Browsing by author "Cosnier, Vincent"
Now showing items 1-14 of 14
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Bulk properties of MOCVD-deposited HfO2 layers for high-k dielectric applications
Van Elshocht, Sven; Baklanov, Mikhaïl; Brijs, Bert; Carter, R.; Caymax, Matty; Carbonell, Laure; Claes, Martine; Conard, Thierry; Cosnier, Vincent; Date, Lucien; De Gendt, Stefan; Kluth, J.; Pique, Didier; Richard, Olivier; Vanhaeren, Danielle; Vereecke, Guy; Witters, Thomas; Zhao, Chao; Heyns, Marc (2004) -
Characterization of nano-laminate structure using grazing incidence XRD and ATR-FTIR
Zhao, Chao; De Gendt, Stefan; Caymax, Matty; Heyns, Marc; Cosnier, Vincent; Maes, Jan; Roebben, G.; Van der Biest, O. (2003) -
Effect of N2 annealing on AlxZryOz oxide
Petry, Jasmine; Richard, Olivier; Vandervorst, Wilfried; Conard, Thierry; Chen, Jerry; Cosnier, Vincent (2002) -
Effect of N2 annealing on AlZrO oxide
Petry, Jasmine; Richard, Olivier; Vandervorst, Wilfried; Conard, Thierry; Chen, Jerry; Cosnier, Vincent (2003) -
Growth and characterization of single and mixed metal oxides by ALCVD on various surfaces for high-k gate stack applications
Caymax, Matty; Brijs, Bert; Carter, Richard; Claes, Martine; Conard, Thierry; De Gendt, Stefan; Delabie, Annelies; Heyns, Marc; Richard, Olivier; Vandervorst, Wilfried; Zhao, Chao; Maes, Jan; Chen, Jerry; Cosnier, Vincent; Green, Martin; Kaushik, Vidya; Kluth, Jon; Tsai, Wilman (2002) -
Infrared interface analysis of high-k dielectrics deposited by atomic layer chemical vapour deposition
Cosnier, Vincent; Bender, Hugo; Caymax, Matty; Chen, Jian; Conard, Thierry; Nohira, Hiroshi; Richard, Olivier; Tsai, Wilman; Vandervorst, Wilfried; Young, Edward; Zhao, Chao; De Gendt, Stefan; Heyns, Marc; Maes, Jos; Tuominen, Marko; Rochat, N.; Olivier, M.; Chabli, A. (2001) -
Issues, achievements and challenges towards integration of high-k dielectrics
Caymax, Matty; De Gendt, Stefan; Vandervorst, Wilfried; Heyns, Marc; Bender, Hugo; Carter, Richard; Conard, Thierry; Degraeve, Robin; Groeseneken, Guido; Kubicek, Stefan; Lujan, Guilherme; Pantisano, Luigi; Petry, Jasmine; Röhr, Erika; Van Elshocht, Sven; Zhao, Chao; Cartier, Eduard; Chen, Jerry; Cosnier, Vincent; Jang, Se Aug; Kaushik, Vidya; Kerber, Andreas; Kluth, Jon; Lin, S.; Tsai, Wilman; Young, Edward; Manabe, Y. (2002) -
Physical characterisation of high-gate stacks
Vandervorst, Wilfried; Bender, Hugo; Conard, Thierry; Richard, Olivier; Zhao, Chao; Brijs, Bert; Caymax, Matty; De Gendt, Stefan; Cosnier, Vincent; Chen, Jerry; Kluth, J.; Cartier, Eduard; Green, Martin (2002) -
Physical characterization of ultrathin high k dielectrics
Vandervorst, Wilfried; Brijs, Bert; Bender, Hugo; Conard, Thierry; Petry, Jasmine; Richard, Olivier; Van Elshocht, Sven; Delabie, Annelies; Caymax, Matty; De Gendt, Stefan; Cosnier, Vincent; Green, Martin; Chen, Jerry (2003) -
Scaling of high-k dielectrics towards sub-1nm EOT
Heyns, Marc; Beckx, Stephan; Bender, Hugo; Blomme, Pieter; Boullart, Werner; Brijs, Bert; Carter, Richard; Caymax, Matty; Claes, Martine; Conard, Thierry; De Gendt, Stefan; Degraeve, Robin; Delabie, Annelies; Deweerd, Wim; Groeseneken, Guido; Henson, Kirklen; Kauerauf, Thomas; Kubicek, Stefan; Lucci, Luca; Lujan, Guilherme; Mentens, Jimmy; Pantisano, Luigi; Petry, Jasmine; Richard, Olivier; Röhr, Erika; Schram, Tom; Vandervorst, Wilfried; Van Doorne, Patrick; Van Elshocht, Sven; Westlinder, Jörgen; Witters, Thomas; Zhao, Chao; Cartier, Eduard; Chen, Jerry; Cosnier, Vincent; Green, Martin; Jang, Se Aug; Kaushik, Vidya; Kerber, Andreas; Kluth, Jon; Lin, Steven; Tsai, Wilman; Young, Edward; Manabe, Yukiko; Shimamoto, Yasuhiro; Bajolet, Philippe; De Witte, Hilde; Maes, Jan; Date, Lucien; Pique, Didier; Coenegrachts, Bart; Vertommen, Johan; Passefort, Sophie (2003) -
Surface preparation and interfacial stability of high-k dielectrics deposited by atomic layer chemical vapor deposition
Tsai, Wilman; Carter, Richard; Nohira, Hiroshi; Caymax, Matty; Conard, Thierry; Cosnier, Vincent; De Gendt, Stefan; Heyns, Marc; Petry, Jasmine; Richard, Olivier; Vandervorst, Wilfried; Young, Edward; Zhao, Chao; Maes, Jan; Tuominen, M.; Schulte, W.H.; Garfunkel, E.; Gustafsson, T. (2003) -
The influence of defects on campatibility and yield of the HfO2-polysilicon gate stack for CMOS integration
Kaushik, Vidya; De Gendt, Stefan; Carter, Richard; Claes, Martine; Röhr, Erika; Pantisano, Luigi; Kluth, Jon; Kerber, Andreas; Cosnier, Vincent; Cartier, Eduard; Tsai, Wilman; Young, Edward; Green, Martin; Chen, Jerry; Jang, S.A.; Lin, S.; Delabie, Annelies; Van Elshocht, Sven; Manabe, Yukiko; Richard, Olivier; Zhao, Chao; Bender, Hugo; Caymax, Matty; Heyns, Marc (2003) -
Thermal processing of high-K materials thermodynamics and kinetics
Young, Edward; Chen, Jian; Cosnier, Vincent; Lysaght, P.; Maes, Jan; Roozeboom, F.; Zhao, Chao (2002) -
Thermal stability and scalability of zr-aluminate-based high-k gate stacks
Chen, Jerry; Cartier, Eduard; Carter, Richard; Kauerauf, Thomas; Zhao, Chao; Pétry, Jasmine; Cosnier, Vincent; Xu, Zhen; Kerber, Andreas; Tsai, Wilman; Young, Edward; Kubicek, Stefan; Caymax, Matty; Vandervorst, Wilfried; De Gendt, Stefan; Heyns, Marc; Copel, M.; Besling, Wim; Bajolet, Philippe; Maes, Jan (2002)