, Rik (2000) -
Analysis of EUV mask multilayer defect printing characteristics
Erdmann, Andreas; Evanschitzky, Peter; Bret, Tristan; Jonckheere, Rik (2012) -
Analysis of the impact of reticle CD variations on the available process windows for a 100nm CMOS process
Verhaegen, Staf; Vandenberghe, Geert; Jonckheere, Rik; Ronse, Kurt (2002) -
Anisotropic vortex pinning by a square array of rectangular antidots
Van Look, L.; Zhu, B. Y.; Jonckheere, Rik; Moshchalkov, V. V. (2002) -
Anisotropic vortex pinning in superconductors with a square array of rectangular submicron holes
Van Look, L.; Zhu, B.Y.; Jonckheere, Rik; Zhao, B.R.; Moshchalkov, V.V. (2002) -
Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the future
Jonckheere, Rik; Lorusso, Gian; Goethals, Mieke; Ronse, Kurt; Hermans, Jan; De Ruyter, Rudi (2007) -
Assessment of OPC effectiveness using two-dimensional metrics
Wiaux, Vincent; Philipsen, Vicky; Jonckheere, Rik; Vandenberghe, Geert; Verhaegen, Staf; Hoffmann, Thomas; Ronse, Kurt; Howard, William B.; Maurer, Wilhelm; Preil, Moshe E. (2002) -
Attenuated phase shift maks using MoSi as an opaque layer
Popa, Ovidiu; Jonckheere, Rik (1995)